マツボー List of Products and Services

This product is a device that can form a parylene film with excellent adhesion. We sell equipment that can be used not only for research and R&D but also for mass production. Additionally, we have sold over 50 units of this equipment, which is already in use on production lines. The features of this device are as follows: - The cleaning and maintenance of the device are easy. - Pre-treatment to improve adhesion with the substrate can be processed in-situ. - The process can be executed by the PLC attached to the device. The film deposition recipe logs can also be output as CSV files. - Customization of the device is possible.

The particle ALD (Atomic Layer Deposition) system for research and development can be utilized for various development purposes. It is capable of processing film formation on nanoscale particles from milligrams to kilograms. - Uniform control of film thickness using methods including fluidized beds - Three sizes of reactors with different capacities - Individual temperature control for multiple precursors - Ability to deposit various films on diverse particle materials - Easy creation of custom recipes and automated operation - Removable particle containers * There is also a lineup of equipment for mass production.

This technology allows for the optimization of the manufacturing of barrier films, optical multilayer film products, functional fibers, displays, and a series of related custom applications. The PlasmaMAX hollow cathode can be customized in shape, making it easy to integrate into horizontal inline vacuum deposition systems, vertical inline vacuum deposition systems, and roll-to-roll web coating processes. With an easily customizable design platform and stable processes across a wide range of pressure levels, it can be used with most existing CVD and PVD equipment, enabling performance optimization at a low cost.

We propose WAFAB INTERNATIONAL's chemical etching/texturing equipment and flexible wet process systems. We have delivered over 1,000 units, including manual, semi-automatic, and fully automatic wet etching systems for semiconductors, to end users and major equipment manufacturers, and we also have a track record of supplying equipment to thin-film solar cell manufacturers. Depending on substrate size, throughput, and chemicals used, we can offer solutions ranging from manual batch R&D equipment to fully automated production systems. For more details, please contact us or refer to our catalog.

ISYS Corporation's large-area ion beam irradiation device modifies the surface of materials through doping without film formation. The ion beam device alters the surface by injecting accelerated ions into the product surface. It enhances the surface properties of metals, ceramics, and polymers. The ion beam energy is up to 300 KeV, the ion beam current ranges from 5 to 50 mA, and the ion beam irradiation area is 400mm x 400mm. The processing effects include improvements in mechanical properties such as increased wear resistance, enhanced fatigue resistance, and reduced friction. Additionally, improvements in electrical/optical properties include increased electrical conductivity and UV blocking. Furthermore, enhancements in chemical properties include hydrophilicity/hydrophobicity, oxidation resistance, corrosion resistance, and amorphization. For more details, please contact us or refer to the catalog.

The Flash Lamp Annealing device, FLA, is a standalone unit designed for DTF-FLA ultra-short time annealing. It is capable of ultra-short annealing times ranging from a few milliseconds to several hundred milliseconds for semiconductor materials and other materials. The very short pulses (micro/millisecond level) from the xenon flash lamp heat only the surface at an ultra-fast heating rate, making it a compact research and development device suitable for applications such as annealing films on flexible substrates and substrates with low heat resistance. It is compact, user-friendly, and ideal for research and development in various applications. For more details, please contact us or refer to the catalog.

We propose a unique structure of pad conditioner covered with diamond for use in the CMP process by Morgan Advanced Ceramics. This structure features diamond abrasives coated on a silicon substrate or a ceramic substrate using CVD. We have achieved a strong chemical bond at the molecular level between the diamond abrasives and the substrate. It also has strong slurry resistance, with no chemical erosion from the slurry. Additionally, there is no loss or crushing of the diamond, and control over the density of the diamond abrasives is possible. For more details, please contact us.

Since its establishment in 1964, South Korea's A-tech has been providing thin film manufacturing equipment tailored to customer needs. The Desktop Pro is a compact, high-performance sputtering device that can be installed on a desktop and offers economic advantages. It is ideal for material property research, product QC and QA, and semiconductor failure analysis. ■ For details, please download the catalog ■ ● Inquiries: 03-5472-1722 (TEL)