List of Ashing device products
- classification：Ashing device
1～36 item / All 36 items
For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.
- Work gloves
Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.
Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.
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Introduction to Particle-PLUS Analysis Case: "Plasma Analysis of Dual Frequency CCP" Simulation Case
- Etching Equipment
- Wafer
- Ashing device
【Exhibition Participation!】Ideal for surface modification of BGA substrates and lead frames! Achieves processing effects close to vacuum RIE plasma through the adoption of a unique system!
- Ashing device
It is a versatile and compact device that enables etching, ashing, and ion cleaning!
- Etching Equipment
- Ashing device
"The lamp has a long lifespan" - Economical with low running costs!
- Ashing device
Equipped with a new plasma source HCD (hollow cathode discharge) electrode, capable of etching various metals and Cu thin films. A new type of etching device that also facilitates large-area processin...
- Etching Equipment
- Ashing device
- Plasma surface treatment equipment
We have a proven track record for customers in OSAT around the world and have established our position with reliable performance.
- Ashing device
From batch processing equipment equipped with unique wafer transfer machines to sheet processing equipment, they are used in fabs around the world for MEMS and semiconductors.
- Ashing device
Achieving high-density plasma with a simple mechanism. Compatible with substrates from wafers to 1 m². Damage-free etching of Si-based materials, metals, organic films, and various thin films.
- Etching Equipment
- Ashing device
- Plasma surface treatment equipment
H2 (Surface cleaning of various substrates using the reducing power of hydrogen plasma. Improved hydrophilicity and wettability due to the removal of surface oxide layers. A new surface cleaning techn...
- Ashing device
- Plasma surface treatment equipment
- Other surface treatment equipment
Compact tabletop plasma device PiPi
- Etching Equipment
- Ashing device
- Surface treatment contract service
A plasma cleaner that can be customized to meet your needs.
- Etching Equipment
- Ashing device
- Other semiconductor manufacturing equipment
50-piece batch plasma ashing system (asher) compatible with 6-inch and 8-inch wafers. There is also a wafer single-piece processing type available.
- Ashing device
- Other semiconductor manufacturing equipment
Machining/Metalworking
- Etching Equipment
- Ion implantation equipment
- Ashing device
A5056 processed products, individual items, machining processing [Leave cost reduction to Philir Co., Ltd.]
- CVD Equipment
- Ashing device
- Semiconductor inspection/test equipment
Dry etching equipment, reactive ion etching equipment, compact etcher, ashing equipment, cleaner (cleaning equipment)
- Etching Equipment
- Ashing device
- Other semiconductor manufacturing equipment
Cleaning equipment, UV/O3 cleaning equipment, dry cleaning equipment, cleaner (cleaning device), stripper (stripping device)
- Ozone Generator
- Ashing device
- Other semiconductor manufacturing equipment
Supports automated mass production lines. Inline type, sheet type, and various types with flexible hardware configurations, all with a proven track record of high effectiveness of vacuum plasma in mas...
- Plasma surface treatment equipment
- Etching Equipment
- Ashing device
We protect the environment with dry cleaning plasma technology and significantly improve the productivity of semiconductor devices.
- Etching Equipment
- Ashing device
- Other semiconductor manufacturing equipment
A plasma cleaning device with extensive experience in removing DLC films from aspherical lenses. An essential dry film removal device for the repair of high-value-added molds.
- Etching Equipment
- Ashing device
- Plasma surface treatment equipment
Damage-free, high throughput, multi-purpose compatible high-end devices, compound semiconductors, and MEMS. Extensive track record and comprehensive support. New type now available.
- Ashing device
- Etching Equipment
- Plasma surface treatment equipment
Carefully responding to niche demands. Light etching and ashing for thin wafers and double-sided processing, compact type CtC etching equipment.
- Etching Equipment
- Ashing device
- Plasma surface treatment equipment
Damage-free, high rate, large area compatible, complete removal of ion damage, achieving complete radical processing. High-performance plasma ashing device.
- Ashing device
"Plami-α" is a compact and user-friendly atmospheric pressure plasma generation device. It can be easily used for surface modification and activation anytime, anywhere!
- Plasma surface treatment equipment
- Ashing device
- others
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
"TSP" protects the line from product defects caused by instantaneous voltage drops and damages from equipment failures.
- CMP Equipment
- Ashing device
- Ion implantation equipment
Compact and low-cost tabletop plasma treatment device Harrick Plasma PDC-001 / Plasma Cleaner
- Plasma surface treatment equipment
- Ashing device
- others
Industry's smallest size! Compact and low-cost tabletop plasma treatment device.
- Plasma surface treatment equipment
- Ashing device
- others
Small Plasma Cleaner (Simple Sheet-Type Plasma Cleaner)
- Etching Equipment
- Ashing device
Plasma processing device (multi-purpose plasma etcher)
- Etching Equipment
- Ashing device
- Other processing machines
Single-wafer plasma etching processing device (single-wafer plasma etcher)
- Etching Equipment
- Ashing device
- Wafer processing/polishing equipment
Batch-type plasma ashing device for 50 wafers at once.
- Etching Equipment
- Ashing device
- Circuit board processing machine