マツボー Product Lineup

This product is a device that can form a parylene film with excellent adhesion. We sell equipment that can be used not only for research and R&D but also for mass production. Additionally, we have sold over 50 units of this equipment, which is already in use on production lines. The features of this device are as follows: - The cleaning and maintenance of the device are easy. - Pre-treatment to improve adhesion with the substrate can be processed in-situ. - The process can be executed by the PLC attached to the device. The film deposition recipe logs can also be output as CSV files. - Customization of the device is possible.

The particle ALD (Atomic Layer Deposition) system for research and development can be utilized for various development purposes. It is capable of processing film formation on nanoscale particles from milligrams to kilograms. - Uniform control of film thickness using methods including fluidized beds - Three sizes of reactors with different capacities - Individual temperature control for multiple precursors - Ability to deposit various films on diverse particle materials - Easy creation of custom recipes and automated operation - Removable particle containers * There is also a lineup of equipment for mass production.

This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.

We propose a unique structure of pad conditioner covered with diamond for use in the CMP process by Morgan Advanced Ceramics. This structure features diamond abrasives coated on a silicon substrate or a ceramic substrate using CVD. We have achieved a strong chemical bond at the molecular level between the diamond abrasives and the substrate. It also has strong slurry resistance, with no chemical erosion from the slurry. Additionally, there is no loss or crushing of the diamond, and control over the density of the diamond abrasives is possible. For more details, please contact us.

We propose WAFAB INTERNATIONAL's chemical etching/texturing equipment and flexible wet process systems. We have delivered over 1,000 units, including manual, semi-automatic, and fully automatic wet etching systems for semiconductors, to end users and major equipment manufacturers, and we also have a track record of supplying equipment to thin-film solar cell manufacturers. Depending on substrate size, throughput, and chemicals used, we can offer solutions ranging from manual batch R&D equipment to fully automated production systems. For more details, please contact us or refer to our catalog.

This is a groundbreaking and unique technology that uses patented nanofilter elements to separate only organic solvents from process solutions and waste liquids. Compared to distillation methods, energy consumption is reduced by 90%, and investment can typically be recovered in 2 to 3 years. It allows for the regeneration of unused waste solvents while keeping initial costs low, thus reducing the cost of solvent usage. CO2 emissions are also significantly reduced, contributing to corporate social responsibility and enhancing the company's image through the use of green technology. The filter elements are resistant to strong solvents, acids, and alkalis. Examples of compatible organic solvents include: acetone, acetonitrile, DMAc, DMF, DMSO, ethyl acetate, ethanol, hexane, isopropanol, PGME, IPA, methanol, PGME, PGMEA, THF, NMP,....