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Cleaning machine Product List and Ranking from 723 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Jun 10, 2026～Jul 07, 2026
This ranking is based on the number of page views on our site.

Cleaning machine Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jun 10, 2026～Jul 07, 2026
This ranking is based on the number of page views on our site.

  1. ケンテック Kanagawa//Other manufacturing
  2. 丸山製作所 産機営業部 Tokyo//Industrial Machinery
  3. シンショー Hiroshima//Industrial Machinery
  4. 4 LC 洗浄装置事業部 Tokyo//Electronic Components and Semiconductors
  5. 5 ソマックス Osaka//Industrial Machinery
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Cleaning machine Product ranking

Last Updated： Aggregation Period:Jun 10, 2026～Jul 07, 2026
This ranking is based on the number of page views on our site.

  1. Benefits of the Kentech Sealed Cleaning Device and Examples of Cleaning Applications ケンテック
  2. Semiconductor wafer cleaning equipment [Customizable for each item] LC 洗浄装置事業部
  3. Mower "MB Series / MBS Series" 丸山製作所 産機営業部
  4. 4 High-pressure washer "5ps・7.5ps Soundproof Type High-pressure Washer" シンショー
  5. 5 Ultrasonic Cleaner "GCX Series" 日本エマソン株式会社　ブランソン事業本部

Cleaning machine Product List

2671～2683 item / All 2683 items

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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

It is possible to transport, wash, and dry without touching the front and back surfaces of the work.

A single-wafer device that performs polishing slurry cleaning with surfactants and pure water, rinsing with a megasonic spot shower, and spin drying. It allows for transport, cleaning, and drying without touching the front and back surfaces of the workpiece. Simultaneous edge scrubbing is also performed. ■ Capable of simultaneous cleaning of both sides ■ Target wafers for cleaning: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ8”; thickness is negotiable ■ Also compatible with transparent wafers *For more details, please contact us or download the catalog for review.

  • Other cleaning machines
  • Cleaning machine

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Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)

Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)

A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.

A single-wafer device that performs polishing slurry scrubbing with surfactants and pure water, rinsing with megasonic spot shower, and spin drying. It allows for transport, cleaning, and drying without touching the front and back surfaces of the workpiece. Simultaneous edge scrubbing is also performed. ■ Capable of simultaneous cleaning of both sides ■ Target wafers for cleaning: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ8”; thickness is negotiable ■ Also compatible with transparent wafers *For more details, please contact us or download the catalog to view.

  • Other cleaning machines
  • Cleaning machine

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1-chamber type liquid chemical spin scrub cleaning machine

1-chamber type liquid chemical spin scrub cleaning machine

We will provide an environment for scrub cleaning and chemical spin cleaning tests of wafers from φ2” to φ12” in response to research and development and small lot production with space-saving solutions by next spring.

The "Single Chamber Liquid Spin Scrub Cleaning Machine" is a cleaning device that allows for various combinations of non-contact cleaning methods such as high-pressure spray, ultrasonic spray, and chemical solutions, as well as contact cleaning methods like brushes. It completes the cleaning process to spin drying within a single chamber, contributing to space-saving design, which reduces installation space and costs. We can propose suitable equipment configurations based on various device configurations, chemical compositions, desired cleaning performance, and budget according to your needs. 【Features】 ■ Various cleaning methods and chemicals can be combined ■ Suitable for research and development applications and small to medium-sized sites ■ Ideal for sites developing and producing new materials such as SiC, GaN, and LT for small-diameter wafers and power semiconductors ■ Compatible wafer sizes: 3 inches to 6 inches (8 to 12 inches can also be accommodated upon separate consultation) *For more details, please refer to the materials. Feel free to contact us with any inquiries.

  • Other semiconductor manufacturing equipment
  • Cleaning machine

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Chemical liquid scrub spin cleaning device

Chemical liquid scrub spin cleaning device

Complete various cleaning processes to spin drying in a single chamber. Space-saving design suitable for research and development as well as small lot production.

