マツボー List of Products and Services

The difference from other companies is that, through a license with BOC, we can deposit rotary cathodes (with a target usage efficiency of 70%) and SiOx(C) films using a special CVD process. Additionally, the line speed can be varied up to 2000 times.

This product is a device that can form a parylene film with excellent adhesion. We sell equipment that can be used not only for research and R&D but also for mass production. Additionally, we have sold over 50 units of this equipment, which is already in use on production lines. The features of this device are as follows: - The cleaning and maintenance of the device are easy. - Pre-treatment to improve adhesion with the substrate can be processed in-situ. - The process can be executed by the PLC attached to the device. The film deposition recipe logs can also be output as CSV files. - Customization of the device is possible.

The particle ALD (Atomic Layer Deposition) system for research and development can be utilized for various development purposes. It is capable of processing film formation on nanoscale particles from milligrams to kilograms. - Uniform control of film thickness using methods including fluidized beds - Three sizes of reactors with different capacities - Individual temperature control for multiple precursors - Ability to deposit various films on diverse particle materials - Easy creation of custom recipes and automated operation - Removable particle containers * There is also a lineup of equipment for mass production.

This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.

The manufacturing and handling of indium compounds, cobalt and its inorganic compounds, as well as formulations and others containing these in amounts exceeding 1% by weight, are subject to regulation.

ISYS Corporation's hybrid PVD coating equipment is designed according to specifications, including chamber dimensions and the number of sources. The HCD-equipped arc ion plating device features a combined installation of deposition sources (HCD [Hollow Cathode] + AIP [Arc Ion]). Bombardment with HCD uses Ar ions with an ionization rate of 90% for powerful etching. The shutter system reduces droplets through a front shutter on the deposition source. The uniquely developed iD film generates a film with a compositional gradient in the depth direction. The iD film application films include TiN, CrN, TiCN, TiCrN, TiAlN, AlTiN, ZrN, TiZrN, TiSiN, TiAlSiN, and applications include surface modification for cutting tools, molds, electronic components, as well as coloring for decorative steel plates, mobile phone cases, doors, etc. For more details, please contact us or refer to the catalog.