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The "KSM-152-50Z/150Z" is a semi-manipulator with a hollow structure XYZ mechanism designed to accommodate various purposes and applications for users. The drive units for the X and Y axes use micrometer heads, with a movement of 0.5mm per rotation for each. The Z axis is equipped with a graduated scale on the side, allowing for precise movements and fine adjustments. Additionally, if you are using the ICF-152 type connection flange, field-through connections can be made via the six introduction ports (ICF-34FT connection) installed on the upper part of the connection flange. 【Features】 ■ Usable up to ultra-high vacuum regions ■ Flexible operation for the X and Y axes ■ Can be used as a simple tilt mechanism of up to 2° by using the tilt screw on the front of the main body ■ Allows for movement and positioning operations of samples, etc., in ultra-high vacuum environments from the atmospheric side, such as in deposition devices and MBE systems *For more details, please refer to the PDF materials or feel free to contact us.
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Free membership registrationThe "KSM-114-50Z/150Z" is a semi-manipulator that offers flexibility in the operation of the X and Y axes and can be used in ultra-high vacuum environments. The Z axis is equipped with a scale on the side, allowing for precise movements and fine adjustments. By using the tilt screw on the front of the main body, it can also function as a simple tilt mechanism with a maximum tilt of 2°. Movement and positioning operations of samples, etc., can be performed from the atmospheric side in ultra-high vacuum environments, such as in deposition devices and MBE systems. 【Features】 ■ Usable in ultra-high vacuum environments ■ Micrometer heads are used for the drive components of the X and Y axes ■ Movement per rotation is 0.5mm each ■ If the connecting flange is of the ICF-152 type, field-through and other connections can be made via the six introduction ports (ICF-34FT connection) installed on the top of the connecting flange. *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "KSM-70-50Z" is a semi-manipulator with a hollow structure XYZ mechanism as its main body. By incorporating innovative features in the bellows, it provides flexibility in the movements of the X and Y axes, and a graduated scale is installed on the side of the Z axis, allowing it to be used for precise movements and fine adjustments. When the connection flange is of the ICF-152 type, field-through connections can be made from the six introduction ports (ICF-34FT connection) installed on the upper part of the connection flange. 【Features】 ■ Usable up to ultra-high vacuum areas ■ Micrometer heads are used for the drive components of the X and Y axes ■ The movement per rotation is 0.5mm for each axis ■ By using the tilt screw on the front of the main body, it can also be used as a simple tilt mechanism with a maximum tilt of 2° *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "KUD series" consists of two types: manual drive and motor drive, and is a hollow-structured linear introduction device. The interior of the container is treated with electropolishing, making it usable up to ultra-high vacuum levels. It allows for the insertion of sample holders, electrodes, thermocouples, etc., into the ultra-high vacuum area for linear motion. Additionally, a graduated scale is installed on the side, enabling it to be used for precise movements and fine adjustments. 【Features】 ■ Maximum travel distance options of 50mm and 100mm ■ A graduated scale on the side allows for precise movements and fine adjustments ■ Maximum travel distances available in six options: 50mm, 100mm, 150mm, 200mm, 250mm, and 300mm ■ If the travel distance exceeds 300mm, the shape will differ from other travel distance options *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThis product is a protective shutter for viewing ports for deposited materials in a vacuum container. It is a butterfly-style full-open type, providing a wide field of view. It can also be applied to cut RHEED, light, beams, etc. Each component is treated with electrolytic polishing, making it suitable for use in ultra-high vacuum environments. 【Features】 ■ The shutter drive unit is equipped with KMMR-34S ■ Available in various sizes: ICF-70, 114, 152, 203 ■ Compatible with various viewing ports ■ The stopper allows for setting any desired opening angle ■ Allowable leak rate is ≦1.33×10-11Pa·m3/sec ■ Allowable heating temperature is ≦200℃ *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationWe manufacture welded bellows and formed bellows according to the specifications requested by our customers. Additionally, we have a wide variety of standard products available, tailored to different flange types and bellows lengths.
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Free membership registration●Entry Hatch - Since it complies with the ICF standard, it can be used with your existing equipment. - The flange of the ICF standard can be changed to a simple hatch with O-ring specifications. - Sample introduction into the load lock chamber and other areas can be done easily. - Two types are available: one with a viewing window and a blank type. ●Load Lock Hatch A door for exchanging materials in the load lock chamber. We offer load lock hatches in various sizes compatible with ICF and JIS flanges. We also handle various materials for the window glass.
