Package removal without causing physical or electrical damage! High selectivity etching.
A new temperature management system that combines "efficiency" and "savings."
Technological capabilities that contribute to the development and practical application of advanced materials.
Far superior in corrosion resistance and plasma resistance compared to protective films created by thermal spraying or aerosol deposition! Yttrium oxide produced by a unique ion-assisted deposition method.
A must-see for those involved in the new development of photomasks! A dry etching device with a compact design that can process photomasks and wafers of various sizes.
Supports etching of fine patterns of metal films such as Al and Cr! Demo machines available! Facility tours and sample testing are currently being conducted.
A small etching machine equipped with pressure gauges on both the top and bottom of the spray!
Compact etching machine that is suitable for narrow spaces, allows for customizable settings based on usage, and achieves short delivery times.
High-precision and high-reliability oxide film microfabrication! Selectively generating radicals from process gases.
The O-ring cherry seal molds O-rings of various sizes according to the AS568 standard (aerospace standard) and other specifications, using a wide variety of materials.
O-ring cherry seal made of 'FKM-90 (fluoro rubber)' material.
Heat-resistant perfluoroelastomer (high temperature resistance: 330°C) material with O-ring cherry seal.
Power consumption reduced by 66%! An energy-saving temperature management system with a width of only 390mm.
During scanning, uniformity improvement through peripheral speed control is also possible! We have received numerous uses and have a wealth of experience compared to conventional methods.
The KRI grid ion source is available in DC type and RF type.
We can accommodate everything from special specifications for R&D to mass production! Approximately three times longer lifespan compared to standard grids.
We propose specifications that consider cost reduction through wet etching.
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Frostech's glass surface treatment agent is a 3R chemical aimed at achieving zero emissions that is friendly to both the natural environment and the workplace.
Dry etching equipment, reactive ion etching equipment, compact etcher, ashing equipment, cleaner (cleaning equipment)
Responding to demands for flatness, magnetism, and heat resistance! Achieving a variety of small-lot projects using etching technology.
A compact batch-type plasma etching device that supports sub-micron etching and features process support through sample testing.
If you are having trouble procuring electrostatic chucks, pin chucks, etc., this is a must-see! We offer high-precision, high-quality ceramic parts produced overseas!
Built-in 10 types of polishing/etching conditions suitable for various materials! Short polishing time and high reproducibility.
Using for name representation! Introducing examples of processed imprint marks.
Evaluation of Organic Coatings on Metals Using Electrochemical Measurement Devices Based on ISO 17463 - Paints and Varnishes
For production equipment and research and development! Providing a series of processes in thin-film electronic component manufacturing!
Production and research and development equipment for semiconductors and solar cells! High-temperature furnace using unique high-temperature processing technology.
Can be set up to 180℃! Leakless high-temperature compatible model.
Compact yet professional! Reproducing realistic etching tests with a small amount of liquid.
It is an alumina thermal spray material that provides excellent coating properties such as wear resistance, chemical stability, and insulation.
High-performance multi-sputtering device 6-element multi-sputter (for Φ4 inch) 4-element multi-sputter (for Φ6, 8 inch)
Tabletop plasma etching device capable of localized processing with unique spot plasma technology.
A wide range of products from general ion-exchange type metal removal membranes to metal removal membranes specialized for semiconductor applications.
The Y5O4 F7 film has a small change in surface fluorine content, allowing for a significant reduction in the aging time of the etching equipment. Its transmittance characteristics are also excellent.
Higher productivity for PLP! More process possibilities. Optimized for advanced packaging.
The industry's smallest, designed and manufactured in France, compatible with 2 to 12-inch wafers by simply replacing the wafer tray, Corial 300 and 500 series.
We propose the optimal dry etching equipment for processing difficult-to-etch materials such as Au, Pt, and magnetic materials!
Excellent low-temperature charge damage-free surface modification and cleaning! Affordable vacuum and atmospheric pressure plasma available!
Pre-treatment for metal structure inspection will be carried out due to surface corrosion caused by chemicals.
We offer coaxial cables certified for flame retardancy according to UL and IEC standards.
Flow spray of 2 mmlit/min or less is possible!
Possible from prototype to mass production. No-bridge etching with smooth edges without burrs, etc. Thin plate and large format processing, molybdenum processing also OK! Basic knowledge materials will also be provided.
Supports wafers up to 150 or 200 mm! Etching angle and stage tilt/rotation mechanism.
