TECHNICAL INFOMATION INSTITUTE CO.,LTD Product Lineup

Book Title: Control and Measurement/Monitoring of Semiconductor Plasma Process Technology －－－－－－－－－－－－－－－－－－－－－ ◎ How to achieve optimization of film deposition and etching processes? ◎ Detailed explanation of technologies that visualize plasma and connect to the control of electrons and ions! ◎ Thorough explanation of high-precision process technologies for discharge and reactive plasma! －－－－－－－－－－－－－－－－－－－－－ ■ This book contains the following information: - Techniques for controlling electron density, electron temperature, power control, and gas supply points for discharge plasma and reactive plasma. - Systematization of gas characteristics, exhaust system design technology, measurement technology, and troubleshooting for designing vacuum environments. - Measurement techniques for plasma states using optical emission spectroscopy, quadrupole mass spectrometry, and probe methods. - Measurement of active particle counts, abnormal discharge detection, ion energy distribution, measurement of ion species in plasma, and radical measurement and monitoring technologies. - Low-damage, low-temperature, high-speed film deposition technologies for plasma CVD and ALD processes, control of film density and thickness, and improvement of adhesion. - Film thickness control technologies for sputtering deposition, and control of thin film composition, crystallinity, electrical properties, and mechanical properties.

Book Title: Process Design and Scale-Up through Chemical Engineering Calculations －－－－－－－－－－－－－－－－－－－－－ ★ No reliance on experience or intuition! Aiming for fast and accurate 'Equipment Design' and 'Operating Condition Setting' based on calculation results! ★ Covers necessary physical property values, important relationships, modeling, and the latest examples of AI utilization! －－－－－－－－－－－－－－－－－－－－－ ■ Key Points of this Book - Calculation of required power for stirring and mass transfer - Construction of reaction rate equations and calculation of effective catalyst coefficients - Calculation of tower diameter, cross-sectional area, and flooding limits for packed columns - Calculation of tower diameter, height, and pressure loss for absorption columns - Calculation of nucleation and crystal growth rates in crystallization - Calculation of filtrate volume and average filtration resistance in solid-liquid separation - Modeling of drying processes and calculation of drying rates - Simulation of powder grinding, mixing, and shaping