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Free membership registrationFeatures This device, the "Ultra-High Precision 5-Axis Manipulator," is a movement mechanism for the XYZ and R1R2 axes designed for ultra-high vacuum environments. By combining high-precision mechanisms, it enables the precise and reproducible movement and manipulation of samples in a vacuum. By incorporating optional features such as sample heating/cooling mechanisms or motor-driven systems, we can propose suitable processing, movement, and manipulation of samples for research and development purposes.
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Free membership registrationAt Kitano Seiki, we manufacture various vacuum chambers tailored to the diverse research applications of our customers, ranging from high vacuum to ultra-high vacuum and even extreme high vacuum. The shape of the vacuum chamber and the type of stainless steel used can be selected from a wide variety to best suit the specifics of the experiment. You can also specify the number, angle, and position of ports for branching equipment and measurement devices in great detail. Furthermore, we respond accurately to any requests that require special processing, with a comprehensive system that covers everything from design and machining to surface treatment, packaging, cleaning, assembly, leak testing, and vacuum startup.
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Free membership registrationThis is an introduction to the comprehensive catalog of organic device-related equipment handled by Kitano Seiki Co., Ltd., which designs and manufactures research and development equipment, including vacuum devices and vacuum components.
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Free membership registrationFeatures - Small space, compact design - Up to 5 deposition cells can be installed - Wide selection of substrate sizes from 1 to 3 inches - Double shield structure to prevent contamination - Standard equipped with substrate heating heater control mechanism - Easy design for maintenance and cleaning
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Free membership registration● Organic device fabrication and evaluation equipment ・ Small space, compact design ・ Up to 5 deposition cells can be installed ・ Wide selection of substrate sizes from 1 to 3 inches ・ Double shield structure to prevent contamination ・ Standard equipped with substrate heating heater control mechanism ・ Easy design for maintenance and cleaning
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Free membership registration●Features - Small space, compact design - Up to 5 deposition cells can be installed - Wide selection of substrate sizes from 1 to 3 inches - Double shield structure to prevent contamination - Standard equipped with substrate heating heater control mechanism - Easy design for maintenance and cleaning
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Free membership registrationPrecise control can operate extremely stably. The direct heating method provides excellent temperature responsiveness and stability in low-temperature ranges.
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Free membership registration【Features】 Compact/space-saving design with ICF-70 Standard equipped with shutter mechanism Temperature setting possible with ±0.1℃ ●Applicable materials - Si (Silicon) - As (Arsenic) - Ga (Gallium) - Al (Aluminum) - In (Indium) - P (Phosphorus) etc. *Custom strokes, shapes, etc. can be accommodated according to specifications.
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Free membership registration**Features** - Capable of transporting masks and samples using a transport mechanism. - Organic and metal materials can be deposited in the same chamber. - Co-evaporation of organic and metal materials is possible. - Co-evaporation of organic materials is possible (up to 4 components). - Standard water-cooled jacket to prevent contamination between organic and metal materials. - In the deposition chamber, substrates and masks can be exchanged under vacuum conditions. - The gap between the substrate and the mask is minimized. - The substrate rotation mechanism ensures film thickness uniformity within ±5% across the surface. - The organic deposition cell has excellent directionality, resulting in minimal material contamination in the deposition chamber. - Each processing chamber is treated with a special surface treatment for rapid attainment of the operating vacuum pressure. - Can be connected to a glove box. - Automatic transport and exhaust are possible with PLC control. - The introduction chamber can stock a standard of 5 substrate and mask holders.
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Free membership registrationEight organic deposition cells (KOD-Cell) for organic material film formation are available, and during metal material deposition, a metal deposition cell is standardly equipped in the same room. Both the organic and metal systems are configured with small-sized crucibles, focusing on minimizing chamber contamination within the device chamber. Additionally, it is a system that can be connected to a glove box. This system is a hybrid deposition device that allows for film formation of organic materials and metal materials in the same room.
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Free membership registrationEight organic vapor deposition cells (KOD-Cell) for organic materials (organic EL) are equipped, and a metal vapor deposition cell is standard for metal material deposition. Both the organic and metal cells are configured with a small-sized crucible to minimize chamber contamination within the device chamber. This system is fully automated, making it a multipurpose research and development device capable of conducting a wide variety of research.