The "Chemical Liquid Scrub Spin Cleaning Device" is a cleaning machine that allows for various combinations of non-contact cleaning methods such as high-pressure spray, ultrasonic spray, and chemical liquids, as well as contact cleaning methods like brushes. It completes the cleaning process to spin drying within a single chamber, contributing to space-saving design that reduces installation space and costs. We can propose suitable device configurations based on various equipment configurations, chemical compositions, desired cleaning performance, and budget according to your needs. 【Features】 ■ Various cleaning methods and chemical liquids can be combined ■ Suitable for research and development applications and small to medium-sized sites ■ Ideal for sites developing and producing new materials such as SiC, GaN, and LT for small-diameter wafers and power semiconductors ■ Compatible wafer sizes: 3 inches to 6 inches (8 to 12 inches can also be accommodated upon separate consultation) *For more details, please refer to the materials. Feel free to contact us with any inquiries.

  • Other semiconductor manufacturing equipment
  • Cleaning machine

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Box cleaning device

Box cleaning device

Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.

This is a cleaning device that performs cleaning of various boxes using high-pressure pulse jets while maintaining a constant distance from the items being cleaned with a multi-joint robot. It is capable of handling both the cleaning and drying processes. *For more details, please contact us or download the catalog to view it.*

  • Other semiconductor manufacturing equipment
  • Other cleaning machines
  • Ultrasonic Cleaner
  • Cleaning machine

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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

Wafer cleaning device "Double-sided brush cleaning device (for research and development)"

It is possible to transport, wash, and dry without touching the front and back surfaces of the work.

A single-wafer device that performs polishing slurry scrubbing with surfactants and pure water, rinsing with a megasonic spot shower, and spin drying. It allows for transport, cleaning, and drying without touching the front and back surfaces of the workpiece. Simultaneous edge scrubbing is also performed. ■ Capable of simultaneous cleaning of both sides ■ Target wafers for cleaning: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ8” (thickness to be discussed) ■ Also compatible with transparent wafers *For more details, please contact us or download the catalog for more information.

  • Other cleaning machines
  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Cleaning machine

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Wafer cleaning device "Double-sided brush cleaning device (mass production type)"

Wafer cleaning device "Double-sided brush cleaning device (mass production type)"

It is possible to transport, wash, and dry without touching the front and back surfaces of the work.

A single-wafer device that performs polishing slurry scrubbing with surfactants and pure water, rinsing with a megasonic spot shower, and spin drying. It enables transport, cleaning, and drying without touching the front and back surfaces of the workpiece. Simultaneous edge scrubbing is also performed. ■ Capable of simultaneous cleaning of both front and back sides ■ Target wafers for cleaning: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ8”, thickness is negotiable ■ Also compatible with transparent wafers *For more details, please contact us or download the catalog for more information.

  • Other cleaning machines
  • Ultrasonic Cleaner
  • Other semiconductor manufacturing equipment
  • Cleaning machine

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Case Study of Support for Introducing Business Improvement Subsidies | Commercial Dishwashers

Case Study of Support for Introducing Business Improvement Subsidies | Commercial Dishwashers

Amount of business improvement subsidy obtained: 900,000 yen. Handwashing tasks have almost disappeared, significantly reducing the burden on employees! This allows for a greater focus on other tasks.

Are you struggling with the introduction costs of commercial dishwashers? "During peak times, washing dishes requires a lot of manpower and time, placing a heavy burden on employees..." Introducing state-of-the-art equipment is key to enhancing a company's competitiveness, but the costs can sometimes pose a significant barrier. Our company offers "subsidy support" that makes high-cost equipment investments possible. Below, we present a case study where we supported the introduction of commercial dishwashers using business improvement grants. 【Case Study】 ■ Reason for considering the introduction of commercial dishwashers → Washing dishes during peak times required a lot of manpower and time, placing a heavy burden on employees. ■ Subsidy support achievements → Amount of business improvement grant obtained: 900,000 yen ■ Effects of introducing commercial dishwashers → Manual washing tasks were almost eliminated, significantly reducing the burden on employees. Hourly wages were increased by 50 yen, allowing them to focus on other tasks. By utilizing subsidies, it is possible to overcome cost barriers and achieve both technological innovation and business expansion. For more details on subsidy support, please check the catalog download button. Feel free to contact us as well.

  • Management consultant/Small business consultant
  • Other cleaning machines
  • Cleaning machine

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Ultrasonic cleaner for remote medical consultation SND

Ultrasonic cleaner for remote medical consultation SND

For the cleaning of medical devices in remote medical care. SND's ultrasonic cleaner.

