Usable from R&D to mass production! Vertical furnace with automatic transport compatible with 3 to 6-inch wafers.
The "VF-3000H" is an activation annealing furnace capable of ultra-high temperature processing, suitable for power device manufacturing. It can process mini-batches of 50 wafers and accommodates a wide range of wafer sizes from 3 inches to 6 inches. We have carefully selected the hardware and control systems, making it suitable for both R&D applications and mass production lines. Additionally, we also offer the "VF-5100," which can remove carbon after activation. 【Features】 - Mini-batch processing of 50 wafers, suitable for R&D and mass production lines - Accommodates a wide range of wafer sizes from 3 to 6 inches - The furnace features our unique metal-free structure - Temperature monitoring near the wafer is possible - Standard equipped with N2 load lock *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Other Features】 ■Equipped with C to C transport, achieving high throughput ■Supports trench rounding annealing in H2 atmosphere (optional) *For more details, please refer to the PDF document or feel free to contact us.
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【Purpose】 ■For SiC power devices, research and development, mass production, activation annealing *For more details, please refer to the PDF document or feel free to contact us.
Company information
JTEKT Thermo System started its business by manufacturing and selling heat treatment equipment for bearing materials. Since then, it has quickly responded to technological innovations and changes in industrial structures, and has been engaged in the development of various manufacturing equipment, not only for metals but also for semiconductors, electronic components, displays, and more.
