Early detection of liquid leaks to minimize accidents! The OD-7, compliant with RoHS and CE, has been added to the oil and organic solvent detectors.
Suitable for commercial use! It has very stable and predictable characteristics and behavior.
A simple structure with high versatility! It adopts a unique plasma control method.
Heat-resistant trivalent fluorine rubber (high temperature resistance: 250°C) material with O-ring cherry seal.
Pipe heaters and cylinders prevent heat loss! Reduce power consumption and CO2 emissions! Shapes and materials can be freely customized according to application!
Plasma CVD device for thick film formation. High speed and low stress (patent pending).
Coating is possible up to a 3L container! It contributes to reducing logistics costs through lightweight containers.
High-performance metal seals!! Ideal for various vacuum equipment and semiconductor manufacturing devices!
The O-ring cherry seal incorporates not only JIS standard sizes but also intermediate, extended, and derived sizes into the standards, and is molded in a variety of materials.
Meeting the high cleanliness standards required in the semiconductor and medical device fields. We carry out everything from precision cleaning to packaging and assembly in a consistent clean environment.
A very compact atomic layer deposition device with a rich process recipe.
AtomSpectraDBViewer: Fast and convenient search! New version now available!
We offer sizes ranging from 3.0x3.0mm to 10.0x10.0mm!
Total support for the installation and maintenance of semiconductor manufacturing equipment, from precision equipment installation compatible with clean rooms! Additional information.
We provide fully refurbished and upgraded legacy MOCVD equipment along with the best service and support.
A porous silicon formation device that further applies conventional anodic oxidation equipment. Porous silicon wafers are formed depending on the chemical solution used and the current density.
Semiconductors, components for liquid crystal manufacturing equipment, heat-resistant and corrosion-resistant materials, setters, and heat dissipation plates!
It is compact and lightweight, yet capable of displaying 3-3/4 digits (3999), and comes standard with two limit comparison output contacts.
Online sales of small packs, just what you need when you need it!
Installation and manufacturing of gas supply systems for semiconductor and solar cell manufacturing equipment.
Achieving excellent film thickness distribution and reproducibility! Multi-chamber specifications and various custom-made options are also available.
Controllable extensive membrane properties! Significant particle reduction and improved productivity.
High-efficiency high-frequency power supply [Low cost, energy-saving, compact design] With a reflection resistance of over 600W, it withstands rapid load fluctuations due to short circuits and open circuits.
Delta Seal (HNV HELICOFLEX(R) DELTA) achieves ultra-high vacuum! [Standardized for JIS V-groove flanges]
No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufacturing equipment!
Replace with elastomer seals! Introducing our metal seals.
Proposed simplifications for harness processing, introduced software for harness inspection, and achieved mass production!
Excellent uniformity of film thickness and impurity concentration. Atmospheric pressure CVD equipment that achieves high productivity and low cost.
Metal bellows are components used in various vacuum devices and semiconductor manufacturing equipment.
Three types of sedimentation devices are available! Please choose according to your needs.
The O-ring cherry seals are made from a special material that can withstand harsh temperature conditions and strong chemicals, and they are molded into various sizes.
The O-ring cherry seal molds O-rings of various sizes according to the AS568 standard (aerospace standard) and other specifications, using a wide variety of materials.
Standard type perfluoroelastomer material with O-ring cherry seal.
White type perfluoroelastomer material with O-ring cherry seal.
Standard type 3-component fluororubber material with O-ring cherry seal.
White type of ternary fluorine rubber material with cherry blossom seal of O-ring.
Old grade of heat-resistant perfluoroelastomer (high temperature resistance -300℃) material with O-ring cherry seal.
White type heat-resistant perfluoroelastomer (high temperature resistance: 280°C) material with O-ring cherry blossom seal.
Standard type Bition ETP (FFKM-E) material with O-ring cherry seal.
White type of Bition ETP (FFKM-E) material with O-ring cherry seal.
Standard type Aflas (FEPM) material with O-ring cherry seal.
Low adhesion and low outgassing fluororubber (FKM) material with O-ring cherry seal.
Low adhesion and low outgassing fluororubber (FKM) material with O-ring cherry seal.
The O-ring cherry seals are available in a wide variety of materials with various properties such as heat resistance, pressure resistance, and chemical resistance, and can be molded in various sizes.
The O-ring cherry seal is made from various materials including PTFE (Teflon / polytetrafluoroethylene resin) and can produce O-rings in a wide range of sizes.
Heat-resistant perflo (high temperature resistance: 300°C) material without filler using O-ring cherry seal.
High hardness type Afuras (FEPM) material with O-ring cherry seal.
Silicon nitride, which has heat resistance and excellent thermal shock resistance, is a material with strong mechanical strength and good balance.
- A wide range of standard-sized products - Easy installation - Precision sintering diffusion bonding (simultaneous sintering) - High flow rate
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.
Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.
Plasma CVD equipment compatible with wafer sizes of Φ3 inch and Φ4 inch. Rapid synthesis of clean, high-quality graphene while suppressing impurities.
Not only can we achieve significant cost reductions by utilizing used equipment, but we also offer affordable support for after-sales service, maintenance, and specification changes after installation.
It prevents the deposition of powder regardless of the pipe shape, prevents clogging in the pipes through localized concentration, and extends the performance of the pump.
Forming a dense thin film by chemically reacting gases! Low-temperature processing is also possible.
Compact and energy-efficient! Plasma CVD equipment for synthesizing single crystal high-purity diamonds for device fabrication.
Nisshin Giken Co., Ltd. - Single Crystal Growth Equipment - Comprehensive Catalog Available for Free Distribution!
Can be applied inside pipes with an inner diameter of just 1mm! Excellent in lubrication, corrosion resistance, and release properties, making it suitable for a wide range of applications from kitchen equipment to aerospace devices.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be achieved with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be obtained with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be achieved with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation, which cannot be obtained with other resin coatings.
At Daito Kasei, we specialize in various surface treatment processes, focusing primarily on fluororesin coatings and fluororesin linings.
At Daito Kasei, we specialize in various surface treatment processes, focusing primarily on fluororesin coatings and fluororesin linings.
Depending on the grade, there is a middle coat between the primer and the top coat.
Fluororesin lining refers to a thick film, such as overlapping coatings. Our company considers anything over 400μ to be fluororesin lining.
At Daito Kasei, we can apply fluororesin coating and fluororesin lining to the inner surfaces of thin pipes ranging from 8A to 25A.
Here are some examples of our construction achievements. Fluorine coating case study 1: Food manufacturing products.
Fluororesin tube lining is a lining technology that involves bonding a fluororesin tube (with an inner diameter of 3mm or more) to the inner surface of a metal pipe through baking.
The horizontal tolerance is +0.2/0-0mm, and the thickness tolerance is +/-0.05mm! Let me introduce the electronic grade CVD.
We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!
The surface roughness Ra is polished, Ra < 5nm! We introduce optical grade single crystals.
Designing thermal conductivity from 1,000 W/mK to over 2,000 W/mK! Introducing polycrystalline thermal materials.
The horizontal tolerance is +0.1/0-0mm! Introducing single crystal mechanical components.
We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!
The compatible film types are DLC, amorphous SiC, etc.! Equipped with a substrate heating mechanism (maximum set temperature: 500°C).
A film deposition platform for semiconductor wafers and advanced packaging capable of various film deposition treatments.
Why introduce the insulation material "Silsaam"? Here are its benefits explained.
There is a track record of growing nitride semiconductor crystals on various semiconductor substrates. Customization is also possible according to your requests.
We can accommodate a variety of materials and specifications.