High-Rate Depo. Piezoelectric Film Formation Sputtering Device
For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!
The "piezoelectric film formation sputtering device" is a product that enables continuous film formation from a single crystal epitaxial buffer layer to a piezoelectric film. Through plasma analysis and feedback control using a plasma emission monitor, it allows for fast and stable reactive sputtering, as well as the detection of elements that contribute to the degradation of piezoelectric properties. It is equipped with our unique rapid heating and cooling substrate heating mechanism, achieving a substrate temperature of 900°C. *For more details, please refer to the PDF materials or feel free to contact us.
- 企業:ジャパンクリエイト
- 価格:Other