東邦化研 List of Products and Services

A thin film, referred to as "hakumaku" or "usumaku," generally refers to a coating (film) with a thickness at the nano level. Thin films are formed by evaporating or sputtering the material (such as metal) that is to be made into a film within a vacuum apparatus. **"Vacuum Deposition Method"** The vacuum deposition method is a technique where the material (such as metal) intended for the film is heated and evaporated in a vacuum, allowing the vapor (particles) to reach the target object and accumulate to form a film. The vacuum deposition method is characterized by the fact that the vaporized material reaches the target object directly, resulting in minimal damage to the object and the formation of a highly pure film. Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance using ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on our 35 years of experience, we offer flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us.

• Sensors

In this document, we present a list of various analytical instruments. Starting with the "High-Resolution Gas Chromatography Mass Spectrometry (HRGC/HRMS)," we also feature a wide range of instruments such as the "Ultra-Thin Film Scratch Tester" and the "Micro Vickers Hardness Tester." Additionally, the analysis items include "materials analysis-related" topics such as molecular weight distribution and separation analysis, as well as "environmental measurement analysis-related" topics like radiation measurement and odor analysis. Please feel free to download and take a look. 【Featured Equipment (Partial)】 ■ Ultra-High-Resolution Field Emission Scanning Electron Microscope - EDS (FE-SEM/EDS) ■ Scanning Electron Microscope - Energy Dispersive X-ray Spectroscopy (SEM-EDS) ■ Energy Dispersive X-ray Fluorescence Spectrometer (EDX) ■ Ultraviolet-Visible-Near Infrared Spectrometer (UV-VIS-NIR) ■ Fourier Transform Infrared Spectrometer (FT-IR) *For more details, please refer to the PDF document or feel free to contact us.

• Analytical Equipment and Devices
• Other environmental analysis equipment

"Thin film" is referred to as "hakumaku" or "usumaku," and generally refers to a coating (film) with a thickness at the nanometer level. In a vacuum device, materials (such as metals) that are to be made into a film are evaporated or sputtered to form the coating. Because it does not use a "liquid" like wet plating, it is sometimes called "dry plating." Our equipment allows for thin film fabrication methods such as "vacuum deposition," "ion plating," "sputtering," and "plasma CVD." For more details, please feel free to contact us. 【Thin film fabrication methods available with our equipment】 ■ Vacuum deposition ■ Ion plating ■ Sputtering ■ Plasma CVD *For more details, please refer to the PDF materials or feel free to contact us.

• Surface treatment contract service

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to meet a wide range of requests, from small-scale projects for prototypes, development, and research to medium-sized production projects, accommodating various types of films such as metal films, reactive films like oxide, carbide, and nitride films, alloy films, and their laminated films. For example, we can perform film deposition not only on flat shapes like glass plates and films but also on three-dimensional products such as ceramic processed items and metal materials! By rotating the items within the equipment during the film deposition process, we can apply the film to specified areas. Additionally, through clever holding methods, it may also be possible to deposit films on stepped areas, grooves, and the interiors of holes. We can flexibly accommodate sizes and shapes, from small items with a diameter of less than 1 mm to three-dimensional objects measuring φ500 mm × L500 mm and flat plates measuring 800 mm × 1000 mm. Even if holding (fixing) seems difficult, we have over 35 years of rich experience and know-how, so please feel free to consult with us first!

• Evaporation Equipment
• Sensors
• Contract manufacturing

Generally, thin films are often deposited at the nano level, but our company also receives many requests for thick films. We receive inquiries ranging from 1 micron to several microns, and in some cases, even over 10 microns depending on the project. Of course, the specifics will vary depending on the substrate and the type of film to be applied, but please feel free to consult with us first! (We are also skilled in thin films, of course.) Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We accommodate various types of films, including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. We have established a system to respond to a wide range of requests, from small-scale projects for prototypes, development, and research to medium-sized production projects. With a rich lineup of equipment ranging from small to large devices and over 35 years of proven results, we flexibly respond to our customers' needs!

