List of CVD Equipment products

The purpose depends on your ideas! A small swivel bearing "Rakkaru" that allows you to easily and lightly rotate heavy objects!

• Metal bearings

Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.

• Other safety and hygiene products

Lathe machining / Aluminum processing / Precision parts machining

• CVD Equipment
• Sputtering Equipment
• Annealing furnace

Metal processing / Osaka / Stainless steel

• Other semiconductor manufacturing equipment
• CVD Equipment
• Etching Equipment

A5056 processed products, individual items, machining processing [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Ashing device
• Semiconductor inspection/test equipment

CNC lathe processing, aluminum precision cutting, semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• CVD Equipment
• Ion implantation equipment

A5056 / Lathe processing / Aluminum processing [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

Aluminum cutting / A5052 / Lathe processing / Osaka [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Sputtering Equipment
• Semiconductor inspection/test equipment

Plasma CVD equipment

• CVD Equipment

We will introduce the trench processing of GaN based on our past processing achievements.

• CVD Equipment

As a result of GaN microLED mesa processing, we have published emission spectral data during the GaN microLED mesa processing!

• CVD Equipment

Plasma CVD equipment

• CVD Equipment

It includes a comparison of blade dicing and plasma dicing.

• CVD Equipment

We are publishing new data on the non-bosch process for silicon.

• CVD Equipment

As an effect of Aqua Plasma, we are publishing results of surface depth analysis by ESCA.

• CVD Equipment

We offer sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

- A wide range of standard-sized products - Easy installation - Precision sintering diffusion bonding (simultaneous sintering) - High flow rate

• CVD Equipment

Aluminum processing, anodizing treatment, Osaka [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• CVD Equipment
• Evaporation Equipment

Stainless processing, milling processing [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

The horizontal tolerance is +0.2/0-0mm, and the thickness tolerance is +/-0.05mm! Let me introduce the electronic grade CVD.

• CVD Equipment
• others

We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

The surface roughness Ra is polished, Ra < 5nm! We introduce optical grade single crystals.

• CVD Equipment
• others

Introducing polycrystalline mechanical options with thicknesses of 0.25mm and 0.50mm!

• CVD Equipment
• others

Designing thermal conductivity from 1,000 W/mK to over 2,000 W/mK! Introducing polycrystalline thermal materials.

• CVD Equipment
• others

Suitable for commercial use! It has very stable and predictable characteristics and behavior.

• CVD Equipment
• others

The horizontal tolerance is +0.1/0-0mm! Introducing single crystal mechanical components.

• CVD Equipment
• others

It is an introduction device that transmits linear motion from the atmospheric side to samples and equipment in a vacuum.

• Sputtering Equipment
• CVD Equipment
• Other semiconductor manufacturing equipment

Please use it for deposition protection and light/beam blocking for the viewing port.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

We will manufacture a vacuum chamber.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

Aluminum five-axis machining Osaka [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Other semiconductor manufacturing equipment

Non-contact transport device for gripping ultra-thin warped wafers without touching them.

• Other semiconductor manufacturing equipment
• CVD Equipment
• Heating device

Osaka Cutting Mass Production Lathe Processing and Machining Processing [Leave cost reduction to Filir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Other semiconductor manufacturing equipment

Aluminum precision parts, lathe processing, machining processing [Leave cost reduction to Filir Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Semiconductor inspection/test equipment

Aluminum precision machining Osaka 【Leave cost reduction to Philir Co., Ltd.】

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

Five-axis machining for semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Etching Equipment

Aluminum semiconductor device parts processing [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

Machined parts of semiconductor manufacturing equipment A5052 round [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment

Precision parts for semiconductor manufacturing equipment 【Leave cost reduction to Philir Co., Ltd.】

• CVD Equipment

Semiconductor manufacturing equipment, milling, aluminum precision parts 【Leave cost reduction to Filir Co., Ltd.】

• CVD Equipment
• Other semiconductor manufacturing equipment

High-purity carbon is used extensively in the ion implantation process of semiconductor manufacturing, which requires high purity. Here is an introduction to high-purity carbon.

• Fine Ceramics
• Ion implantation equipment
• CVD Equipment

ALD (Atomic Layer Deposition) equipment dedicated to particles can deposit films on nanoscale particles.

• Lithium-ion battery
• CVD Equipment
• Other surface treatment equipment

Three types of sedimentation devices are available! Please choose according to your needs.

• CVD Equipment

A DLC film with high infrared transmittance is formed on both sides of the substrate at a high rate. Achieving next-generation IR coating with stable hard and advanced soft materials.

• Plasma surface treatment equipment
• Plasma Generator
• CVD Equipment

Compact the device size as much as possible! Achieve stable film formation and low particle count.

• CVD Equipment

Adopting SiC trays! A system that enables mass production while keeping costs down.

• CVD Equipment

We can accommodate a variety of materials and specifications.

• Sealing
• CVD Equipment
• Evaporation Equipment