List of Heating equipment/furnace products

  • classification:Heating equipment/furnace

1351~1395 item / All 4544 items

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Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.

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  • air conditioning

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A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.

  • Heating device

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It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...

  • Evaporation Equipment
  • Heating device
  • Electric furnace

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iPROS_MiniLab-026_220x220.jpg

★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆

This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.

  • Annealing furnace
  • Heating device
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)

  • Ceramic Heater

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.

  • Evaporation Equipment
  • Heating device
  • Electric furnace

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iPROS_MiniLab-026_220x220.jpg

★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆

This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.

  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.

  • CVD Equipment
  • Annealing furnace
  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Introducing the Thermocera Japan research and development experimental furnace. It can be utilized for material development such as fuel cells and ceramics, as well as ultra-high temperature experimen...

  • Electric furnace

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1.jpg

4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.

  • Heating device

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Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!

  • Heating device

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Adopts a titanium case with excellent corrosion resistance!

  • Heating device

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We support the drying of electronic devices and various types of printing and painting inks!

  • Heating device

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It's a special material that doesn't generate dust, so it's safe for use in precision equipment manufacturing environments!

  • Other heaters

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Magnetized ceramic heater born from years of experience!

  • Ceramic Heater

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Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.

  • Heating device

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Ideal for drying processes of electronic devices such as semiconductors and LCD glass!

  • Heating device

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High efficiency and rapid heating! An energy-saving type of heater that reduces power consumption by approximately 15%.

  • Other heaters

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Melting snow, freeze prevention, heating, and paint drying. It is useful for a wide range of applications!

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  • Other environmental equipment
  • Other heaters

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Both Company A and Company B were no good. How about in thermal engineering?

  • Other heaters

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Stable quality and mass production possible with advanced equipment heat treatment services! We will strive to provide better services to our customers.

  • Industrial Furnace

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Outdoor waterproof infrared tower heater (3000W single-phase 200V) / Model number M2758TA-3MF

  • Other heaters

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● Direct flame type that quickly heats only the necessary areas. ● Flame monitoring for abnormal combustion, detection of vibrations and tilting, overcurrent protection, abnormal voltage detection.

  • Other heaters

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The power supply voltage is 100V/200V/220V/240V! It can be manufactured in various shapes such as convex and concave.

  • Other heaters
  • Heating device

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He supports various specifications of flanges! Can be manufactured according to applications, from small to large capacities.

  • Heating device

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Custom-made production starting from one unit! Available for water, oil, and heating of chemical solutions and solvents.

  • Other heaters

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High efficiency and clean heat source! Short delivery time from lamp design to prototype.

  • Heating device

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No need for temperature adjustment since the day before, improved yield even with thawing on the day!

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  • FRT-10 ドアー閉(S190073・沖縄食鶏加工).jpg
  • Heating device

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Notice of Participation in the 36th West Japan Food Industry Creation Exhibition '26 (May 20, 2026 (Wed) - May 22 (Fri))

Yamamoto Vinita will be exhibiting at the "36th Western Japan Food Industry Creation Exhibition '26" held at Tokyo Big Sight. Booth Number: West 4 Hall, Booth No. W4-39-05 *Exhibited Equipment: High-Frequency Rapid Thawing Device TEMPERTRON-VI Type - Thawing of beef, pork, chicken, vegetables, seafood, etc. - Heating and melting of dairy products such as butter, margarine, and chocolate - Achieves automation and labor-saving through rapid thawing. - This device can effectively heat even thick raw materials to the center. On the day of the event, we will also have a consultation desk for specific inquiries regarding thawing, heating, drying, and sterilization using radio waves (high frequency and microwaves). [Reasons for Improvement with High-Frequency Thawing] - Automation and line integration from raw material thawing to product completion on the day. - Thawing and heating in a short time frame of 20 to 30 minutes. - Reduction of personnel through automation of thawing and continuous thawing processes. - Ensuring thorough thawing of the center (uniform thawing quality) (elimination of surface drip loss). - Thawing without using water (reduction of water usage) (improvement of hygiene) (improvement of labor environment). - Elimination of excessive thawing (eradication of refreezing: reduction of food waste: thawing the necessary amount at the necessary time). Various companies have achieved improvements in their issues.

By using internal heating with radio waves, we achieve high-quality heating and drying without compromising the flavor of the breadcrumbs.

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  • Heating device

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Even poorly formed candies can be melted down without compromising quality. Achieve zero waste!

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  • Heating device

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High-frequency waves allow for the defrosting of food while still in cardboard. Add value with delivery after defrosting!

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  • FRT-60(ニチレイロジ東扇島).jpg
  • Heating device

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By introducing a high-frequency thawing device, we can achieve a reduction in the processes of "breaking down raw materials and loosening in running water"! Here are examples of frozen raw materials (...

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  • Heating device

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A compact and time-efficient sterilization device. It contributes to food waste reduction.

  • Heating device

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Quality preservation of frozen food ingredients! Continuous and high-speed processing of large quantities of frozen products. Automation of the entire process from thawing to processing has been achie...

  • Heating device

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A heating device that is compact and heats quickly.

  • Heating device

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A drying device that is compact and dries in a short time. It does not compromise flavor or quality after drying.

  • Heating device

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Quick to start up and warms up immediately. It performs excellently outdoors as it is not affected by the wind. Easy to carry, lightweight at 4.0 kg (including the cage).

  • Other heaters

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Mixing under vacuum, pumping, and temperature control all in one machine! It can be used for applications such as heated mixing, vacuum degassing, and heating. If you use a mantle heater, it can be ut...

  • Heating device

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Various heating, curing, and drying solutions at a small size and low cost! Equipped with PTFE-coated mesh belts.

  • Drying Equipment
  • Other heaters

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Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!

  • Heating device

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Custom-made bar conveyors and customization of fixed-type drying ovens!

  • Other heaters
  • Drying Equipment
  • Conveyor

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Just stick it on for fire prevention! A new type of fire extinguisher that can effectively extinguish fires while saving space!

  • Heating device

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A case where the heat transfer rate improved, resulting in a 15% enhancement in heat exchange rate and achieving energy savings.

  • Other heaters
  • Heat exchanger

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