
Coating the resist, exposure, and developing process are all done in one go. It is a device that can process automatically. This is a special device made possible by being a comprehensive manufacturer of photolithography equipment.

This is a high-viscosity dedicated spin coater that uniformly applies high-viscosity polyimide with a viscosity of around 10,000 cP. It also achieves material savings with a rotating cup-type chuck!

By using the wafer inversion unit, both sides of the wafer can be automatically coated!

A compact slit coater (die coater) that flexibly accommodates various coating conditions and materials, achieving high-precision coating uniformity.

Leave the technical services for semiconductor manufacturing equipment to us.

Thin film formation at room temperature and atmospheric pressure! Using inexpensive film materials! Immediate delivery campaign ongoing.