日精 Product Lineup

Have you been struggling with running costs and labor issues due to manual cleaning or relying on contractors for cleaning? This device automatically cleans dicing frames through automated transport. - Jet cleaning type (focused on reducing running costs) - Scrub cleaning type (focused on cleaning power) We offer these two types in our lineup. By selecting a specification that matches the dirt on the frames you use, we can propose quality and cost benefits. Additionally, dicing frames with tape (sheets) can also be processed, allowing for tape removal and cleaning within the device. (*Optional)

With years of experience backing us, we utilize clean technology, transport/control technology, and more to design and manufacture optimal equipment for our customers with our total engineering capabilities. Using various engineering tools, including 3D CAD, we deliver space-saving and user-friendly equipment. *For more details, please download the PDF or contact us.*

A mass production-oriented resist stripping and metal lift-off processing device that combines a standard straight nozzle with a high-pressure jet nozzle. The one-chamber type, which performs resist stripping, lift-off, rinsing, and drying all in one chamber, contributes not only to high throughput but also to a reduced footprint. Additionally, it is possible to separate and recover the used chemicals for reuse, which helps reduce running costs. *It can also be repurposed as an organic cleaning device, not just for resist stripping and lift-off. 【Features】 ■ Unique jet lift-off mechanism with high stripping performance ■ Improved flexibility and reduced running costs to accommodate small quantities of various products and fluctuations in production volume ■ Improved quality and yield through single wafer processing (achieving precise processing without cross-contamination and enhancing uniformity and control across the surface) *For more details, please contact us or download the PDF for further information.

A research and development device that combines a standard straight nozzle with a high-pressure jet nozzle, designed for resist stripping and metal lift-off processes for small-scale production. It features a compact design that can be installed in tight spaces (approximately 40% more compact than conventional models). The one-chamber system performs resist stripping, lift-off, rinsing, and drying all in a single chamber, contributing not only to high throughput but also to reduced footprint. Additionally, it is possible to separate and recover the used chemicals for reuse, which helps reduce running costs. *It can also be repurposed as an organic cleaning device, not just for resist stripping and lift-off.*

A metal lift-off processing device for research and development that combines a standard straight nozzle with a high-pressure jet nozzle. This model is a compact version of the TWPm, further miniaturized and cost-effective by omitting the transport unit. The one-chamber complete type performs resist stripping, lift-off, rinsing, and drying all in one chamber, contributing not only to high throughput but also to a reduced footprint. Additionally, it is possible to separate and recover the used chemicals for reuse, which helps reduce running costs. *It can also be repurposed as an organic cleaning device, not just for resist stripping and lift-off. 【Features】 ■ 60% reduction in footprint (compared to our TWPm) ■ One-chamber completion ■ Prevention of chemical backflow (patented) ■ Prevention of liquid and mist scattering and reattachment *For more details, please contact us or download the PDF for further information.

【Features】 ● Clean drying using high-purity IPA is possible regardless of material or shape. ● Proven safety measures demonstrated by results. ● Elimination of the risk of damage through all stainless steel construction. ● Reduction of carried-out IPA by dividing into vapor zone and dry zone. ● Custom specification changes are possible according to customer work. *For more details, please download the PDF or contact us.

Amsonic Hamo is highly regarded for its quality and complete cleaning process. Our systems can be easily integrated into your manufacturing line in a space-saving manner, and the transition from manual to automatic cleaning simplifies operations, allowing for reductions in labor costs and minimizing the consumption of utilities such as cleaning water and detergents. The high potential of the equipment itself, along with minimized utility consumption and operating time, contributes to improving your productivity. 【Features】 ■ Validated cleaning process ■ Customized cleaning racks ■ Individually designed cleaning systems ■ High energy efficiency ■ High-spec equipment specifications that do not generate residual water *For more details, please refer to the PDF materials or feel free to contact us.

This series is a basic type of dust removal device used in various processes. We offer models ranging from 2 to 5 units, suitable for both inline and outline applications. The lineup includes the "RY-705B," which features a non-contact magnetic gear for the drive gear, and the "RY-505Z," a two-unit clean roller type with cleaning on both the upper and lower sides. We accommodate various customer requests for sheet products and roll-to-roll lines. 【Features】 ■ Clean Roller RY-705B - Employs a non-contact magnetic gear for the drive gear - A revolutionary clean roller that eliminates dust generation from within the device ■ Clean Roller RY-505Z - Arranges two clean rolls on both the upper and lower sides to double the dust removal effect - Ideal for surface dust removal of products before the lamination process or exposure process in automatic lines ■ Customized Products - Designed and manufactured to fit the customer's work size * We also accept demo evaluations to determine if removal is possible with samples provided. * For more details, please refer to the PDF materials or feel free to contact us.