In the field of telemedicine, the cleanliness of medical instruments is crucial. Especially in situations where face-to-face consultations are difficult, proper cleaning and sterilization of instruments are essential to reduce the risk of infection. Inadequate cleaning can increase the risk of infection for patients. SND's ultrasonic cleaner provides cleaning performance that meets the stringent demands of the medical field. 【Usage Scenarios】 - Cleaning of endoscopes and forceps used in telemedicine - Cleaning of medical instruments in clinics and medical offices - Cleaning of portable medical instruments in home care 【Benefits of Implementation】 - Reduction in cleaning time for medical instruments - Decreased infection risk due to improved cleaning quality - Reduced burden on healthcare professionals

  • others
  • Cleaning machine

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Remove dirt attached to the surface of the mold with the "Kärcher Dry Ice Cleaning Machine."

Remove dirt attached to the surface of the mold with the "Kärcher Dry Ice Cleaning Machine."

It is popular for cleaning molds used in injection molding of molds and plastic parts, as it can be used in equipment and workspaces that dislike moisture!

Kärcher's dry ice cleaning machine, the "Dry Ice Blaster IB 7/40," is a cleaning device that removes dirt by blasting it with dry ice. Since dry ice vaporizes instantly upon impact with the target object, it can be used in environments where moisture-sensitive equipment and facilities are present, making it particularly popular for cleaning molds used in the injection molding of plastic parts. It allows for cleaning while the mold is still attached to the injection molding machine, reducing process downtime and effectively utilizing operational time. Additionally, compared to solvent cleaning, it does not produce waste liquid, eliminating the costs associated with solvents and waste disposal. *For more details, please download the PDF or contact us.*

  • Other cleaning machines
  • Cleaning machine

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<Kärcher HD 4/8 P High Pressure Washer with 2-Year Limited Warranty>

<Kärcher HD 4/8 P High Pressure Washer with 2-Year Limited Warranty>

A compact and durable high-pressure washer that can use a 100V power supply! It includes the main unit, high-pressure hose, gun, and water supply hose (with adapter).

The "Kärcher High Pressure Washer HD 4/8 P (60Hz)" handled by Hokue Trading, the official distributor of Kärcher Japan, is a compact and durable high-pressure washer that can be powered by a 100V power supply. It can be positioned vertically or horizontally, making it convenient for cleaning tasks, transportation, and storage without requiring much space. The handle can also be stored away for added compactness. The body is made of specially reinforced plastic, and it features a wire mesh high-pressure hose, achieving tough durability suitable for professional use. The handle is extendable, and its compact size does not take up much space for storage or transportation. It can be positioned both vertically and horizontally, making it convenient for cleaning tasks, transportation, and storage. The body is made of specially reinforced plastic, and it comes standard with a wire mesh high-pressure hose, a stainless steel lance, and a power nozzle that effectively removes dirt.

  • High pressure cleaner
  • Cleaning machine

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<Kärcher Push-Type Floor Cleaning Machine BD43/25 with 2-Year Limited Warranty>

<Kärcher Push-Type Floor Cleaning Machine BD43/25 with 2-Year Limited Warranty>

This is a self-propelled disc brush type floor cleaning machine recommended for cleaning large areas such as factories and supermarkets.

The "Floor Cleaning Machine BD 43/25 C Bp" from Kärcher, handled by Hokue Trading, the official distributor of Kärcher Japan, is a self-propelled disc brush type floor cleaning machine. It is recommended for cleaning large areas such as factories and supermarkets. Being self-propelled reduces the burden during operation and movement, and the switches operated by the user are color-coded to prevent operational mistakes. It adopts the world's first key management system (KIK), which divides authority with two types of keys. The administrator sets the cleaning parameters, and the operator performs cleaning within those settings. This ensures uniform cleaning results regardless of the operator. Brush and squeegee replacements do not require tools, contributing to reduced working time. Additionally, the premium type features a "one-touch water supply system" that automatically stops water supply. Detergent can be directly poured from the bottle in the necessary amount, making it economical and waste-free. Furthermore, since the tank remains clean, there is no hassle with post-processing. *The premium type comes standard, while the standard type is optional.

  • High pressure cleaner
  • Cleaning machine

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