List of Heating equipment/furnace products
- classification：Heating equipment/furnace
1306～1350 item / All 4542 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
Netsuren will periodically measure the cooling ability of the coolant (quenching liquid).
- Contract measurement
- Contract Analysis
- Heating device
Heat treatment technology that simultaneously achieves high strength and high precision.
- Engine parts
- Heating device
- Metal bearings
Products used in high-temperature environments! Heat-resistant steel canning and welding processing!
- Industrial Furnace
This is a small-sized test rotary kiln that can fire trial materials at a small scale.
- Industrial Furnace
We propose a small batch rotary kiln capable of small lot production for various testing purposes.
- Industrial Furnace
We provide an energy-saving, high-speed enamel wire baking furnace that combines a direct combustion burner with a catalytic combustion heat recovery system.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
We propose a small batch furnace capable of producing small lots for various tests and materials that cannot be processed by rotary kilns.
- Industrial Furnace
It will be a high-temperature atmosphere furnace. There are achievements with temperatures up to 2,000℃.
- Industrial Furnace
Samples that require long firing times (over 4 hours) are recommended to be processed in a batch-type rotary kiln.
- Industrial Furnace
We safely remove oil, water, and contaminants from aluminum shavings (active metals), which are often involved in fire and explosion accidents, to achieve stable operations and increased added value.
- Industrial Furnace
It is a furnace for manufacturing insulation materials (rock wool) for various purposes.
- Industrial Furnace
We provide "quality improvement" and "safe melting" of briquettes for users struggling with briquette recycling.
- Industrial Furnace
We propose a high value-added and energy-saving superheated steam system compared to conventional methods (such as direct combustion types).
- Industrial Furnace
It will be a high-temperature atmosphere furnace. A crucible-type melting furnace with a lifting device can also be attached.
- Industrial Furnace
We propose equipment and systems that fuse "Tanabe's technical know-how" with "superheated steam."
- Industrial Furnace
We provide rotary kilns that enable continuous firing under an inert gas atmosphere by adopting carbon heaters and carbon retorts.
- Industrial Furnace
It is a device that controls the amount of slag discharge.
- Industrial Furnace
This is an automatic opening and closing device for the tap used during metal and slag pouring.
- Industrial Furnace
This is a device for automatically adding artificial graphite electrodes (for 10 and 12 inch use).
- Industrial Furnace
High Temp. Continuous Firing Furnace
- Ceramic Heater
Stirring and circulating hot air in the furnace with a fan to equalize the temperature distribution! Developing materials that can withstand ultra-high temperatures.
- fan
- Industrial Furnace
50V specification, achieving rapid heating in 15 seconds! Contributes to significant reduction in work cycle and improvement in productivity.
- Other heaters
Radiation panel, heat source with long lifespan! Far infrared heaters that create new energy.
- Other heaters
Rapid heating and cooling in 30 seconds is possible! Quick temperature rise even with far infrared.
- Other heaters
Compact, low-cost, and highly versatile! It features an upper and lower heater system that delivers excellent work efficiency.
- Other heaters
Supports heating and curing of resins and plastics! Inline compatible with the adoption of a network conveyor system.
- Heating device
Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.
- Heating device
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)
- Ceramic Heater
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.