List of CVD Equipment products

Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

• Other conveying machines

Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.

• Other safety and hygiene products

A5056 processed products, individual items, machining processing [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Ashing device
• Semiconductor inspection/test equipment

CNC lathe processing, aluminum precision cutting, semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• CVD Equipment
• Ion implantation equipment

A5056 / Lathe processing / Aluminum processing [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

Aluminum cutting / A5052 / Lathe processing / Osaka [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Sputtering Equipment
• Semiconductor inspection/test equipment

Plasma CVD equipment

• CVD Equipment

We will introduce the trench processing of GaN based on our past processing achievements.

• CVD Equipment

As a result of GaN microLED mesa processing, we have published emission spectral data during the GaN microLED mesa processing!

• CVD Equipment

Plasma CVD equipment

• CVD Equipment

It includes a comparison of blade dicing and plasma dicing.

• CVD Equipment

We are publishing new data on the non-bosch process for silicon.

• CVD Equipment

As an effect of Aqua Plasma, we are publishing results of surface depth analysis by ESCA.

• CVD Equipment

We offer sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

- A wide range of standard-sized products - Easy installation - Precision sintering diffusion bonding (simultaneous sintering) - High flow rate

• CVD Equipment

Aluminum processing, anodizing treatment, Osaka [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• CVD Equipment
• Evaporation Equipment

Stainless processing, milling processing [Leave cost reduction to Firiru Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

The horizontal tolerance is +0.2/0-0mm, and the thickness tolerance is +/-0.05mm! Let me introduce the electronic grade CVD.

• CVD Equipment
• others

We offer a lineup of sizes ranging from 3.0x3.0mm to 10.0x10.0mm!

• CVD Equipment
• others

The surface roughness Ra is polished, Ra < 5nm! We introduce optical grade single crystals.

• CVD Equipment
• others

Introducing polycrystalline mechanical options with thicknesses of 0.25mm and 0.50mm!

• CVD Equipment
• others

Designing thermal conductivity from 1,000 W/mK to over 2,000 W/mK! Introducing polycrystalline thermal materials.

• CVD Equipment
• others

Suitable for commercial use! It has very stable and predictable characteristics and behavior.

• CVD Equipment
• others

The horizontal tolerance is +0.1/0-0mm! Introducing single crystal mechanical components.

• CVD Equipment
• others

It is an introduction device that transmits linear motion from the atmospheric side to samples and equipment in a vacuum.

• Sputtering Equipment
• CVD Equipment
• Other semiconductor manufacturing equipment

Please use it for deposition protection and light/beam blocking for the viewing port.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

We will manufacture a vacuum chamber.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

Aluminum five-axis machining Osaka [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Other semiconductor manufacturing equipment

Non-contact transport device for gripping ultra-thin warped wafers without touching them.

• Other semiconductor manufacturing equipment
• CVD Equipment
• Heating device

Osaka Cutting Mass Production Lathe Processing and Machining Processing [Leave cost reduction to Filir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Other semiconductor manufacturing equipment

Aluminum precision parts, lathe processing, machining processing [Leave cost reduction to Filir Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Semiconductor inspection/test equipment

Aluminum precision machining Osaka 【Leave cost reduction to Philir Co., Ltd.】

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

Five-axis machining for semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Semiconductor inspection/test equipment
• Etching Equipment

Aluminum semiconductor device parts processing [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment
• Etching Equipment
• Other semiconductor manufacturing equipment

Machined parts of semiconductor manufacturing equipment A5052 round [Leave cost reduction to Philir Co., Ltd.]

• CVD Equipment

Precision parts for semiconductor manufacturing equipment 【Leave cost reduction to Philir Co., Ltd.】

• CVD Equipment

Semiconductor manufacturing equipment, milling, aluminum precision parts 【Leave cost reduction to Filir Co., Ltd.】

• CVD Equipment
• Other semiconductor manufacturing equipment

High-purity carbon is used extensively in the ion implantation process of semiconductor manufacturing, which requires high purity. Here is an introduction to high-purity carbon.

• Fine Ceramics
• Ion implantation equipment
• CVD Equipment

ALD (Atomic Layer Deposition) equipment dedicated to particles can deposit films on nanoscale particles.

• Lithium-ion battery
• CVD Equipment
• Other surface treatment equipment

Three types of sedimentation devices are available! Please choose according to your needs.

• CVD Equipment

A DLC film with high infrared transmittance is formed on both sides of the substrate at a high rate. Achieving next-generation IR coating with stable hard and advanced soft materials.

• Plasma surface treatment equipment
• Plasma Generator
• CVD Equipment

Compact the device size as much as possible! Achieve stable film formation and low particle count.

• CVD Equipment

Adopting SiC trays! A system that enables mass production while keeping costs down.

• CVD Equipment

We can accommodate a variety of materials and specifications.

• Sealing
• CVD Equipment
• Evaporation Equipment

Equipped with a rapid cooling mechanism using slide movement of the furnace.

• Other physicochemical equipment
• CVD Equipment

AtomSpectraDBViewer: Fast and convenient search! New version now available!

• CVD Equipment
• Chemicals
• Spectroscopic Analysis Equipment