• Processing Contract
• aluminum
• Surface treatment contract service

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We accommodate various types of films, including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. We have established a system to respond to a wide range of requests, from small-scale projects for prototypes, development, and research to medium-sized production runs. With a rich lineup of equipment ranging from small to large systems and over 35 years of proven experience, we flexibly meet our customers' needs! Our large equipment can deposit films over a maximum flat area of 800mm x 1000mm. Additionally, due to the inline configuration of our equipment, we can deposit a considerable quantity in a single day. Just because we have large equipment doesn't mean we can only handle large substrates. It is also possible to load many small substrates for film deposition, which offers advantages in mass production costs! Please feel free to consult with us! ★

• Glass
• Ceramics
• plastic

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to respond to a wide range of requests, from small-scale projects such as prototypes, development, and research to medium-lot production projects, accommodating various types of films including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. With a rich lineup of equipment from small to large-scale and over 35 years of proven experience, we flexibly meet our customers' needs! For substrates with low heat resistance, such as polyimide, polycarbonate, polyethylene, PET, and COP films, please feel free to consult us about film formation! Depending on the type and thickness of the film, we can perform film formation at temperatures below 100°C! In addition to resin films, we can also apply films to resin molded products!

• plastic
• Processing Contract
• Surface treatment contract service

We are currently offering a free document that explains thin film processing technology, which imparts new functions to materials, in an easy-to-understand Q&A format! - What is vacuum deposition? - What is ion plating? - What kind of films can be created? - What types of coatings can be done? - Is it okay to only do prototypes? Can mass production be done? Toho Chemical Industry Co., Ltd. provides contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other suitable surface treatment methods. Since the establishment of our ion plating division, we have accumulated approximately 40 years of achievements across a wide range of fields. We have compiled a list of frequently asked questions. We have summarized the differences and characteristics of each coating method, as well as specific examples of coatings, using illustrations and photos to make it as easy to understand as possible, so please feel free to download it. Based on our flexible response and over 35 years of experience, we will meet your needs! If you are considering functional thin films, please do not hesitate to contact us! If you have any questions, please feel free to reach out to us first!☆

• Surface treatment contract service
• Sputtering Equipment
• Ceramics

Ion plating is an advanced version of vacuum deposition. Similar to vacuum deposition, it involves evaporating (or sublimating) the material to be formed into a film in a vacuum and depositing it onto a substrate such as glass or silicon wafers. The characteristic of ion plating is that it passes the evaporated particles through plasma to give them a positive charge, and by applying a negative charge to the substrate side, it attracts the evaporated particles to deposit them on the substrate, thereby forming a thin film. It is possible to impart new functions to components and materials according to their applications. **Features of Ion Plating** - Stronger adhesion than vacuum deposition - Coating at low temperatures is possible (except for a few types of films) - Compatible with a wide range of film types - Diversity in deposition conditions can be achieved - Applicable to reactive films such as oxide films, nitride films, and carbide films - Better film coverage in shadow areas compared to vacuum deposition - Alloy films are possible

• Processing Contract
• Other semiconductor manufacturing equipment
• Surface treatment contract service

The plasma CVD method is a technique that involves exciting or decomposing a gas containing the desired elements for the film using plasma, which then adsorbs and reacts on the substrate surface to form a film. Because it uses plasma, it allows for film formation at lower temperatures compared to thermal CVD. Additionally, it is characterized by better conformality on uneven surfaces compared to ion plating, vacuum deposition, and sputtering methods. Our company offers coating services using the plasma CVD method, in addition to ion plating and vacuum deposition methods. Currently, the types of films available using the plasma CVD method are four types: DLC (Diamond-Like Carbon), SiO2, SiN, and SiC.

• Wafer
• CVD Equipment
• Processing Contract

The sputtering method is a technique that involves colliding high-energy particles (argon) generated by plasma with a film-forming material (target), which knocks out the material components and deposits them onto a substrate such as glass or silicon wafers to form a thin film. Our company also offers coating services using the sputtering method, in addition to ion plating and vacuum deposition methods. Currently, the types of films available using the sputtering method are Ti, TiN, and TiC.

• Processing Contract
• Wafer
• Sputtering Equipment

There are various types of patterning processes. From extremely fine patterns used in semiconductors (such as LSI and sensors) at the nano level to wiring on glass substrates at several hundred microns, and even thin film applications limited to specific areas at the centimeter level, it is possible to achieve the desired functionality by applying thin films only to the necessary areas. At Toho Kaken, we perform thin film applications to specific areas required by our customers through methods such as Metal Masks and post-etching. We can suggest masking techniques based on the type of thin film you need, the type of substrate, the patterning shape, and the shape of the application area. Please feel free to consult with us. If you have specific dimensions or drawings, it would facilitate smoother discussions. Additionally, even if you are just starting to consider your options, we welcome your inquiries.

