List of Heating equipment/furnace products
- classification：Heating equipment/furnace
421～435 item / All 4700 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!
- Cooling system
April 10, 2024 (Wednesday) to April 12, 2024 (Friday) Notice of Participation in Nagoya Manufacturing World 2024
Sanwa Shiki Ventilator Co., Ltd. will be exhibiting at the 2024 Monozukuri World (Nagoya) held at Port Messe Nagoya. We will also be showcasing our large cooling fans and cool/warm ambient products. Date: April 10, 2024 - April 12, 2024 Opening: 10:00 AM Location: Nagoya Port Messe (Exhibition Hall 1) *Our booth: 19-1 We would be grateful if you could visit us if you have the time.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Achieving temperature uniformity within 0.2℃ with the adoption of mica heaters!
- Heater
- Other heaters
- Hot plate
Supports heat sources up to 1000℃! Protects wiring and cables around the furnace.
- Incinerators and incinerators
- Wiring materials
- Heating device
A rod heater that can be bent into various shapes to suit your needs!
- Other heaters
- Heating device
The maximum operating temperature is 350°C! A cylindrical heater that can be bent to match the shape of the target object.
- Other heaters
- Heating device
The material is SUS430/bonded steel plate! It can be attached to the side of a container filled with liquid for heating or insulation purposes.
- Other heaters
- Heating device
The power supply voltage is 100V/200V/220V/240V! It can be manufactured in various shapes such as convex and concave.
- Other heaters
- Heating device
The heating and insulation of cylindrical objects are designed with protrusions minimized to avoid interference with the surrounding area! Sealed types can also be manufactured.
- Other heaters
- Heating device
Introducing a cartridge heater with a compressed reduced diameter and robust structure! It is used by inserting it into a workpiece that has been drilled.
- Other heaters
- Heating device
Safe and high-performance even without gas! Able to flexibly respond to customer needs.
- Heater
- Other heaters
Composite materials - Introducing new products from the engineered fiber and microporous ultra-low thermal conductivity materials LTC series.
- fiber
- Industrial Furnace
- Composite Materials
Engineered fiber, an inorganic fiber composite that dramatically enhances the properties of the base material. Usable for various applications.
Engineered fibers are inorganic fiber products that can exhibit excellent characteristics as composite materials by adding them to raw material substances. The fiber length can be adjusted from 20μm to 1000μm to suit various applications. By removing shots (non-fiber particles) present in the product, it is possible to increase the fiber index (fiber content) to 99%. They are manufactured in Japan using IsoLite Industrial's ceramic fiber manufacturing technology. Applications: Friction materials, ceramic materials, paints, adhesives, mold release agents Features: 1. Inorganic fibers 2. Heat resistance (maximum operating temperature of 1,260 to 1,600°C) 3. Average fiber diameter of 2 to 6μm 4. Large surface area due to fiber shape 5. Lightweight and reinforcement effect of added products 6. High hardness Please feel free to contact us. We will provide support from a technical perspective tailored to your material design challenges.
A lightweight, portable high-frequency compact heating adhesive machine that operates on a household power supply of 100V!
- Other processing machines
- Heating device
Space-saving and total cost reduction! We propose heater and unit assembly.
- Heater
- Other heaters