The liquid contact part is made of PFA resin, providing good temperature control response for the chemical inline heater.
Introducing a full-scale production device equipped with a vacuum cassette chamber, offering excellent process reproducibility and stability.
Spin etcher that sprays etching solution while rotating the substrate.
Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.
Demo units available for loan! This is a device that performs a series of cleaning and etching processes, including pure water treatment and drying.
We have a track record of devices such as "XeF2 etching equipment" and "batch-type ashing equipment."
Perfluoroelastomer!! It is a perfluoroelastomer with excellent heat resistance and chemical resistance. Our company is the official distributor of Kalrez in Japan.
To respond at a low cost, we are making efforts such as sharing and co-using essential original plates for etching!
Fluororesin (also known as Teflon) has various properties, but in short, it is particularly stable against heat.
Surface treatment refers to the process of applying modifications to the surface of a substrate to impart various properties that are not inherent to the substrate itself.
The optimal nozzle design enables uniform processing! A finish without liquid stains, unevenness, or rust!
Batch-type plasma ashing device for 50 wafers at once.
Achieve smooth etching surfaces and high machining precision! We support sample testing!
Supports automated mass production lines. Inline type, sheet type, and various types with flexible hardware configurations, all with a proven track record of high effectiveness of vacuum plasma in mass production lines.
A plasma cleaning device with extensive experience in removing DLC films from aspherical lenses. An essential dry film removal device for the repair of high-value-added molds.
Achieving high-density plasma with a simple mechanism. Compatible with substrates from wafers to 1 m². Damage-free etching of Si-based materials, metals, organic films, and various thin films.
It is possible to grasp 6-inch and 8-inch wafers with the same non-contact tweezers.
Heat-resistant polyimide resin MELDIN has been adopted for the wafer carriers of semiconductor manufacturing equipment.
It is possible to stably transport workpieces with a thickness of 50 μm, and it is also compatible with FPC transport.
The above etching is independently pressure-controlled for even higher precision. It is compatible with FPC transport.
UHP/UHV, ultra-high purity, ultra-high vacuum, advanced metal sealing solutions for ultra-low temperature.
We will eliminate the accumulation of chemical solution with a vacuum nozzle.
Liquid treatment of bubbles generated by developing machines! A bubble treatment device that improves substrate quality.
Safe and clean ferric chloride etching solution electrolysis regeneration device
Vietnam Metal Processing, Aluminum Processing, Milling Processing [Leave cost reduction to Philir Co., Ltd.]
Introducing aircraft parts that have undergone etching treatment (mesh)!
High frequency of stainless steel usage! Introducing examples of processed etched nameplates.
Conductive fluoropolymer coating for components that require high operating temperatures, non-stick properties, and chemical resistance.
High-precision and reliable metal seal model
Large etching up to 1500mm x 3000mm is possible! Achieved ultra weather resistance with unique special plating!! Deep engraving enhances the sense of luxury!!
A nameplate that combines decorative and durable features!! Sharp expressions are possible!!
Vibrant expressions are possible with inexpensive aluminum nameplates! The anodized coating (alumite treatment) makes it resistant to the effects of solvents and other substances!
An aluminum nameplate that requires minimal manufacturing processes and can accommodate short delivery times!! Achieving ultra light resistance by expressing black color through a chemical reaction instead of paint!!
Super large printing of 1200X1500 mm is possible! Weather-resistant and ideal for outdoor products! Integrated production of printing, embossing, and contour processing! Metallic printing available!
Fine printing is possible. It can print small text, intricate designs, and halftones, making it ideal for producing nameplates and other items with a lot of printed content.
A versatile nameplate that excels at displaying a bright atmosphere.
Achieving three-dimensional shapes that are difficult to realize with conventional processing.
Durable and substantial nameplate.
The technology of braille etching is a patented product of Toho! The integration of patterns and braille enhances design quality!
Achieve ultra weather resistance by applying special plating to stainless steel nameplates! We also accommodate ultra-large etching up to 1500mm x 3000mm!
A technique born from the application of precision photography and photo corrosion methods! An ideal processing method for ultra-small, ultra-thin, and complex-shaped products.
Continuous heat treatment of electronic components at uniform temperatures! A heat treatment furnace that accommodates a variety of types and small lots.
It is characterized by high quality, short delivery times, and good cost performance.
We are working to enhance inspection equipment and quality control systems at each project.
We would like to introduce the general delivery times for printed circuit board manufacturing by Shinko Photo Service.