List of Semiconductor Manufacturing Equipment products

We provide comprehensive support from design to manufacturing and maintenance!

• Contract manufacturing

It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...

• Sensors

Automation of super finishing processes and uniformity of roughness. We propose polishing equipment for outer diameter, inner diameter, end face, etc., tailored to your applications and shapes.

• Wafer processing/polishing equipment

Highly versatile! Guarantees a shining edge, perfect finish, and short processing time.

• Wafer processing/polishing equipment

A highly versatile fully electric solution for flat and shaped edges!

• Wafer processing/polishing equipment

Guaranteed high-quality finish and consistent performance! Stone grinding machine with excellent output.

• Wafer processing/polishing equipment
• Stone Processing Machinery

Vivid in the vertical direction! Precisely vertically polished straight edges of marble and granite.

• Wafer processing/polishing equipment

Unique solutions for precision, efficiency, and reliability in stone polishing.

• Wafer processing/polishing equipment
• Stone Processing Machinery

High-precision inspection equipment compatible with transparent materials.

• Semiconductor inspection/test equipment

Automating visual inspection of wafer defects.

• Semiconductor inspection/test equipment

Equipped with a review microscope! Defects detected can be observed in real-time with the microscope.

• Semiconductor inspection/test equipment

SUS304 t1.0 thin plate used (with welding)

• Semiconductor inspection/test equipment

Tabletop conveyor. How about for simple verification of fine parts?

• Image Processing Equipment
• Other semiconductor manufacturing equipment

3D Inspection Device HISR - Assisting with precise inspection and verification.

• Color camera
• Other semiconductor manufacturing equipment

We have achievements such as 'sputtering equipment with GB for organic EL' and 'IBS equipment for research and development'!

• Sputtering Equipment

We have a track record of equipment such as 'plasma CVD systems for metal containers' and 'ICP-type MOCVD systems'!

• CVD Equipment

Supports tray transport! Achieves excellent substrate temperature distribution and gas flow method.

• Annealing furnace
• Heating device

Switching between RIE mode and DP mode is possible! Reduction of metal contamination through special surface treatment.

• Etching Equipment

Reduction of particles through suitable surface treatment! Compatible with high vacuum processes using a load-lock system.

• Evaporation Equipment

We have a track record of devices such as the "two-stage composite Pt deposition system"! Please contact us when you need assistance.

• Evaporation Equipment

You can freely choose from the plasma cleaning chamber, organic deposition chamber, electrode deposition chamber, sealing chamber, and more!

• Evaporation Equipment

Maximum substrate heating temperature of 1000℃! Reduces element loss specific to the substrate surface heating process!

• Heating device
• Annealing furnace

It is a versatile and compact device that enables etching, ashing, and ion cleaning!

• Etching Equipment
• Ashing device

Demo units available for loan! Ideal for spin drying silicon wafers, masks, and film substrates!

• Other clean room equipment and facilities
• Other semiconductor manufacturing equipment

Demo units available for loan! This is a cassette-type batch cleaning device that can accommodate up to Φ300.

• Other semiconductor manufacturing equipment

Demo units available for loan! This is a sheet-type cleaning device that can accommodate up to Φ300.

• Other semiconductor manufacturing equipment

Demo units available for loan! This is a device that performs a series of cleaning and etching processes, including pure water treatment and drying.

• Etching Equipment

【Demo unit available for loan!】A semi-automatic device that transports wafers from the processing tank to the rinse tank via an arc.

• Etching Equipment

Demo units available for loan! Wafers are loaded and processed in a dedicated barrel.

• Etching Equipment

Demo units available for loan! After pre-processing with a cassette, automatic etching is performed with a dedicated barrel.

• Etching Equipment

Demo units available for loan! A clean filter is installed at the top to ensure cleanliness within the chamber.

• Other semiconductor manufacturing equipment

Demo units available for loan! We offer a variety of options including batch type and scrub cleaning.

• Other semiconductor manufacturing equipment

Demo units available for loan! We will accommodate according to the shape of the quartz tube, so please consult with us.

• Other semiconductor manufacturing equipment

Possible at 10,000 rpm with a compact small option!

• Coater
• Other semiconductor manufacturing equipment

Target work: Applicable to 2"□ to 5"□ substrates or φ2" to φ5" substrates!

• Coater
• Other semiconductor manufacturing equipment

Technology has been incorporated to achieve a uniform high-precision coating!

• Coater
• Other semiconductor manufacturing equipment

Automatic and manual operation will perform developing, rinsing, washing, and spin drying!

• Coater
• Other semiconductor manufacturing equipment

Install a 3-axis multi-joint clean robot at the center of the device for wafer transport!

• Etching Equipment

Install a 3-axis multi-joint clean robot at the center of the device for substrate transport!

• Other semiconductor manufacturing equipment

Customization is okay! We offer quick responses and after-sales support unique to manufacturers.

• Other semiconductor manufacturing equipment

Coating is possible up to a 3L container! It contributes to reducing logistics costs through lightweight containers.

• CVD Equipment

Achieving a substrate temperature of 900℃! Equipped with a 3-axis mechanism on the substrate stage to realize a uniform film thickness distribution.

• Sputtering Equipment

A simple structure with high versatility! It adopts a unique plasma control method.

• CVD Equipment

A high-temperature process of up to 900°C is possible! This product is suitable for single crystal film formation due to the epitaxial promotion mechanism.

• Evaporation Equipment

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

• Sputtering Equipment

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

• Sputtering Equipment