High-performance laser lithography equipment for research and development.
High-speed high-resolution laser exposure device
Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.
Extensive experience in through-hole and laser via (LVH) inspections. High-end AOI for printed circuit boards that combines years of expertise with the latest technology.
It is a high-precision high-voltage power supply device for TFE electron guns!
Vacuum Non-Magnetic USM Drive Unit <Custom>
Aluminum sheet welding using fiber laser welding.
Defects in the FPD cell panel can be corrected by cutting the ITO pattern.
Development materials for a robust high-brightness, long-lifespan, low-power consumption electron gun!
High-speed semiconductor mask laser drawing device 'ULTRA'
We take pride in being small, high-precision, and low power consumption, and by consistently producing from crystal processing, we are able to respond to our customers' demands in detail and with short delivery times.
It is a high-precision top-hat beam shaper that is not limited to specific wavelengths, thanks to a smooth aspheric lens.
Pursuing line linearity! Generating an ideal top hat beam with uniform illuminance.
A magnetic field generator that detects fluctuations in external disturbance magnetic fields, generates a counteracting magnetic field to control and stabilize the magnetic field variations.
A kit that allows you to easily learn about the properties of permalloy and its magnetic shielding performance.
It is the high-voltage power supply unit "FE103XP" for CD-SEM and review SEM!
TFE electron gun, high-voltage power supply device "FE503XP" for electron beam lithography!
This is the high-voltage power supply unit 'IB303XS' for FIB ion guns, which also helps shorten the development period!
This is the "IB303XP," a high-voltage power supply for FIB ion guns that also helps shorten the development period!
This is the drive power supply 'XE303XP' exclusively for soft X-ray tubes using a thermal FE emitter!
It is a high-voltage power supply for TFE electron guns!
No need for a photomask! It is possible to form ultra-fine patterns below 100nm.
Robust and scalable design! High-energy, strongly focused beam.
Can be processed into various semiconductor substrates, glass, diamonds, etc.
We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.
Industry high-level high-resolution or high-throughput maskless laser direct writing equipment
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and spatial electrification!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic fields and static magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Surface treatment device for sputtering ion gun
Surface treatment device - Scanning ion gun
Using a high-speed variable beam shaper! Applications using fine marking [Exhibiting at Laser EXPO]
The productivity is different from previous exposure devices!
High-power red semiconductor laser marking / Part number M1170NMSH-7LA
Compared to conventional electron sources, it is possible to achieve low energy dispersion and high current.
No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufacturing equipment!
By using an electron beam metal 3D printer to fabricate SUS materials, significant reductions in fabrication time and cost are expected.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.
Aluminum welding: thin plate to thick plate
Two robots collaborate to create a portrait! They extract lines such as outlines from the image and generate the robots' trajectories.
Metal contaminant-free dielectric lining! A compact ECR atomic beam source compatible with ultra-high vacuum equipment.
Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!
Beam energy 100 to 2,000 eV! Uniform long ion beam with innovative magnetic circuit design.