• Other semiconductor manufacturing equipment
• Printed Circuit Board

The evaluation of thin films is determined by the purpose for which the thin film is used. For example, if the thin film is used for enhancing mechanical strength, important factors for evaluation include hardness and adhesion. If the film is intended to impart optical properties, values such as reflectance and transmittance become significant. Our company strives to meet customer needs using evaluation equipment as listed below.

• Analytical Equipment and Devices

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to respond to a wide range of requests, from small-scale projects such as prototypes, development, and research to medium-sized production projects, accommodating various types of films including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their multilayer films. Please feel free to contact us when considering functional thin films! Based on our flexible response and over 35 years of experience, we will meet your needs! Additionally, this document includes features of each coating method, as well as coating examples and pattern formation. If you are interested, please download the materials or feel free to contact us.

• Circuit board design and manufacturing
• Other processing machines

Toho Kaken Co., Ltd. has started offering contract processing services for 'surface modification' using GCI (Gas Cluster Ion Beam), in addition to its contract processing services for thin films, leveraging the vacuum know-how cultivated through its film formation technology and the experience gained from thin films.

• Other electronic parts
• Processing Contract

Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance through ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on 35 years of experience, we provide flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us. For more details, please refer to our catalog or feel free to contact us.

• Surface treatment contract service

Toho Kaken Co., Ltd. offers thin film coating services through contract processing, including electron gun vacuum deposition and radio frequency (RF) excited ion plating. In electron gun vacuum deposition, the material to be coated is evaporated using an electron beam gun (EB gun) in a vacuum and then coated onto the target object. Additionally, we also perform RF excited ion plating, which is an advanced version of electron gun vacuum deposition. This method retains the advantages of various evaporation materials while improving adhesion and providing a diversity of conditions. **Features of RF Ion Plating:** - Dense and stable over time - Strong adhesion to substrates - Capable of reactive ion plating - High versatility of coating materials - Diversity of coating conditions For more details, please refer to our catalog or feel free to contact us.

• Surface treatment contract service

Toho Kaken Co., Ltd. has been providing contract processing for various surface treatments using ion plating, vacuum deposition, sputtering, and P-CVD for many years. We can accommodate a wide range of projects, from prototype development to medium and small lot production. We respond to the needs for thin film formation using various materials such as single metals, oxides, nitrides, and carbides. 【Service Features】 ■ Support for prototypes and small lots ■ Compatibility with various materials ■ Use of equipment tailored to specifications, materials, and processes ■ Consideration for the environment For more details, please refer to our catalog or feel free to contact us.

• Surface treatment contract service

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

• Surface treatment contract service

Toho Kaken Co., Ltd. offers contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other methods that are optimal for surface treatment. We particularly focus on functional films such as conductive and insulating films, and we have established a system to meet a wide range of requests from prototyping, development, research, mass production, to small lot production. We strive for prompt and reliable responses from quotations to processing, and we contribute to reducing lead times. 【Business Description】 ■ Contract processing services for thin films using ion plating and vacuum deposition (Production of functional films, surface modification, and general thin film processing) For more details, please refer to our catalog or feel free to contact us.

• Surface treatment contract service

Ion plating is a method that involves passing evaporated particles through plasma to give them a positive charge, while applying a negative charge to the substrate to attract the evaporated particles and deposit them, creating a film. This allows for the formation of a film with stronger adhesion compared to traditional vapor deposition methods. **Features of Ion Plating** - Adhesion strength is stronger than that of vacuum deposition. - Good adhesion can be achieved even at low temperatures (with some exceptions for specific film types). - A variety of film formation conditions can be obtained. - Reactive films are possible. - Film coverage on shadows is better than that of vacuum deposition. - Alloy films are possible. *For more details, please request materials or view the PDF data available for download.*

• Processing Contract
• Surface treatment contract service

From prototype thin film formation to mass production 【Features】 ○ Dense and with minimal changes over time ○ Strong adhesion to the substrate ○ Processing at low temperatures is possible ○ Reactive ion plating is achievable ○ High versatility of film-forming materials ・For more details, please contact us or download the catalog.

• Surface treatment contract service