Optimal for use in a vacuum environment where oil cannot be used.
Correction of sensitivity coefficients and sputtering rates across all depths in response to changes in the sample matrix, enabling high-precision depth profile analysis.
We introduce frequently asked questions about ion implantation and analysis in a Q&A format.
Carbon dioxide has excellent effects in preventing static electricity. It is a device that controls the specific resistance value of DIW by supplying CO2 gas through a hollow fiber membrane.
Plansee's tungsten and molybdenum products for ion implantation are favored by many semiconductor manufacturers for their high reliability and prompt service.
Minimize radioactive contamination! Capable of proposing plasma excitation technology tailored to specific applications.
Ultra-high vacuum feedthrough for ~150KV (DC) class. Conductor material can also accommodate high melting point metals.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
Shortest half-day estimate / Introducing parts related to semiconductor manufacturing equipment, from metal components to resin products, based on our track record!
It is a high-output RF ion source that achieves a wide range and stable discharge.
Cooperate for stable operation of the equipment and quality improvement! Please contact us for available devices.
We also support the overhaul of ion implantation devices! Please contact us for compatible devices.
Carbon dioxide has excellent effects in preventing static electricity. This is a device that controls the resistivity of DIW by supplying CO2 gas through a hollow fiber membrane.
Plansee's tungsten and molybdenum products for ion implantation are favored by many semiconductor manufacturers for their high reliability and prompt service.
Modify the surface of a material through doping without forming a film! Contributes to improved wear resistance, enhanced fatigue resistance, and reduced friction.
Online sales of small packs, just what you need when you need it!
This is a pulse power supply that uses a vacuum tube capable of stable discharge.
Achieving stable discharge in vacuum tubes.
For the output return line of the pulse power, Kurita Manufacturing proposes a copper flat plate.
It can also be used as a production machine and is adopted by many users.
Ion Implantation Device Disk Rejuvenation Service
Quickly provide technological innovations in semiconductor manufacturing equipment as an import trading company.
A service that offers high-quality disc playback at a low price.
Injection into various products from semiconductors to medical applications is possible! Suitable for Si, SiC, GaN, etc.!
High-purity carbon is used extensively in the ion implantation process of semiconductor manufacturing, which requires high purity. Here is an introduction to high-purity carbon.
[RoHS Compliant] This product is designed to be applicable under any conditions as an insulator for circuits that require high voltage wiring.
[RoHS Compliant] This is a ceramic bushing with excellent insulation and heat resistance. It is widely used as a component in analytical instruments and vacuum equipment.
Aluminum precision parts for semiconductor manufacturing equipment, Osaka. [Leave cost reduction to Philir Co., Ltd.]
Aluminum precision parts for semiconductor manufacturing equipment. [Leave cost reduction to Philir Co., Ltd.]
Single items, small lots, lathe processing, precision cutting [Leave cost reduction to Firiru Co., Ltd.]
CNC lathe processing, aluminum precision cutting, semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]
Introduced the ROKURO CEGA capable of processing at Φ0.01. Also supports simultaneous 5-axis machining.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
Compatible with large substrates! High-speed beam adjustment using a fully automated power control system.
We own an accelerator and offer various services utilizing ion beams!