Industry high-level high-resolution or high-throughput maskless laser direct writing equipment
Compared to conventional electron sources, it is possible to achieve low energy dispersion and high current.
A magnetic field generator that detects fluctuations in external disturbance magnetic fields, generates a counteracting magnetic field to control and stabilize the magnetic field variations.
High-performance laser lithography equipment for research and development.
Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.
High-speed high-resolution laser exposure device
High-speed semiconductor mask laser drawing device 'ULTRA'
Beam energy 100 to 2,000 eV! Uniform long ion beam with innovative magnetic circuit design.
We take pride in being small, high-precision, and low power consumption, and by consistently producing from crystal processing, we are able to respond to our customers' demands in detail and with short delivery times.
It is a high-precision top-hat beam shaper that is not limited to specific wavelengths, thanks to a smooth aspheric lens.
Pursuing line linearity! Generating an ideal top hat beam with uniform illuminance.
A kit that allows you to easily learn about the properties of permalloy and its magnetic shielding performance.
It is a high-precision high-voltage power supply device for TFE electron guns!
It is the high-voltage power supply unit "FE103XP" for CD-SEM and review SEM!
We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.
Special order support team! Providing ideal solutions for large-scale production.
Robust and scalable design! High-energy, strongly focused beam.
No need for a photomask! It is possible to form ultra-fine patterns below 100nm.
Can be processed into various semiconductor substrates, glass, diamonds, etc.
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and spatial electrification!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetostatic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic fields and static magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Consider the ion trajectories in electrostatic and magnetic fields, dielectrics, electrodes, conductors, coils, magnets, magnetic materials, and space charge!
Aluminum sheet welding using fiber laser welding.
Surface treatment device for sputtering ion gun
Surface treatment device - Scanning ion gun
High-power red semiconductor laser marking / Part number M1170NMSH-7LA
Defects in the FPD cell panel can be corrected by cutting the ITO pattern.
Extensive experience in through-hole and laser via (LVH) inspections. High-end AOI for printed circuit boards that combines years of expertise with the latest technology.
No need to change the size or number of existing bolts? A must-see for those struggling with "wanting to eliminate gas permeation and gas release from vacuum rubber O-rings" in semiconductor manufacturing equipment!
Development materials for a robust high-brightness, long-lifespan, low-power consumption electron gun!
Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!
Two robots collaborate to create a portrait! They extract lines such as outlines from the image and generate the robots' trajectories.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.