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Free membership registrationSixteen organic evaporation cells (KOD-Cell) for organic EL film formation are equipped, and a metal evaporation cell is standard for metal material deposition. Both the organic and metal cells are configured with small-sized crucibles to minimize chamber contamination within the device chamber. This system is fully automated, making it a multipurpose research and development device capable of conducting a wide variety of research.
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Free membership registration●Features The Field Ion Microscope (FIM) is a projection-type microscope that allows for easy observation of the surface atomic images of sharply pointed metal tips. It was invented in 1951 by Professor Erwin E. Mueller at Pennsylvania State University. This device operates in an ultra-high vacuum environment, gradually increasing the voltage applied to a metal tip (probe) set as the sample, which causes the FIM image to appear on a screen, allowing for the visual observation of the surface atomic irregularities of the needle-like sample magnified approximately one million times. Simultaneously, the application of voltage to the tip provides a cleaning effect that removes impurities adhering to the surface of the tip. Furthermore, by increasing the voltage applied to the tip, field evaporation can be induced, allowing individual atoms to be stripped away and enabling precise adjustment of the number of atoms at the tip. The excellent characteristics of this device are utilized not only for atomic-level observation of metals but also for tip evaluation in scanning tunneling microscopy, where a sharp metal tip is essential. It has a wide range of applications and is adopted in many research laboratories and university research facilities.
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Free membership registration●Features This device is an electron detection type surface analysis instrument that scans the sample with a finely focused electron probe and images it using secondary electrons generated from within the sample, allowing surface shape observation on a CRT. It is applied in semiconductor side lengths, inspection devices, mask drawing devices, and more.
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Free membership registration●Features This device is a surface analysis microscope that scans a probe over the surface of a material, allowing for the acquisition of surface shapes at the atomic level in real space. By applying a negative voltage to the probe and bringing it close to the surface of the sample being observed, it can measure the tunneling current flowing in the space between the probe and the sample surface, enabling observation of the sample surface morphology at the atomic level using a Scanning Tunneling Microscope (STM). Additionally, it can investigate the morphology of the sample surface by detecting the forces acting between the atoms at the tip of the probe and the atoms on the sample surface, using an Atomic Force Microscope (AFM). The main configuration of the device consists of 3 to 4 chambers in ultra-high to extreme high vacuum regions, including an analysis chamber, a preparation chamber, a sample fabrication chamber, and a sample introduction chamber.
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Free membership registrationThe position-sensitive atom probe (PoSAP), developed in 1988 by A. Cerezo and others at the University of Oxford, incorporates a position-sensitive detector into the atom probe's detection system, allowing for the simultaneous measurement of the flight time and position of atoms that reach the detector without using an aperture during analysis. This device not only enables the display of all constituent elements in an alloy present on the sample surface as a two-dimensional map with atomic-level spatial resolution, but it also allows for the extension of the two-dimensional map into a three-dimensional map by evaporating the sample surface one atomic layer at a time using the field evaporation phenomenon, thus enabling display and analysis in three dimensions.
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Free membership registration◆◇◆Background◆◇◆ In the three-dimensional atom probe (3D-AP) device, field evaporation from the tip (a needle-like sample used to apply a high electric field to the sample surface in atom probe analysis) is now performed using laser irradiation instead of the conventional high-pressure application. Therefore, it is necessary to locally irradiate the laser at the tip apex. However, due to the vibrations from the refrigerator used to stabilize the FIM image (atoms), it has become difficult to determine the irradiation position of the laser on the tip apex.
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Free membership registration●Features This device uses a vacuum deposition method to heat a substrate placed in ultra-high vacuum below 10^-8 Pa and independently supplies the raw materials to be deposited on the substrate to grow crystals on the substrate. It includes a solid source MBE device that uses solid materials for evaporation through a molecular beam deposition source (Knudsen cell) and a gas source MBE device that uses gases or organometallic compounds as raw materials.
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Free membership registration●Features This device is a thin film fabrication apparatus using the CVD method, which supplies raw material gases (gases, liquids, solids) to the CVD reaction chamber, causing chemical reactions to occur in the gas phase or on the surface of the substrate material, and utilizing gas-phase reactions and surface reactions to deposit the desired thin film material onto the substrate. Methods for chemically activating the raw material gases (exciting them) include thermal, plasma, and optical (laser, ultraviolet, etc.), with corresponding devices such as thermal CVD, plasma CVD, and optical CVD.
