A new temperature management system that combines "efficiency" and "savings."
A temperature control system that pursues high cooling capacity and fast heating and cooling.
Far superior in corrosion resistance and plasma resistance compared to protective films created by thermal spraying or aerosol deposition! Yttrium oxide produced by a unique ion-assisted deposition method.
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Frostech's glass surface treatment agent is a 3R chemical aimed at achieving zero emissions that is friendly to both the natural environment and the workplace.
A chiller that enables a wide temperature range management from -70℃ to +200℃!
Power consumption reduced by 66%! An energy-saving temperature management system with a width of only 390mm.
Batch-type plasma ashing device for 50 wafers at once.
Expansion to advanced packages: Processing is possible on a 510×515mm substrate.
Safe and clean ferric chloride etching solution electrolysis regeneration device
Conductive fluoropolymer coating for components that require high operating temperatures, non-stick properties, and chemical resistance.
Achieve ultra weather resistance by applying special plating to stainless steel nameplates! We also accommodate ultra-large etching up to 1500mm x 3000mm!
Chemical resistance, heat resistance, insulation, non-magnetic, acid resistance, alkali resistance, oil resistance, solvent resistance, thermal insulation, recycling.
Tabletop plasma etching device capable of localized processing with unique spot plasma technology.
A wide range of products from general ion-exchange type metal removal membranes to metal removal membranes specialized for semiconductor applications.
Providing mass production solutions for high-speed and flexible substrate film deposition applications!
High power, high frequency coaxial solutions compatible with 9 types of coaxial standards.
It enables extremely precise flow control, achieving a very low pulsation and smooth flow of liquid.
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Frostec's non-alkali and soda glass etching agents are 3R chemicals aimed at achieving zero emissions that are friendly to both the natural environment and the workplace.
Equipped with a new plasma source HCD (hollow cathode discharge) electrode, capable of etching various metals and Cu thin films. A new type of etching device that also facilitates large-area processing.
A versatile dry etching device boasting hundreds of successful installations.
If you are having trouble procuring electrostatic chucks, pin chucks, etc., this is a must-see! We offer high-precision, high-quality ceramic parts produced overseas!
A small etching machine equipped with pressure gauges on both the top and bottom of the spray!
Design of the arrangement of transport components (rolls) developed independently by our company! Stable transport without corner bends or dents is possible.
Technological capabilities that contribute to the development and practical application of advanced materials.
A technique born from the application of precision photography and photo corrosion methods! An ideal processing method for ultra-small, ultra-thin, and complex-shaped products.
Vibrant expressions are possible with inexpensive aluminum nameplates! The anodized coating (alumite treatment) makes it resistant to the effects of solvents and other substances!
An aluminum nameplate that requires minimal manufacturing processes and can accommodate short delivery times!! Achieving ultra light resistance by expressing black color through a chemical reaction instead of paint!!
Super large printing of 1200X1500 mm is possible! Weather-resistant and ideal for outdoor products! Integrated production of printing, embossing, and contour processing! Metallic printing available!
Fine printing is possible. It can print small text, intricate designs, and halftones, making it ideal for producing nameplates and other items with a lot of printed content.
Achieving three-dimensional shapes that are difficult to realize with conventional processing.
The technology of braille etching is a patented product of Toho! The integration of patterns and braille enhances design quality!
For production equipment and research and development! Providing a series of processes in thin-film electronic component manufacturing!
We will introduce the processing shapes, cross-sectional shapes, and dimensional tolerances of metal etching.
We are working to enhance inspection equipment and quality control systems at each project.
High corrosion-resistant and durable rollers suitable for the etching process.
A semi-custom-made thin film experimental device that can be assembled with the desired configuration for processes such as evaporation, sputtering, electron beam (EB) deposition, and annealing.
Introduction to Particle-PLUS Analysis Case: "Plasma Analysis of Dual Frequency CCP" Simulation Case
A screen made using etching processing and metal diffusion bonding technology! Introducing with photos.
We also accept requests for partial manufacturing of equipment and assembly of devices related to semiconductor manufacturing, with a minimum estimate of half a day.
