List of Electric furnace products
- classification：Electric furnace
46～90 item / All 517 items
Heat resistant up to 1200℃. We will custom-make high-performance insulation covers that ensure safety in the working environment!
- Glass
The split-type tubular furnace, HTRV-A model, can achieve a maximum temperature of 1700°C for heat treatment when used in a vertical or horizontal position.
- Electric furnace
Solving various issues of the aluminum holding furnace! "1. Reduction of oxides" "2. Improved maintainability" "3. Safety" "4. Energy conservation"
- Electric furnace
- Heating device
- Industrial Furnace
Introducing the hybrid electric and combustion type of the aluminum continuous melting holding furnace "Freedom," designed with the wish to free you from daily cleaning!
- aluminum
- Industrial Furnace
- Electric furnace
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Free demo units available! Electric heating device for cooking pots using SiC heaters.
- Electric furnace
- Heating device
- Ceramic Heater
The electric furnace construction machine EVS (Electric Vibration System) that distinguishes itself from conventional pneumatic systems with labor-saving, speed, and environmental preservation!!!
- Electric furnace
- Power tools
- alloy
When it comes to crucible induction furnace lining materials, it's Japan Crucible's silica material!!! It can be installed using various furnace construction machines and contributes to stable operati...
- Electric furnace
- Ceramics
- Industrial Furnace
We handle electric furnaces from various manufacturers.
- Electric furnace
The best proposal for the core process of magnetic devices. Annealing equipment provided by a magnetic specialty manufacturer.
- Heating device
- Electric furnace
- Industrial Furnace
Minimize work inside the glove box ◎ Screening of solid electrolyte materials / Impedance evaluation by temperature characteristics ◎ Multiple uniform, short time, and accurate test evaluation
- Lithium-ion battery
- Secondary Cells/Batteries
- Electric furnace
"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.
The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.
Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.
- Electric furnace
Catalog for Budget Application for High-Temperature Heating Furnaces / For budget applications such as development and research expenses
We have lined up the heating observation devices and IR image furnaces from Yokokura Manufacturing, used by various research institutions around the world. ▼ Product Lineup ▼ High-Temperature Furnaces 1. Heating Observation Type "MHO-300-2" - Observe with your microscope! Optional cooling down to -100°C. 2. Compact "IR-TPS" - On-site observation at high temperatures (1500°C) with your microscope. 3. Ultra-High Temperature Heating Type "IR-18SP" - Heats up to high temperatures (1800°C). 4. Compact "IR-TP" - Designed to enable various analyses. 5. Wide-Range High-Temperature Type "IR-QP" - Offers a wide heating range in the IR series, heating up to high temperatures (1700°C). 6. Wide-Range Type "IR-HP" - Offers a wide heating range in the IR series, suitable for heating plates, wafers, substrates, etc. 7. Wide-Range High-Temperature Type "IR-HQ" - A higher model than IR-QP, heats up to high temperatures (1800°C). 8. Large Area "IR-OP" - For simulating various heating conditions. 9. Long-Length Large Area "IR-HP5" - Utilizes specially designed long-length heating lamps. Please check the individual product pages for more details. We also welcome inquiries for customizations tailored to your testing needs, so feel free to contact us.
Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Annealing furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.
- Heating device
- Electric furnace
- Other heaters
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
We provide development and design technology for heating furnaces and heating systems with 30 years of experience in drawing furnaces and vitrification furnaces for optical fibers.
- Industrial Furnace
- Electric furnace
- Semiconductor inspection/test equipment
Conveyor-type far infrared heating furnace
- Electric furnace
AGV + hot air circulation batch furnace
- Electric furnace
Linking a continuous batch furnace with FA (automation equipment for labor-saving).
- Electric furnace
Rapid heating with high-temperature, high-flow hot air! A high-temperature hot air preheater furnace that can be easily made at low cost.
- Heating device
- Other heaters
- Electric furnace
Using a blower as an air source, it discharges hot air at 600℃! It is suitable for production lines that require a large volume of hot air.
- Heating device
- Other heaters
- Electric furnace
Ideal for fine local heating and low flow heating! Maximum output of a super compact hot air heater at 600℃.
- Heating device
- Other heaters
- Electric furnace
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A small hot air heater that blows out hot air at a maximum of 800℃! Here are five tips for selection.
- Heating device
- Other heaters
- Electric furnace
Ideal for heat treatment of guide wires! Space-saving and energy-saving are achievable through the miniaturization of the furnace body.
- Heating device
- Other heaters
- Electric furnace
We would like to introduce the technical advisory services provided by the D&T Lab.
- Glass
- Coater
- Electric furnace
The bestselling heat treatment furnace "High Shifter" has evolved further with the latest features!
- Industrial Furnace
- Electric furnace
- Other surface treatment equipment
Consistent performance to meet various drying needs!
- Heating device
- Drying Equipment
- Electric furnace
An easy-to-use tabletop electric furnace for everyone!
- Electric furnace
Utilizing hydrogen gas, stainless steel bright treatment is possible!
- stainless
- Annealing furnace
- Electric furnace
For joining metal products, flux-free brazing in a non-oxidizing furnace is optimal!
- Electric furnace
- Other processing machines
A tempering furnace for molds and tools that utilizes steel and extends lifespan.
- Electric furnace
- Press Dies
Gas carburizing furnace for multi-variety, small-batch production.
- Other machine tools
- Electric furnace
- Other cutting tools
Electric muffle furnace capable of rapid heating.
- Electric furnace
A safe and high-performance electric muffle furnace with good maintainability.
- Electric furnace
Easy-to-operate practical type electric muffle furnace.
- Electric furnace
High-output near-infrared heater! Excellent workability, suitable for high-temperature heating and PET stretching!
- Other heaters
- Heating device
- Electric furnace
High-speed heating to 900°C within tens of seconds! High energy density can also be achieved.
- Other heaters
- Heating device
- Electric furnace
Max 1000℃, MFC maximum 3 systems, APC pressure control, compatible with 4" or 6" substrates, high vacuum annealing equipment (<5 × 10^-7 mbar)
- Annealing furnace
- Heating device
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Effective utilization of thermal energy is possible! It can accurately heat materials in shapes such as cylindrical or flat plates.
- Heating device
- Electric furnace