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Free membership registrationThis device is capable of producing microcrystalline SiC solar cells using high-frequency plasma CVD and hot wire CVD methods. It consists of a total of five chambers: three thin film deposition chambers, a sample transport robot chamber, and a sample stock chamber, allowing for the separate formation of the i-layer, which is the light-absorbing layer in the solar cell, and the pn layers.
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Free membership registrationFerrite plating is an innovative technology that allows for the direct fabrication of ferromagnetic ferrite films in aqueous solutions at room temperature to 90°C. Since its invention in 1983 at the Laboratory of Masaki Abe at Tokyo Institute of Technology, it has undergone various improvements, leading to the development of applications in various thin-film magnetic devices and bio-medical devices, some of which have been commercialized. The unique point of the ferrite plating method is that it utilizes the oxidation reaction of Fe2+ ions to Fe, using raw materials such as Fe2+ ions and Ni2+ ions, enabling the creation of various ferrite thin films. The key feature is that the hydroxyl groups on the substrate surface form covalent chemical bonds with metal ions (not just simple physical adsorption), resulting in a strong adhesion.
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Free membership registration●Features Carbon nanotubes come in many varieties due to differences in their outer diameter and structure, all made from carbon atoms that are strongly bonded together. Their unique structure gives them the following properties: - Excellent electrical conductivity. - Excellent thermal conductivity. - Excellent mechanical properties. This device uses an electric furnace to heat a substrate in a quartz tube up to 900°C, introducing ethanol gas to grow carbon nanotubes.
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Free membership registrationThis is a film deposition device that utilizes the phenomenon of sputtering, where atoms or molecules that have been ionized and accelerated collide with a solid surface, causing solid material to be ejected from the surface. It has high industrial value because it can be applied to high melting point metals, alloy materials, dielectrics, and insulating materials.
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Free membership registrationThis product, the Sample Carrying System (KSC-1000), is a transport device that also serves as a sample introduction chamber. It allows for the transportation of samples while maintaining ultra-high vacuum conditions between multiple vacuum systems, making future expansion or addition of vacuum systems easy. Additionally, it comes standard with a six-slot sample transport carrier, making it ideal as a sample stocker, and the included heating mechanism enables cleaning of the sample surface.
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Free membership registration◆◇◆Background◆◇◆ Until now, we have been using large organic vapor deposition cells from other companies. However, due to the large crucible capacity unique to these large cells, we have been struggling with very poor temperature stability and material efficiency. In the case of organic materials, there are instances where the cost of materials can reach tens of thousands of yen per gram. Therefore, using a large deposition source with poor material efficiency requires filling as much as 10 grams of material for a single deposition. We would like to address this issue by using our company's organic vapor deposition cells.
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Free membership registration◆◇◆Background◆◇◆ The conventional metal deposition method uses a boat system, applying a large current of over 100A when depositing the metal film. While the boat system allows even beginners to easily perform deposition, the use of high currents is considered a factor that negatively affects the quality of the film. Additionally, the amount of scattering during deposition is significant, requiring frequent maintenance of the chamber, making it difficult to use in a clean environment.
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Free membership registration◆◇◆Background◆◇◆ Until now, we have been using a large cluster-type deposition system from another company. However, due to its size, it occupies a huge amount of space, leading to various issues (transportation troubles, rapid depletion of materials in the deposition cell, difficulty in controlling the deposition rate, etc.). Therefore, we want a compact system that incorporates at least the specifications of the existing equipment while further enhancing the specifications.
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Free membership registration◆◇◆Background◆◇◆ Until now, we have been using organic EL deposition equipment from another company. However, there have been the following issues and requests regarding its use. ◆ Since there is no mask exchange mechanism, it is necessary to open the atmosphere each time the mask is changed, which can cause damage to the samples. Additionally, the lack of a consistent vacuum environment leads to wasted time. ◆ In the organic deposition chamber, there are currently up to six deposition cells, but we would like to utilize the existing vacuum chamber to increase expandability and conduct various experiments.
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Free membership registration●Features This device utilizes inelastic scattering phenomena to measure the electron energy loss within a sample, serving as an electron detection-based surface analysis instrument to detect surface states of surface plasmon electrons.
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Free membership registration●Features This device is an electron detection surface analysis instrument that utilizes the diffraction phenomenon of electron beams to observe the crystalline structure of surfaces.
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