List of Heating device products
- classification：Heating device
586～630 item / All 1960 items
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
A structure that does not create localized high-temperature areas in flames! A low NOx burner suitable for heat treatment furnaces and heating furnaces.
- Heating device
High thermal efficiency through direct heat exchange between gas and liquid! A burner that prevents liquid surface dancing and enables quiet combustion.
- Heating device
Durable and sturdy cast iron! Burner suitable for low-temperature heating devices.
- Heating device
Design and manufacturing of gas industrial furnaces, electric furnaces, and labor-saving machines are possible!
- Heating device
By rapidly heating the adhesive surface between the coating and the steel material, it is possible to remove thick coatings! *Demonstration with actual equipment available!
- Heating device
Contributing to the reduction of work time and improvement of quality! For tightening and loosening bolts.
- Heating device
[Sample test and demo loan available] This is an embedded heat source suitable for research use!
- Heating device
Many achievements, especially in the food industry! This steam heating device is suitable for a wide range of applications such as heating, drying, and cleaning, with easy operation.
- Heating device
Reduction of working hours and improvement of quality! For boilers in thermal power plants, self-generating plants, clean centers, etc.
- Heating device
Stainless steel mantle heater capable of high-temperature heating and melting operations.
- Heating device
The induction heating power supply EKOHEAT is an excellent heating source that enables clean and rapid heating for large workpieces.
- Heating device
Lightweight, compact clean induction heating (IH) power supply "EASYHEAT"
- Heating device
Currently conducting sales and purchases of used food machinery and food processing manufacturing equipment!!
- Food Processing Equipment
- Other food machinery
- Heating device
By rotating and elevating the work, it can be heated uniformly on the surface!
- Heating device
Manufacturing of consumables such as insulation materials and heaters! Products used for various heat treatments.
- Heating device
Graphite parts for heat treatment that utilize high heat resistance and low thermal expansion characteristics of carbon! 【We propose materials and processing tailored to your needs!】
- Heating device
High vacuum specification heating micro-prober! The heating temperature can reach up to 500°C, and it supports sample heating with a 10mm shape!
- Heating device
The heater capacity is 5KW x 2! The cylinder is air-driven, making it easy to move within the factory.
- Heating device
The slide device has a front manual entry and exit method! Compatible with locating rings for injection molding.
- Heating device
It is capable of delivering air in layers, characterized by stable and uniform airflow.
- Heating device
- Drying Equipment
Maintaining press pressure, rapid cooling begins from 370℃! It is possible to manufacture various products.
- Heating device
- Cooling system
- others
It is a vacuum heating device for distillation, separation, concentration, and drying.
- Heating device
We have started a subscription that includes "induction heating equipment + after-service."
- Heating device
We have started a subscription for "after-service" for induction heating equipment for net sales.
- Heating device
Netsuren will periodically measure the cooling ability of the coolant (quenching liquid).
- Contract measurement
- Contract Analysis
- Heating device
Heat treatment technology that simultaneously achieves high strength and high precision.
- Engine parts
- Heating device
- Metal bearings
Supports heating and curing of resins and plastics! Inline compatible with the adoption of a network conveyor system.
- Heating device
Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.
- Heating device
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
★☆★☆【MiniLab-026】Small Thin Film Experimental Device for R&D Development★☆★☆
This is a flexible thin film experimental device for R&D that eliminates waste by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug & Play feel, achieving compact size, space-saving design, simple operation, and high cost performance. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 2, organic materials x4), and can also be equipped with a substrate heating stage, allowing for the production of annealing devices and RF etching. There is also a glove box storage type available (specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 poles with automatic switching via controller) ◉ Organic evaporation cell: 1cc or 5cc ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous film deposition, HiPIMS, automatic film deposition controller, custom substrate holders, load lock, substrate rotation/heating/cooling, and many more options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Efficient direct heating through radiative heat transfer with wavelengths from 3μm to 1000μm.
- Heating device
Efficiently heats almost all substances except metals! Also for the drying process in semiconductor and liquid crystal panel manufacturing!
- Heating device
Adopts a titanium case with excellent corrosion resistance!
- Heating device
We support the drying of electronic devices and various types of printing and painting inks!
- Heating device
Cleanroom-compatible type! Made with special materials that do not generate dust, ensuring safety even in precision equipment manufacturing environments.
- Heating device