Etching Equipmentの製品一覧
- 分類：Etching Equipment
316～333 件を表示 ／ 全 333 件
Heat resistant up to 1200℃. We will custom-make high-performance insulation covers that ensure safety in the working environment!
- Glass
Microwave Ion-Radical Source IMIS-211Q
- Etching Equipment
- Other semiconductor manufacturing equipment
Microwave Radical Source EMRS-211Q
- Etching Equipment
- Other semiconductor manufacturing equipment
Low-cost multipurpose processing device customizable for cleaning, developing, etching, etc.
- Etching Equipment
- Other semiconductor manufacturing equipment
Not only can we achieve significant cost reductions by utilizing used equipment, but we also offer affordable support for after-sales service, maintenance, and specification changes after installation...
- Coater
- CVD Equipment
- Etching Equipment
We promise to provide the desired process control, ensuring that the boiling point of concentrated phosphoric acid is self-adjusted through refluxing in a safe, reliable, and rational manner.
- Etching Equipment
- Other semiconductors
PSS (Patterned Sapphire Substrate) through wet etching is changing the LED industry!!
About Patterned Sapphire Substrates (PSS) Using Wet Etching Currently, LED manufacturers have two completely different processes as options for their manufacturing processes. The dry etching method allows for the production of high-brightness, high-efficiency LEDs, but it requires a long time for manufacturing and has limitations on throughput. The wet etching method has a shorter manufacturing time and is highly scalable, but it cannot produce LEDs that are efficient or effective. However, in the case of the wet etching method, even when polishing and improving the wafer to enhance light extraction efficiency, significant cost reductions can be achieved compared to the dry etching method. Additionally, because it can scale up very efficiently, the cost reduction rate dramatically increases multiple times as throughput is increased and wafer sizes are expanded.
Easy-to-operate CtoC robot transportable development/etching equipment. Both developer and etcher can be manufactured according to application.
- Resist Device
- Etching Equipment
- Other semiconductor manufacturing equipment
Pursuing high quality, low price, and space-saving; a developer that supports both swing spray and paddle methods.
- Resist Device
- Etching Equipment
- Other semiconductor manufacturing equipment
Spin etcher that sprays etching solution while rotating the substrate.
- Etching Equipment
- Other semiconductor manufacturing equipment
Research and development etching device SPE40
- Other surface treatment equipment
- Etching Equipment
- Other laboratory equipment and containers
Compact etching machine that is suitable for narrow spaces, allows for customizable settings based on usage, and achieves short delivery times.
- Other surface treatment equipment
- Etching Equipment
- Other laboratory equipment and containers
Small thin plate etching device FBE40
- Other surface treatment equipment
- Etching Equipment
- Other laboratory equipment and containers
Compact Ultra-High Precision Etching Device MPE40
- Other surface treatment equipment
- Etching Equipment
- Other laboratory equipment and containers
Small Plasma Cleaner (Simple Sheet-Type Plasma Cleaner)
- Etching Equipment
- Ashing device
Plasma processing device (multi-purpose plasma etcher)
- Etching Equipment
- Ashing device
- Other processing machines
Single-wafer plasma etching processing device (single-wafer plasma etcher)
- Etching Equipment
- Ashing device
- Wafer processing/polishing equipment
Batch-type plasma ashing device for 50 wafers at once.
- Etching Equipment
- Ashing device
- Circuit board processing machine
Electrolytic polishing of aluminum
- Etching Equipment
- Evaporation Equipment
- aluminum
