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  1. Home
  2. Product Ranking
  3. Weekly views ranking by Electron beam lithography equipment

Electron beam lithography equipment Weekly Product Rankings

Last Updated:29 10, 2026 Aggregation Period:21 10, 2026〜27 10, 2026
This ranking is based on the number of page views on our site.

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Top Hat Beam Shaper Technology 彩世/ Ayase Corporation Yokohama

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It is a high-precision top-hat beam shaper that is not limited to specific wavelengths, thanks to a smooth aspheric lens.

  • Electron beam lithography equipment
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Laser direct writing device 伯東 本社

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Achieving ultra-fine high-resolution drawing on the tabletop.

  • Other semiconductor manufacturing equipment
  • Electron beam lithography equipment
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Technical Introduction: "Photo Cathode Technology" Photo electron Soul

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Compared to conventional electron sources, it is possible to achieve low energy dispersion and high current.

  • Electron beam lithography equipment
  • Other physicochemical equipment
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Laser Direct Writing Device "DWL 66+" ハイデルベルグ・インストルメンツ

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High-performance laser lithography equipment for research and development.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper
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Magnetic Shielding Kit PC Permalloy オータマ

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A kit that allows you to easily learn about the properties of permalloy and its magnetic shielding performance.

  • Electron beam lithography equipment
  • Semiconductor inspection/test equipment
  • Other inspection equipment and devices
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Electron beam drawing device 伯東 本社

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We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.

  • Electron beam lithography equipment
  • Other surface treatment equipment
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Direct Drawing Device "Ledia6" SCREEN PEソリューションズ 本社

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Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.

  • Electron beam lithography equipment
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Laser drawing device "DWL 2000 GS" series ハイデルベルグ・インストルメンツ

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High-speed high-resolution laser exposure device

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper
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TFE electron gun - 10kV high voltage power supply for CD-SEM, review for SEM use フューテックス

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It is the high-voltage power supply unit "FE103XP" for CD-SEM and review SEM!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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Double-sided simultaneous exposure device for inner layer boards Light HDE110S 豊和工業 機械事業部CE営業グループ電子機械チーム

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The productivity is different from previous exposure devices!

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Resist Device
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Pattern generator for nano lithography 伯東 本社

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Expand the lithography function of your SEM.

  • Electron beam lithography equipment
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Electromagnetic Field Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
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Vacuum Non-Magnetic USM Drive Unit <Custom> メガトラスト MEGA-TECH Formations 豊玉事業所

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Vacuum Non-Magnetic USM Drive Unit <Custom>

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Analytical Equipment and Devices
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Hermetic feedthrough メガトラスト MEGA-TECH Formations 豊玉事業所

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Hermetic feedthrough

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Analytical Equipment and Devices
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High Power Red Semiconductor Laser Marking M1170NMSH-7LA シロ産業

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High-power red semiconductor laser marking / Part number M1170NMSH-7LA

  • Electron beam lithography equipment
  • Marking machine
  • Laser marker
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Servo driver for voice coil motors (VCM) サーボテクノ

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We have developed a voice coil type linear motor (VCM) suitable for positioning with a movement distance of several tens of millimeters for high-speed movement and ultra-precise positioning.

  • Electron beam lithography equipment
  • Servo
  • Torque Control
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Optical appearance inspection device 'MIYABI 7' ideal for hole inspection such as LVH. SCREEN PEソリューションズ 本社

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Extensive experience in through-hole and laser via (LVH) inspections. High-end AOI for printed circuit boards that combines years of expertise with the latest technology.

  • Electron beam lithography equipment
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Small ECR Atomic Beam Source 'ERS-35' ノベリオンシステムズ

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Metal contaminant-free dielectric lining! A compact ECR atomic beam source compatible with ultra-high vacuum equipment.

  • Electron beam lithography equipment
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ECR line beam ion source "ELBS-150" ノベリオンシステムズ

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Beam energy 100 to 2,000 eV! Uniform long ion beam with innovative magnetic circuit design.

  • Electron beam lithography equipment
  • Other machine elements
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Cooperative Action Type Portrait Drawing Robot Uchigen Co., Ltd.

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Two robots collaborate to create a portrait! They extract lines such as outlines from the image and generate the robots' trajectories.

  • Electron beam lithography equipment
  • Image Processing Equipment
  • Other image-related equipment
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High-speed laser drawing device "VPG⁺ Series" ハイデルベルグ・インストルメンツ

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High-speed pattern generator

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper
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Introduction to the development materials for the "Robust High Brightness, Long Lifespan, Low Power Consumption Electron Gun." PARAM

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Development materials for a robust high-brightness, long-lifespan, low-power consumption electron gun!

  • Electron beam lithography equipment
  • Other electronic parts
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△▽△ Aluminum-made Inspection Machine Interior Parts △▽△ ショウエイ 本社

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Aluminum welding: thin plate to thick plate

  • Electron beam lithography equipment
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Metal 3D Printer: Reasonably fabricating stainless steel with an electron beam. 日本積層造形

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By using an electron beam metal 3D printer to fabricate SUS materials, significant reductions in fabrication time and cost are expected.