Opening the Future with Mother Technology: Introduction to Ralm Tech Services
Plasma processing device (multi-purpose plasma etcher)
Affordable and ultra-compact experimental equipment suitable for IC and MEMS experiments! We propose ready-to-use experimental devices!
Ion exchange membrane electrolytic cell that achieves both high-purity oxidant production and gas separation.
The era has shifted from Y2O3 to YOF! Significantly reduced aging time for etching equipment, decreased particles, greatly increased equipment operating time, and improved productivity!
The Y5O4 F7 film has a small change in surface fluorine content, allowing for a significant reduction in the aging time of the etching equipment. Its transmittance characteristics are also excellent.
For educational institutions and small facilities! A desktop system that allows for easy operation with a touch panel.
A must-see for those involved in the new development of photomasks! A dry etching device with a compact design that can process photomasks and wafers of various sizes.
Extremely low Rc system design in the industry and the highest level of inter-wafer reproducibility!
A film deposition platform for semiconductor wafers and advanced packaging capable of various film deposition treatments.
Advanced horizontal etching for PCB/PCM. VACU-Etch technology ensures 1-mil line uniformity by eliminating the puddle effect.
Supports aviation, medical, and fuel cell applications. Achieves high-precision titanium surface processing using hydrofluoric acid control technology, with a focus on safety and environmental considerations.
New method for managing production lots of plastic molded products!
Microfabrication for glass substrates, optical films, and various high-performance films!
As an automatic device for chemical polishing of thin glass substrates for LCDs, it is suitable for thinning processes up to the G6 generation.
We offer coaxial cables certified for flame retardancy according to UL and IEC standards.
Achieving high-quality etching in a short time through microcontroller control.
Built-in flow path structure! The ability to reproduce three-dimensional structures is a major feature of etched laminated products.
It is less prone to warping even in hot environments! It is cost-effective compared to manufacturing everything through cutting processes.
Supports plating specifications! Often produced using bridge-less etching.
We have a wealth of experience in responding to designs based on information from work and patterns!
Utilizing the high processing flexibility of etching! This is a manufacturing example that enhances heat dissipation.
A slim and high-performance syringe pump that simplifies the design of flow path systems and their integration into devices.
Perfect for heating or keeping various solutions warm! A Teflon heat exchanger can meet those needs.
Pre-treatment for metal structure inspection will be carried out due to surface corrosion caused by chemicals.
Excellent low-temperature charge damage-free surface modification and cleaning! Affordable vacuum and atmospheric pressure plasma available!
High etching effect regardless of organic or inorganic! Rental starts from one week♪ Easy to use with touch panel control.
A plasma cleaner that can be customized to meet your needs.
The liquid contact part is made of PFA resin, providing good temperature control response for the chemical inline heater.
Frostec's etching agent for quartz glass is a 3R chemical aimed at achieving zero emissions that is friendly to both the natural environment and the workplace.
A compact batch-type plasma etching device that supports sub-micron etching and features process support through sample testing.
Damage-free, high throughput, multi-purpose compatible high-end devices, compound semiconductors, and MEMS. Extensive track record and comprehensive support. New type now available.
Batch-type etching equipment with extensive experience in etching and ashing of wafers, glass, and large substrates. Also compatible with semiconductor manufacturing equipment parts and materials.
This is a highly regarded bolt and nut that is ideal for environments that dislike impurities, ranging from extremely low temperatures to high temperatures!
This is a highly regarded bolt and nut that is optimal for environments that dislike impurities, ranging from extremely low temperatures to high temperatures!
【Demo unit available for loan!】A semi-automatic device that transports wafers from the processing tank to the rinse tank via an arc.
Switching between RIE mode and DP mode is possible! Reduction of metal contamination through special surface treatment.
We provide sapphire components with wide transparency characteristics, hardness, chemical stability, heat resistance, and good thermal conductivity.
Heat-resistant polyimide resin MELDIN has been adopted for the wafer carriers of semiconductor manufacturing equipment.
Compact etching machine that is suitable for narrow spaces, allows for customizable settings based on usage, and achieves short delivery times.
Compact Ultra-High Precision Etching Device MPE40
