ソフエンジニアリング List of Products and Services

This is an introduction to our large substrate resist coaters. It is a resist spin coat unit designed for large substrates. In addition to airflow control within the chamber, it excels in maintainability, and we can also offer models equipped with automatic transport systems suitable for large substrates. *For more details, please refer to the PDF materials or feel free to contact us.

This is an introduction to our small resist coater. Resist coating material is applied to glass substrates using a spinner. We pay attention to airflow control within the chamber and maintenance, allowing for optimal acceleration selection based on the viscosity of the resist coating material. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, coating and developing equipment, spin cleaning equipment, spin coater, semiconductor manufacturing equipment, resist coating equipment, coating equipment, coating uniformity, low price, photolithography process, batch substrate cleaning machine, batch spin cleaning machine, surface treatment, wafer cleaning equipment.

■Supports ultra-large heavy substrates of the G8.5 generation. 　◎Supported substrate size: 1.3m X 1.5m X 15mm t ■Compatible with the integrated processing of the photolithography process. 　◎Processing steps: LD ⇒ Development ⇒ Etching ⇒ Stripping ⇒ Cleaning ⇒ ULD ■We have multiple units in operation from various domestic manufacturers. *For more details, please refer to the PDF document or feel free to contact us. Sheet-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, semiconductors, cleaning equipment, resist, photoresist, photolithography process, organic EL, surface treatment, wafer stripping equipment, wafer cleaning equipment, wafer cleaning machines.