High-speed high-resolution laser exposure device
High-performance laser lithography equipment for research and development.
TFE electron gun, high-voltage power supply device "FE503XP" for electron beam lithography!
We have developed a voice coil type linear motor (VCM) suitable for positioning with a movement distance of several tens of millimeters for high-speed movement and ultra-precise positioning.
Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.
Extensive experience in through-hole and laser via (LVH) inspections. High-end AOI for printed circuit boards that combines years of expertise with the latest technology.
We take pride in being small, high-precision, and low power consumption, and by consistently producing from crystal processing, we are able to respond to our customers' demands in detail and with short delivery times.
A magnetic field generator that detects fluctuations in external disturbance magnetic fields, generates a counteracting magnetic field to control and stabilize the magnetic field variations.
A kit that allows you to easily learn about the properties of permalloy and its magnetic shielding performance.
It is a high-voltage power supply for TFE electron guns!
It is a high-precision high-voltage power supply device for TFE electron guns!
It is the high-voltage power supply unit "FE103XP" for CD-SEM and review SEM!
This is the high-voltage power supply unit 'IB303XS' for FIB ion guns, which also helps shorten the development period!
This is the "IB303XP," a high-voltage power supply for FIB ion guns that also helps shorten the development period!
This is the drive power supply 'XE303XP' exclusively for soft X-ray tubes using a thermal FE emitter!
No need for a photomask! It is possible to form ultra-fine patterns below 100nm.
Can be processed into various semiconductor substrates, glass, diamonds, etc.
Special order support team! Providing ideal solutions for large-scale production.
Robust and scalable design! High-energy, strongly focused beam.
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and spatial electrification!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetostatic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic fields and static magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Vacuum Non-Magnetic USM Drive Unit <Custom>
Aluminum sheet welding using fiber laser welding.
Surface treatment device for sputtering ion gun
Surface treatment device - Scanning ion gun
Defects in the FPD cell panel can be corrected by cutting the ITO pattern.
Compared to conventional electron sources, it is possible to achieve low energy dispersion and high current.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.
By using an electron beam metal 3D printer to fabricate SUS materials, significant reductions in fabrication time and cost are expected.
Two robots collaborate to create a portrait! They extract lines such as outlines from the image and generate the robots' trajectories.
High-speed semiconductor mask laser drawing device 'ULTRA'
Development materials for a robust high-brightness, long-lifespan, low-power consumption electron gun!
Development, manufacturing, and consulting of ultra-high-speed electron beam drawing technology and its elemental technologies! Contributing to society through precision processing technology.
Metal contaminant-free dielectric lining! A compact ECR atomic beam source compatible with ultra-high vacuum equipment.
Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!
Beam energy 100 to 2,000 eV! Uniform long ion beam with innovative magnetic circuit design.