Of course, RCA, development, etching, cleaning, stripping, lift-off, etc.! We have a wealth of experience in various process treatments.
The device achieves complete separation and reuse of chemical solutions, and is a manual Spin single-wafer processing device capable of handling the full process of chemical treatment ⇒ rinsing ⇒ drying in one spin.
It significantly reduces footprint and costs, and is already patented. It can accommodate not only round substrates but also square-shaped substrates.
It has a proven track record in various process treatments such as "RCA," "developing," "etching," "cleaning," "stripping," and "lift-off."
【Features】
■ It is possible to consolidate various chemical treatment processes such as cleaning and etching into a single total system.
■ It can significantly reduce equipment purchase costs and footprint.
■ Since transfer between chambers is unnecessary, it reduces workpiece attachment and detachment, streamlining operations and preventing transport accidents, thereby improving transport reliability.
*For more details, please refer to the PDF document or feel free to contact us.
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