By using the wafer inversion unit, both sides of the wafer can be automatically coated!
A method of micro-particle layering (spray coating method) has been proposed that enables the application of thin films of photoresist to devices with difficult-to-coat uneven surfaces.
A compact slit coater (die coater) that flexibly accommodates various coating conditions and materials, achieving high-precision coating uniformity.
We manufacture small, low-cost, and quick-delivery equipment suitable for research, prototype production, die, gravure, roll coat, and roll-to-roll applications! *Test coating services are also available!
This is a high-viscosity dedicated spin coater that uniformly applies high-viscosity polyimide with a viscosity of around 10,000 cP. It also achieves material savings with a rotating cup-type chuck!
Supports low to high viscosity resist! Equipment can be manufactured for any wafer size!
Thin film formation at room temperature and atmospheric pressure! Using inexpensive film materials! Immediate delivery campaign ongoing.
















































































































