List of Heating device products
- classification：Heating device
496～540 item / All 1911 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.
- Other safety and hygiene products
Operable within an air ratio range of 0.7 to 1.0! A burner with high safety that eliminates concerns about backfire.
- Heating device
No need for a combustion blower! A burner that makes ignition and extinguishing operations easy.
- Heating device
A structure that does not create localized high-temperature areas in flames! A low NOx burner suitable for heat treatment furnaces and heating furnaces.
- Heating device
High thermal efficiency through direct heat exchange between gas and liquid! A burner that prevents liquid surface dancing and enables quiet combustion.
- Heating device
Durable and sturdy cast iron! Burner suitable for low-temperature heating devices.
- Heating device
Design and manufacturing of gas industrial furnaces, electric furnaces, and labor-saving machines are possible!
- Heating device
By rapidly heating the adhesive surface between the coating and the steel material, it is possible to remove thick coatings! *Demonstration with actual equipment available!
- Heating device
Contributing to the reduction of work time and improvement of quality! For tightening and loosening bolts.
- Heating device
[Sample test and demo loan available] This is an embedded heat source suitable for research use!
- Heating device
Many achievements, especially in the food industry! This steam heating device is suitable for a wide range of applications such as heating, drying, and cleaning, with easy operation.
- Heating device
Reduction of working hours and improvement of quality! For boilers in thermal power plants, self-generating plants, clean centers, etc.
- Heating device
Stainless steel mantle heater capable of high-temperature heating and melting operations.
- Heating device
The induction heating power supply EKOHEAT is an excellent heating source that enables clean and rapid heating for large workpieces.
- Heating device
Lightweight, compact clean induction heating (IH) power supply "EASYHEAT"
- Heating device
Currently conducting sales and purchases of used food machinery and food processing manufacturing equipment!!
- Food Processing Equipment
- Other food machinery
- Heating device
By rotating and elevating the work, it can be heated uniformly on the surface!
- Heating device
Manufacturing of consumables such as insulation materials and heaters! Products used for various heat treatments.
- Heating device
Graphite parts for heat treatment that utilize high heat resistance and low thermal expansion characteristics of carbon! 【We propose materials and processing tailored to your needs!】
- Heating device
High vacuum specification heating micro-prober! The heating temperature can reach up to 500°C, and it supports sample heating with a 10mm shape!
- Heating device
It is possible to defrost while still in boxes such as cardboard and Styrofoam! High-frequency defroster "Tempatron"!
- Food Processing Equipment
- Other food machinery
- Heating device
The heater capacity is 5KW x 2! The cylinder is air-driven, making it easy to move within the factory.
- Heating device
The slide device has a front manual entry and exit method! Compatible with locating rings for injection molding.
- Heating device
It is capable of delivering air in layers, characterized by stable and uniform airflow.
- Heating device
- Drying Equipment
Maintaining press pressure, rapid cooling begins from 370℃! It is possible to manufacture various products.
- Heating device
- Cooling system
- others
It is a vacuum heating device for distillation, separation, concentration, and drying.
- Heating device
We have started a subscription that includes "induction heating equipment + after-service."
- Heating device
We have started a subscription for "after-service" for induction heating equipment for net sales.
- Heating device
Netsuren will periodically measure the cooling ability of the coolant (quenching liquid).
- Contract measurement
- Contract Analysis
- Heating device
Heat treatment technology that simultaneously achieves high strength and high precision.
- Engine parts
- Heating device
- Metal bearings
Supports heating and curing of resins and plastics! Inline compatible with the adoption of a network conveyor system.
- Heating device
Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.
- Heating device
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ High-precision APC process control with MFC ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, vertical lift, and heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
【MiniLab-125】 Multi-target sputtering system (compatible with Φ8") equipped with a 1000℃ heater stage (SiC coating)! Compact size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Triple-source simultaneous deposition + Single-source Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to the three-source cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → Used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC-coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low-power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed via touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber configurations are also possible. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc., can also be configured.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ High-precision APC process control with MFC ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, vertical lift, and heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇
This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ High-precision APC process control with MFC ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, vertical lift, and heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller