アールエムテック List of Products and Services

You can monitor the light emission from the etching process in real-time. Equipped with a CCD sensor, it supports a wavelength range of 200-800 nm, has high sensitivity in the UV range, and is equipped with a spectrometer that can capture even subtle changes that were difficult to detect. Additionally, it supports the ion milling process with a vacuum feed-through option. The optical endpoint monitor from Verity is designed to install a measurement receiving part via a flexible tube near the sample in a vacuum. By measuring the material emission during the etching/milling process, it obtains temporal changes in film thickness and film type. 【Features】 ◼ Powerful endpoint determination capability ◼ Uses dedicated high-function SpectraViewTM software ◼ Capable of endpoint detection, fault detection, and process diagnostics ◼ Wavelength range of 200 – 800 or 900 nm ◼ Further wideband wavelength measurement options available ◼ Compliant with RoHS directives

• Other inspection equipment and devices

The "fiber optic thermometer" enables accurate temperature measurement in high-frequency, microwave, strong magnetic field, and high-voltage environments, which are difficult to measure with conventional thermometers (thermocouples, resistance temperature detectors), without being affected by electric and magnetic fields. The Lsens fiber optic probe and sensor come in various types to suit all environments: a high-speed sampling type with a diameter of φ500μm, a corrosion-resistant type covered with PTFE, and a rigid polyimide type. The thermometer units are available in compact types for easy portability, panel mount types, and DIN rail mount types.

• Thermometer

The "Thermal Shock ETS Series" is an environmental reliability testing device used in a wide range of fields, including 5G communication devices, semiconductors, chips, sensors, and microelectronics. It allows for the verification of the chemical, physical, and temporal changes of test samples subjected to thermal shock in a short period of time. It is suitable for improving research and development as well as production efficiency. - Temperature change range: ETS-210-10S: -55℃ to +180℃ ETS-310-10S: -65℃ to +220℃ ETS-410-10S: -80℃ to +220℃ - Temperature change time: -55℃ to +125℃ in 10 seconds +125℃ to -55℃ in 16 seconds 【Features】 ■ In-house developed control system ■ Large touch screen ■ Ultra-low noise at 55dB(A) ■ Energy saving of over 30% ■ No frost formation even during long low-temperature tests *For more details, please refer to the PDF document or feel free to contact us.

• Environmental Test Equipment

- Temperature change range ETS-210-10S: -55℃ to +180℃ ETS-310-10S: -65℃ to +220℃ ETS-410-10S: -80℃ to +220℃ - Temperature change time -55℃ to +125℃: 10 seconds +125℃ to -55℃: 16 seconds It is ideal for applying thermal shock in the shortest time possible, allowing for the verification of the chemical, physical, and electrical time changes of test samples, thus enhancing research and development as well as production efficiency.

• Sensors
• Thermostatic water bath
• Secondary Cells/Batteries

Proposal for environmentally friendly companies Due to the Kigali Amendment to the Montreal Protocol, the use of HFCs must be gradually reduced starting in 2019, with a mandatory 70% reduction by 2029. The Coolteq ZERO series complies with this reduction obligation. The Coolteq ZERO refrigeration units do not use HFC gases. Please check the catalog for details. We look forward to your inquiries.

• Evaporation Equipment

Supcold is a new company founded in 2011, but it has experienced staff involved in the business in this field. The basic design is done in the United States, and many of the key components used are from the U.S. and Europe. Although some parts are made in China, the refrigeration capacity and quality are equivalent to or exceed those of vapor pump manufacturers in the U.S. and Japan. We have a cost-effective and rapid service system not only for equipment prices but also for maintenance (repair) costs. Additionally, we have adopted new refrigerants to reduce the global warming potential. We already have a track record of over 200 units delivered within China, and our reliability and service system have sufficiently satisfied our customers.

• Evaporation Equipment

Kaufman-type gridded ion gun RFICP ion source grid sizes: 4cm, 10cm, 14cm, 22cm, 36cm DC ion source grid sizes: 1cm, 4cm, 8cm, 10cm, 16cm The versatile gridded series of broad beam ion sources are available in different sizes which cover both R&D and high yield production requirements. Large ion beam sources meet critical output performance for uniform coverage over wide process zones. For more details, please contact us or download the catalog. *This catalog is in English.

• Evaporation Equipment
• Other semiconductor manufacturing equipment
• Etching Equipment

For more details, please contact us or download the catalog. *This catalog is in English.

• Evaporation Equipment
• Etching Equipment
• Plasma surface treatment equipment

This device can achieve ultra-smoothing and modification of surfaces with low damage by irradiating a beam (GCIB) that ionizes and accelerates a group of tens to tens of thousands of gas atoms or molecules at moderate energy onto unprocessed materials. Due to the atomic and molecular level processing, it is possible to smooth, etch, and surface process already shaped fine structures. 【Features】 ■ Suitable for nano-order fine processing ■ Flattening processing with Ra of a few nanometers ■ Compatible with reactive gas treatment ■ Processing possible at substrate surface temperatures below 100°C For more details, please contact us or download the catalog.

• Other surface treatment equipment
• Other processing machines

This is an ion beam sputtering device for the optical field. Sputter: 16cm RF Ion Source Assist: 16cm RF Ion Source Target: 2 surfaces, oscillation function Stage: rotation Film thickness control: transmission-type wavelength-variable laser film thickness control Main exhaust: cryopump or TMP + SUPCOLD For more details, please contact us.

