High-performance metal seals!! Ideal for various vacuum equipment and semiconductor manufacturing devices!
MOCVD, filter, AIXTRON, LED, made in China, high-temperature vacuum dust filtration.
The O-ring cherry seal molds O-rings of various sizes according to the AS568 standard (aerospace standard) and other specifications, using a wide variety of materials.
Compact the device size as much as possible! Achieve stable film formation and low particle count.
Standard type perfluoroelastomer material with O-ring cherry seal.
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufacturing equipment!
White type of ternary fluorine rubber material with cherry blossom seal of O-ring.
The O-ring cherry seal incorporates not only JIS standard sizes but also intermediate, extended, and derived sizes into the standards, and is molded in a variety of materials.
Suitable for commercial use! It has very stable and predictable characteristics and behavior.
A film deposition platform for semiconductor wafers and advanced packaging capable of various film deposition treatments.
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Fluororubber with excellent long-term durability!! It can withstand high temperatures (200-220°C) compared to conventional fluororubber.
High-efficiency high-frequency power supply [Low cost, energy-saving, compact design] With a reflection resistance of over 600W, it withstands rapid load fluctuations due to short circuits and open circuits.
Leave everything from the design and manufacturing of vacuum devices to maintenance work to us!
Excellent uniformity of film thickness and impurity concentration. Atmospheric pressure CVD equipment that achieves high productivity and low cost.
Metal bellows are components used in various vacuum devices and semiconductor manufacturing equipment.
Three types of sedimentation devices are available! Please choose according to your needs.
A very compact atomic layer deposition device with a rich process recipe.
The O-ring cherry seals are made from a special material that can withstand harsh temperature conditions and strong chemicals, and they are molded into various sizes.
White type perfluoroelastomer material with O-ring cherry seal.
CVD, PVD (evaporation, sputtering, etc.) high vacuum, ultra-high temperature plate heater for wafer and small chip heating with excellent uniformity and reproducibility.
Compact multi-film device that incorporates sputtering, deposition, EB, and annealing thin film modules in a 60L volume chamber, suitable for various applications.
Not only can we achieve significant cost reductions by utilizing used equipment, but we also offer affordable support for after-sales service, maintenance, and specification changes after installation.
It prevents the deposition of powder regardless of the pipe shape, prevents clogging in the pipes through localized concentration, and extends the performance of the pump.
Pipe heaters and cylinders prevent heat loss! Reduce power consumption and CO2 emissions! Shapes and materials can be freely customized according to application!
Since the pipe is narrow, we can solve the problem of the adhesive clogging or corroding in a short time!
Fluororesin tube lining is a lining technology that involves bonding a fluororesin tube (with an inner diameter of 3mm or more) to the inner surface of a metal pipe through baking.
We provide MOCVD equipment for high-performance, high-throughput advanced compound semiconductors, uniquely developed by Agnitron.
The passivation MBE device is composed of various chambers specially designed for laser facet passivation and other purposes.
There is a track record of growing nitride semiconductor crystals on various semiconductor substrates. Customization is also possible according to your requests.
Semiconductors, components for liquid crystal manufacturing equipment, heat-resistant and corrosion-resistant materials, setters, and heat dissipation plates!
Currently presenting a summary of three particularly popular case studies! Changing the valve can also reduce the incidence of troubles. A collection of safety measures to protect workers from danger.
It is suitable for use in primary bulk gas lines with a flow rate of 500 L/min to 3,000 L/min.
This is a completely new DLC coating device from Japan that also allows for gas ion injection.
Semiconductor microwave power supply, 5.8 GHz band
Plasma CVD device for thick film formation. High speed and low stress (patent pending).
As an effect of Aqua Plasma, we are publishing results of surface depth analysis by ESCA.
Achieving excellent film thickness distribution and reproducibility! Multi-chamber specifications and various custom-made options are also available.
High Efficiency High Frequency Power Supply【NR3N-13】【NR3N-13】
High-purity carbon is used extensively in the ion implantation process of semiconductor manufacturing, which requires high purity. Here is an introduction to high-purity carbon.