  • Electron beam lithography equipment
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Crystal High-Precision Crystal マキエレクトロ

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We take pride in being small, high-precision, and low power consumption, and by consistently producing from crystal processing, we are able to respond to our customers' demands in detail and with short delivery times.

  • Electron beam lithography equipment
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Ultra-high precision measurement line laser module 彩世/ Ayase Corporation Yokohama

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Pursuing line linearity! Generating an ideal top hat beam with uniform illuminance.

  • Electron beam lithography equipment
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Active Magnetic Shield (Magnetic Field Canceller) オータマ

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A magnetic field generator that detects fluctuations in external disturbance magnetic fields, generates a counteracting magnetic field to control and stabilize the magnetic field variations.

  • Electron beam lithography equipment
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EH430B イワキエンジニアリング

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EH430B

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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5"6"9" Mask Case ツインリンクス

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5"6"9" mask case

  • Electron beam lithography equipment
  • Other clean room equipment and facilities
  • Other optical parts
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TFE Electron Gun - 30KV High Voltage Power Supply - Standard FE303XS フューテックス

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It is a high-voltage power supply for TFE electron guns!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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TFE Electron Gun - 30KV High Voltage Power Supply - High Precision FE303XP フューテックス

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It is a high-precision high-voltage power supply device for TFE electron guns!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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TFE electron gun - 50KV high voltage power supply for electron beam lithography フューテックス

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TFE electron gun, high-voltage power supply device "FE503XP" for electron beam lithography!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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FIB Ion Gun +30KV High Voltage Power Supply - Standard Type IB303XS フューテックス

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This is the high-voltage power supply unit 'IB303XS' for FIB ion guns, which also helps shorten the development period!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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FIB Ion Gun +30KV High Voltage Power Supply - High Precision Type IB303XP フューテックス

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This is the "IB303XP," a high-voltage power supply for FIB ion guns that also helps shorten the development period!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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High Voltage Power Supply for Nano Focus X-ray Tube XE303XP フューテックス

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This is the drive power supply 'XE303XP' exclusively for soft X-ray tubes using a thermal FE emitter!

  • Semiconductor inspection/test equipment
  • Electron beam lithography equipment
  • Other processing machines
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[Business Introduction] Special Applications フォンアルデンヌジャパン

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Special order support team! Providing ideal solutions for large-scale production.

  • Electron beam lithography equipment
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Linear Ion Source "LION" フォンアルデンヌジャパン

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Robust and scalable design! High-energy, strongly focused beam.

  • Electron beam lithography equipment
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Wafer microfabrication E&E Evolution

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Can be processed into various semiconductor substrates, glass, diamonds, etc.

  • Etching Equipment
  • Electron beam lithography equipment
  • Processing Contract
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Current stability and position stability are top-class in the industry! Electron beam lithography equipment. クレステック 本社

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Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.

  • Electron beam lithography equipment
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3D Ion Beam Trajectory Analysis Software / μ-Beam ミューテック

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Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
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Electromagnetic Field Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and spatial electrification!

  • Electron beam lithography equipment
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Magnetic Field Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic and magnetostatic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
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Electric Field Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic fields and static magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
26
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Electric Field Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
26
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Trajectory Analysis Software 【μ-BEAM 3D Trajectory Analysis Software】 ミューテック

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Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!

  • Electron beam lithography equipment
26
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Fiber Laser Welding Case Study: [Aluminum Box] 第五電子工業

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Aluminum sheet welding using fiber laser welding.

  • Electron beam lithography equipment
26
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Single-shot bulk depiction processing 'Beam Shaping Device for Laser Marking' Kantum Ushikata Co., Ltd.

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Using a high-speed variable beam shaper! Applications using fine marking [Exhibiting at Laser EXPO]

  • Electron beam lithography equipment
  • Laser marker
26
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Surface treatment device, sputtering ion gun "Type 40C1" テクノポート

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Surface treatment device for sputtering ion gun

  • Sputtering Equipment
  • Electron beam lithography equipment
26
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Surface treatment device Scanning ion gun "Model 40E1" テクノポート

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Surface treatment device - Scanning ion gun

  • Sputtering Equipment
  • Electron beam lithography equipment
26
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Fully automatic laser repair device 清和光学製作所

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Defects in the FPD cell panel can be corrected by cutting the ITO pattern.

  • Electron beam lithography equipment
  • Laser marker
  • Other processing machines
26
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[For the semiconductor industry] Replacement of rubber O-rings with spring-loaded C-rings HNRV Technetics Group Japan

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No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufacturing equipment!

  • Sealing
  • CVD Equipment
  • Electron beam lithography equipment
26
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Amperage-class ion source for milling equipment ノベリオンシステムズ

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Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!

  • Electron beam lithography equipment
  • Other machine elements
26
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"ULTRA" series of mask laser drawing devices for semiconductors. ハイデルベルグ・インストルメンツ

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High-speed semiconductor mask laser drawing device 'ULTRA'

  • Electron beam lithography equipment
  • Photomask
  • Stepper

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