• Laser Components
• Other optical parts

Thin films are used in a wide variety of fields, including anti-reflective coatings for lenses, laser filters, mirrors, liquid crystal display panels, architectural glass, and more. Recently, functional thin films, particularly those with water-repellent and anti-fouling properties, have gained attention. Generally, these thin films are formed by deposition, using materials such as metal oxides and fluorides as deposition materials, and a variety of types, shapes, and sizes are used according to diverse purposes. Our company provides deposition materials that meet our customers' needs.

• Evaporation Equipment

As a specialized trading company in vacuum technology, we handle various consumable parts.

• Evaporation Equipment

The "Ion Beam Sputtering Device" from OSI is an experimental device equipped with an ion source that can be customized to meet the usage needs of customers. It demonstrates capabilities equivalent to Veeco's SPECTOR. It uses RF ion sources for sputtering and for assist applications, making it suitable for the deposition of ultra-thin multilayer films in precision optics, equipped with OMS or OTM software. 【Features】 ■ Experimental device equipped with an ion source ■ Equipped with capabilities equivalent to Veeco's SPECTOR ■ Ideal for ultra-thin multilayer film deposition in precision optics with OMS or OTM software ■ Customizable to meet usage needs For more details, please contact us or download the catalog.

• Sputtering Equipment

We will design the equipment for research and development or mass production according to customer needs. 【Equipment Features】 - Process operating pressure of 10^-2 Pa (around 10^-4 Torr) Capable of high vacuum film deposition - Low contamination - Non-heated film deposition possible - High-density films - Reactive film deposition possible - Ion beam assist can be added - Good control over film thickness and other parameters

• Sputtering Equipment
• Other semiconductors
• magnet

At OSI Industry, we handle various grid ion sources manufactured by Kaufman & Robinson. We have detailed specifications for each type of grid ion source, so please take this opportunity to have a look. 【Contents Listed】 ● Discharge / Discharge Current / Discharge Power ● Grid ● Beam Type ● Gas Flow Rate ● Gas ● Pressure ● Ion Gun Height / Ion Gun Diameter ● Neutralizer For more details, please download the catalog or contact us.

• Other semiconductor manufacturing equipment

SIRIUS-O is a cleaning device equipped with jet processing technology. Jet processing is a technique that involves spraying a medium, which is an elastic body, to attack the workpiece while sliding, preventing issues such as surface dullness and matte finish. It does not damage the workpiece and can only remove the coating film, making it suitable for cleaning precision parts.

• Other cleaning machines

Compatible with products from various manufacturers, the auto pressure controller is equipped with a stable MFC. 【Features】 ○ Because of its compatibility, users can install and replace it themselves. ○ Utilizes the currently used vacuum gauge, ensuring no existing gauges are wasted. ○ By replacing the APC with the auto pressure controller, significant cost reductions can be achieved. ○ Supports AC current from 85V to 264V. ○ Equipped with an MFC: - Capable of monitoring the gas flow rate in use. - Maximum gas flow rate can be selected from 200 to 2000 sccm. - Thorough explosion-proof measures are implemented by installing valves on both ends. ● For other functions and details, please download the catalog.

• power supply

The "Small Experimental Ion Beam Etching Device" uses a DC ion source and is equipped with a substrate rotation cooling single stage. It easily etches materials such as Au, Pt, and magnetic materials, and taper processing can also be done easily. Processing is possible at a substrate surface temperature of 80°C or lower. It is ideal for microfabrication. 【Features】 ● No toxic gases are used, so exhaust gas treatment is unnecessary ● Endpoint detector can be installed ● For inquiries or questions about ion beam etching devices, ion sources, and ion beam technology, please feel free to consult us. For more details, please download the catalog or contact us.

• Etching Equipment

The small ion beam etching device uses a DC ion source and is an ion beam etching (IBE) device equipped with a substrate rotation cooling single stage. It is capable of etching fine patterns, as well as metal and magnetic materials. 【Features】 ○ Easily etches Au, Pt, magnetic materials, etc. ○ Taper processing is easy ○ Processing is possible at substrate surface temperatures below 80°C ○ No toxic gases are used, so exhaust gas treatment is unnecessary ○ Can be equipped with an endpoint detector For more details, please contact us or download the catalog.

• Etching Equipment

【Product Introduction】 ● Temperature Reliability Test Equipment The Hi-Tao thermal shock device provides a rapid temperature change environment for temperature reliability testing, with heating from -55°C to +125°C in 10 seconds and cooling from +125°C to -55°C in 16 seconds. ● SAP Cold All units undergo pre-shipment inspection at our Sagamihara Service Center before being shipped to Japan, Taiwan, China, and Southeast Asia. This refrigeration unit complies with refrigerant emission regulations and is designed for replacement from existing equipment. ● GCIB (Gas Cluster Ion Beam) This technology ionizes clusters made up of tens to tens of thousands of gas atoms, accelerates them to moderate energy, and irradiates them. Low-energy ion etching, high-quality film deposition, and surface smoothing have been demonstrated. ● Multiple APC An auto-pressure controller that combines high stability with wide compatibility. ● DP-eco An energy-saving unit for DP that is environmentally friendly and reduces electricity costs. ● Ion Beam Etching/Sputtering Equipment Designed to meet customer specifications, accommodating small experimental machines to CtoC mass production equipment. ● Consumables ● Thin Film Materials ● KRI Ion Sources DC, RF, End Hall

• Etching Equipment
• Evaporation Equipment
• Other surface treatment equipment