We would like to introduce the "Thin Plate Compatible Clean Roller." The "RY-1106 Series" utilizes a new type of clean roll with a small diameter, making it possible to remove dust from thin plates and films. Additionally, by adopting a magnetic gear in the drive section of the device, we suppress minute dust generation from the gear part. We also offer the "RFC-705A" and "RF-705A." 【Features】 ■ Prevents dropping ■ Clean roll that prevents entanglement ■ Uses magnetic gear in the drive section ■ Capable of cleaning 50μm workpieces ■ Customized products Designed and manufactured to fit the customer's work size * We also accept demo evaluations to determine if removal is possible with samples provided. * For more details, please refer to the PDF document or feel free to contact us.

We propose customized unit rollers tailored to your needs. We accommodate various specifications for roll-to-roll lines and vertical path lines, as well as designs for fixed installation units in line equipment. Our solutions are ideal for dust removal from films, substrates, and glass panels. 【Features】 - Manufactured to order according to customer requirements. - Capable of responding to various requests for installation and mounting in existing lines and equipment. - We can produce unit rollers up to 2,600mm based on our track record. - Suitable for long products in raw material processes and slitting processes. - Enhanced structural strength improves adhesion to products, allowing for high-speed flow rates of up to 250m/min. *We also accept demo evaluations to determine if removal is possible with samples provided. *For more details, please refer to the PDF document or feel free to contact us.

In the semiconductor industry, especially in the miniaturization process, the precision of resist removal significantly affects product quality. In the formation of fine patterns, the presence of resist residues or foreign substances can lead to critical defects. Our batch-type automatic resist stripping and lift-off equipment achieves high stripping performance and uniformity, contributing to improved yield. 【Application Scenarios】 - Fine wiring processing - Resist removal for high aspect ratio structures - Lift-off processing at the wafer level 【Benefits of Implementation】 - Improved yield - Stabilization of quality - Reduction of running costs

In the semiconductor industry's miniaturization process, precise stripping of the resist is essential. Particularly, as density increases, the presence of resist residues and foreign substances can significantly reduce yield. Our batch-type automatic resist stripping and lift-off equipment achieves high stripping performance through a combination of heated organic chemicals and high-pressure jets. 【Application Scenarios】 * Resist stripping in microfabrication processes * Research and development applications * Small-scale production 【Benefits of Implementation】 * Improved yield due to high stripping performance * Enhanced installation efficiency through space-saving design * Reduced running costs through chemical reuse

In the MEMS industry, as microfabrication technology advances, high precision and quality in the resist stripping and lift-off processes are required. In particular, the uniformity of the wafer surface and the suppression of contamination are crucial, and addressing these challenges is essential for improving product yield. This device achieves high stripping performance through the combination of heated organic solutions and high-pressure jets. It is a one-chamber system that contributes to high throughput and a reduced footprint. 【Application Scenarios】 - Resist stripping and lift-off processes in MEMS device manufacturing - Processes requiring high-precision pattern formation - Processes needing wafer surface uniformity and contamination control 【Benefits of Implementation】 - Improved yield due to high stripping performance - Increased efficiency of manufacturing lines through reduced footprint - Reduced running costs through the reuse of chemicals

In the MEMS industry, the quality of resist stripping and lift-off processes is crucial for the manufacturing of high-precision devices. Particularly in MEMS devices that utilize microfabrication technology, residual resist and uneven stripping can negatively impact product performance and reliability. Our batch-type automatic resist stripping and lift-off equipment achieves high-precision stripping performance by combining heated organic solutions with high-pressure jets for physical assistance. 【Usage Scenarios】 - Resist stripping and lift-off processes in MEMS device manufacturing - Resist removal in microfabrication processes - Resist stripping for research and development purposes 【Benefits of Implementation】 - Improved device quality through high-precision stripping - Increased productivity through high throughput - Reduced running costs through the reuse of solutions