A small tabletop type spin developer that can perform spray and paddle development.
Low elasticity makes bending of FPC easy. Contributes to thinner, lighter designs and increased design flexibility.
Proven results with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.
It is a compact resist development system for small-lot, multi-variety production and development applications. Unlike DIP, it can stabilize quality due to its sheet-fed design.
Keep the negative taper angle constant! This is an automatic resist development system compatible with post-exposure bake (PEB) required for negative resist and image reversal resist.
From high pressure to mist-like soft pressure, it's all under control! A two-fluid spray resist development device. It is effective in shortening the development time for thick films and more.
We have a proven track record with a variety of chemical solutions! The reason for our low prices is that we handle everything in-house, from design to sales.
We consolidate foundational technologies and know-how related to photoresist materials, which are essential for semiconductors, displays, printed circuit boards, and more.
Compatible with highly corrosive chemicals!! GEMÜ high-purity fluoropolymer valves
Excellent effectiveness for all water treatment issues! Gaining attention as a new water treatment agent for the 21st century! Simultaneously solving water quality purification and equipment maintenance!
Meeting the high cleanliness standards required in the semiconductor and medical device fields. We carry out everything from precision cleaning to packaging and assembly in a consistent clean environment.
Contributing to the reduction of accounting tasks for clinics and pharmacies! *IT introduction subsidies (digitalization introduction type) available.
Total support for the installation and maintenance of semiconductor manufacturing equipment, from precision equipment installation compatible with clean rooms! Additional information.
Supports multiple chambers according to production scale. Achieves uniform etching of wafers.
Customization according to the specifications for work and usage is possible.
It is a single-fluid developing device that is effective in reducing the development and processing time of thick films. You can freely choose the spray shape (circular, fan, etc.), pressure, and flow rate.
Compatible with low to high viscosity resists! We can manufacture equipment for any wafer size, from small diameter to large diameter!
It is a semi-automatic lift-off device that is cheaper than an automatic machine and easier to use than a manual device.
Short-time peeling! With our unique special nozzle, we have achieved high-speed processing, high peeling power, and low chemical consumption for lift-off using high-pressure jets!
We will propose solutions in the semiconductor field, which we specialize in, tailored to our customers' needs!
Introducing a case study of creating a family crest using register processing.
We explain our latest know-how, such as atomization methods and thin film formation methods, in an easy-to-understand manner for beginners.
For production equipment and research and development! Providing a series of processes in thin-film electronic component manufacturing!
The paint loss is extremely low, and it is compatible with the manufacturing lines for battery panels and glass.
After a thorough meeting, we will create a drying device that meets the customer's needs.
Resist coater for cover glass integrated touch panel (OGS)
Shortest half-day estimate / From metal parts to resin products, we introduce components related to semiconductor manufacturing equipment based on our track record!
Comprehensive catalog of electronic component production systems, cold forging automotive parts, and coolant-related machinery.
Maximum processing size φ1000×500, short delivery time through process consolidation, high-precision machining of complex shapes using multi-surface approaches.
A tube pump dispenser that refreshes the image of tube pumps. Achieves micro-volume discharge, high-speed continuous discharge, and high-precision discharge. Video available.
A single-layer resist stripping and lift-off device with high stripping performance utilizing chemical reactions from heated organic solutions and physical assistance from a high-pressure jet.
A sheet-type resist stripping and lift-off device with high stripping performance utilizing chemical reactions from heated organic solutions and physical assistance from high-pressure jets [testable].
It is a vacuum drying device that allows recipe operation through touch panel control.
Filter for the removal of trace metals and trace colloids, designed for the electronics and fine chemicals industry.
Total engineering partner in the semiconductor industry with over 2,000 achievements in the semiconductor field.
Integrated production of LOT200! A case where we were able to meet delivery deadlines with the cooperation of our suppliers.
A wide range of products from general ion-exchange type metal removal membranes to metal removal membranes specialized for semiconductor applications.
Polyethylene filters with a wide range of pore sizes suitable for various applications (including fine pore sizes equivalent to 1nm) and high purity.
We customize the equipment by selecting each process and specification from the lineup of single-sided and batch types.
A wet process cleaning device with a variety of circulation methods.
By installing an indoor scrubber that corresponds to exhaust gas and airflow, a safe operating environment can be achieved even in places without exhaust gas treatment facilities.
Multi-purpose fully automatic screen printing machine
Amazing peeling ability with high-pressure jets! Our unique special nozzle enables high-speed processing, high peeling power, and lift-off with low chemical consumption using sheet materials!
From silicon to compound semiconductors, from manual machines to mass production machines! Here is an introduction to our products!
It is a semi-automatic developer for customers who do not have a high enough production volume to purchase a fully automated machine but seek process reproducibility.
"Removal of metal and resist with ultra-high pressure jet" Achieve lift-off with high-speed processing, high stripping power, and low chemical consumption using the ASAP dedicated nozzle!
Achieving swelling and high-pressure jet lift-off with high temperature, high peeling force, and low chemical consumption through a recycling-type circulation heater with a sheet-type design comparable to DIP!
Process multiple sizes of wafers without changing setups! The multi-size compatible device achieves high productivity with minimal downtime for lift-off operations!
Easy-to-operate CtoC robot transportable development/etching equipment. Both developer and etcher can be manufactured according to application.
Spinner (spin coater) that adopts AC servo for consistently stable rotation accuracy.
Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.
Wafer resist coating device that uses high-performance pumps for high-precision coating.
Wafer resist coating device that uses high-performance pumps for high-precision coating.
Electron beam lithography equipment, EUV exposure equipment, nanoimprint lithography applications. Two types available: powder and solution!
High-precision single-sided exposure equipment for flexible printed circuit boards (FPC).
High-precision double-sided exposure device for flexible printed circuit boards (FPC)
Semi-automatic exposure device with alignment for film that demonstrates its power in FPD manufacturing processes.
A highly productive and user-friendly aligner, such as a microscope auto-move.
The material width supports 35mm to 160mm for TAB/CSP/COF and 250mm to 300mm for FPC!
The productivity is different from previous exposure devices!
"We want to confirm the effectiveness of the coating in advance." To meet such needs, Yoshida SKT also offers measurements of the coated surface.
Semiconductor manufacturing equipment aluminum parts machining【Leave cost reduction to Philir Co., Ltd.】
GEMÜ stainless steel diaphragm valve for high-purity organic solvents
A large amount of developer dissolution (increased liquid lifespan)! Neo developer solution.
"Best Washing" does not discriminate against dirt. It is a powerful detergent that is gentle on the environment, versatile in use, and a completely new high-performance detergent.