"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
It is a high-output RF ion source that achieves a wide range and stable discharge.
We also support the overhaul of ion implantation devices! Please contact us for compatible devices.
We introduce frequently asked questions about ion implantation and analysis in a Q&A format.
Carbon dioxide has excellent effects in preventing static electricity. This is a device that controls the resistivity of DIW by supplying CO2 gas through a hollow fiber membrane.
Carbon dioxide has excellent effects in preventing static electricity. It is a device that controls the specific resistance value of DIW by supplying CO2 gas through a hollow fiber membrane.
Plansee's tungsten and molybdenum products for ion implantation are favored by many semiconductor manufacturers for their high reliability and prompt service.
Plansee's tungsten and molybdenum products for ion implantation are favored by many semiconductor manufacturers for their high reliability and prompt service.
Minimize radioactive contamination! Capable of proposing plasma excitation technology tailored to specific applications.
Online sales of small packs, just what you need when you need it!
This is a pulse power supply that uses a vacuum tube capable of stable discharge.
Achieving stable discharge in vacuum tubes.
For the output return line of the pulse power, Kurita Manufacturing proposes a copper flat plate.
It can also be used as a production machine and is adopted by many users.
Quickly provide technological innovations in semiconductor manufacturing equipment as an import trading company.
Correction of sensitivity coefficients and sputtering rates across all depths in response to changes in the sample matrix, enabling high-precision depth profile analysis.
[RoHS Compliant] This product is designed to be applicable under any conditions as an insulator for circuits that require high voltage wiring.
[RoHS Compliant] This is a ceramic bushing with excellent insulation and heat resistance. It is widely used as a component in analytical instruments and vacuum equipment.
High-purity carbon is used extensively in the ion implantation process of semiconductor manufacturing, which requires high purity. Here is an introduction to high-purity carbon.
Optimal for use in a vacuum environment where oil cannot be used.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
Compatible with large substrates! High-speed beam adjustment using a fully automated power control system.