Small quantities and wide varieties. NSG(SiO2)/PSG/BPSG deposition. Single-wafer processing atmospheric pressure CVD (APCVD) system (Compatible with 8-inch SiC wafers)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
"Replace rubber O-ring to metal seal, Eliminate gas permeation and gas release." This can be possible with Delta Beta HNRV.
Adopting a unique LIA method plasma source, we achieve ultra-fast, high-quality vacuum deposition on flat substrates such as glass and metal!
Adopting SiC trays! A system that enables mass production while keeping costs down.
Introducing one of the largest ultra-large DLC devices in the country!
Silicon nitride, which has heat resistance and excellent thermal shock resistance, is a material with strong mechanical strength and good balance.
Simulation of vacuum exhaust and analysis of gas flow under low pressure conditions, analysis software compatible with rarefied gases (rarefied fluids).
Chemical reactions caused by dilute gases can also be considered!
Meeting the high cleanliness standards required in the semiconductor and medical device fields. We carry out everything from precision cleaning to packaging and assembly in a consistent clean environment.
MOCVD equipment VEECO K465i G2
- A wide range of standard-sized products - Easy installation - Precision sintering diffusion bonding (simultaneous sintering) - High flow rate
Standard type 3-component fluororubber material with O-ring cherry seal.
Heat-resistant trivalent fluorine rubber (high temperature resistance: 250°C) material with O-ring cherry seal.
Old grade of heat-resistant perfluoroelastomer (high temperature resistance -300℃) material with O-ring cherry seal.
White type heat-resistant perfluoroelastomer (high temperature resistance: 280°C) material with O-ring cherry blossom seal.
Standard type Bition ETP (FFKM-E) material with O-ring cherry seal.
White type of Bition ETP (FFKM-E) material with O-ring cherry seal.
Standard type Aflas (FEPM) material with O-ring cherry seal.
Low adhesion and low outgassing fluororubber (FKM) material with O-ring cherry seal.
Low adhesion and low outgassing fluororubber (FKM) material with O-ring cherry seal.
The O-ring cherry seals are available in a wide variety of materials with various properties such as heat resistance, pressure resistance, and chemical resistance, and can be molded in various sizes.
The O-ring cherry seal is made from various materials including PTFE (Teflon / polytetrafluoroethylene resin) and can produce O-rings in a wide range of sizes.
Heat-resistant perflo (high temperature resistance: 300°C) material without filler using O-ring cherry seal.
Special material (fluororubber + fluororesin) without the use of a compound material with O-ring cherry seal.
High hardness type Afuras (FEPM) material with O-ring cherry seal.
Early detection of liquid leaks to minimize accidents! The OD-7, compliant with RoHS and CE, has been added to the oil and organic solvent detectors.
◉ Short time: Easily conduct graphene synthesis experiments in just 30 minutes per batch. ◉ High-precision temperature and pressure control. ◉ Sophisticated software.
A compact multi-thin film device that incorporates sputtering, deposition, electron beam (EB), and annealing thin film modules in a 60-liter volume chamber, suitable for various applications.
Plasma CVD equipment compatible with wafer sizes of Φ3 inch and Φ4 inch. Rapid synthesis of clean, high-quality graphene while suppressing impurities.
Forming a dense thin film by chemically reacting gases! Low-temperature processing is also possible.
Compact and energy-efficient! Plasma CVD equipment for synthesizing single crystal high-purity diamonds for device fabrication.
AtomSpectraDBViewer: Fast and convenient search! New version now available!
Nisshin Giken Co., Ltd. - Single Crystal Growth Equipment - Comprehensive Catalog Available for Free Distribution!
Leave the technical services for semiconductor manufacturing equipment to us.
Can be applied inside pipes with an inner diameter of just 1mm! Excellent in lubrication, corrosion resistance, and release properties, making it suitable for a wide range of applications from kitchen equipment to aerospace devices.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be achieved with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be obtained with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be achieved with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation that cannot be achieved with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation, which cannot be obtained with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation, which cannot be obtained with other resin coatings.
It has excellent properties such as heat resistance, non-stickiness, wear resistance, low friction, chemical resistance, and insulation, which cannot be achieved with other resin coatings.