Copper (Cu) concentration measurement monitor (high concentration) / MB27CM-613K-H
This device continuously measures the copper concentration in electrolytic copper sulfate plating solution and copper sulfate etching solution using the spectrophotometric method.
By recording the concentration in the solution and connecting the output signal to the control system, the copper concentration can be continuously maintained at the optimal level. Additionally, the detector is equipped with reference light, allowing for automatic correction of the LED light intensity changes, enabling accurate measurement of copper sulfate concentration.
- Company:シロ産業
- Price:Other