Sputtering Equipment Product List and Ranking from 43 Manufacturers, Suppliers and Companies

Last Updated：Oct 22, 2025 Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Sputtering Equipment Manufacturer, Suppliers and Company Rankings

Last Updated：Oct 22, 2025 Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

テルモセラ・ジャパン本社 Tokyo//Industrial Electrical Equipment
神港精機東京支店 Tokyo//Industrial Machinery
サンユー電子 Tokyo//Testing, Analysis and Measurement
4 Bühler K.K. Kanagawa//Food Machinery
5 ジャパンクリエイト Saitama//Testing, Analysis and Measurement

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Sputtering Equipment Product ranking

Last Updated：Oct 22, 2025 Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

【nanoPVD-S10A】Magnetron Sputtering Device テルモセラ・ジャパン本社
Desktop RF Sputtering Device 'SVC-700RFIII' サンユー電子
HELIOS Sputtering Device for Optical Thin Films Bühler K.K.
4 Semi-automatic grinding device for steel samples SAB-2-200 ハルツォク・ジャパン
5 Supports multiple metals! It is an ultra-compact coater in the smallest class in the industry. サンユー電子

Sputtering Equipment Product List

76～90 item / All 136 items

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【Delivery Case】Osaka Industrial Technology Research Institute, a local independent administrative agency.

Introducing a case study of a sputtering device capable of automatically creating multilayer films!

We would like to introduce a case where we delivered a magnetron sputtering device to the Osaka Institute of Industrial Technology, a local independent administrative institution. The device delivered this time is our "MS-3C100L model," which consists of a sputtering chamber, a load lock chamber (LL chamber), a vacuum exhaust system, a gas introduction system, a power supply system, a substrate temperature control system, and an operation and control system composed of a PC and control device. The sputtering chamber is equipped with three cathodes for attaching targets, and it is possible to apply RF or DC voltage to each cathode, or to superimpose the voltages. [Case Overview] ■ Delivery Destination: Osaka Institute of Industrial Technology, a local independent administrative institution ■ Delivered Product: MS-3C100L model *For more details, please refer to the PDF document or feel free to contact us.

Company：大阪真空機器製作所
Price：Other

Sputtering Equipment
Vacuum Equipment

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【Thorough Developer Perspective】Custom manufacturing of various devices available.

Consultations are welcome! We handle everything in-house from design to manufacturing and assembly! If you are having trouble with various equipment manufacturing, please feel free to consult with us. *Case study materials are currently available.

Our company has established a consistent production system that covers everything from development to material procurement, processing, assembly, and quality assurance, and we accept custom orders for equipment from various companies. "If only I could design something like this..." "I want to improve work efficiency..." "I want to reduce labor costs..." If you have any concerns, please feel free to consult with us first. We are confident in our quality control and support system. Additionally, we conduct sample processing with demo machines, so please do not hesitate to contact us when needed. 【Production Achievements (Excerpt)】 ■ Ultra-high temperature sputtering equipment for thin-film MEMS ■ Batch-type sputtering equipment for thin-film MEMS ■ Multi-composite sputtering equipment ■ Sputtering equipment with GB for organic EL ■ Load-lock type binary sputtering equipment *For more details, please refer to the PDF materials or feel free to contact us.

Company：ジャパンクリエイト
Price：Other

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High-Rate Depo. Piezoelectric Film Formation Sputtering Device

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

The "piezoelectric film formation sputtering device" is a product that enables continuous film formation from a single crystal epitaxial buffer layer to a piezoelectric film. Through plasma analysis and feedback control using a plasma emission monitor, it allows for fast and stable reactive sputtering, as well as the detection of elements that contribute to the degradation of piezoelectric properties. It is equipped with our unique rapid heating and cooling substrate heating mechanism, achieving a substrate temperature of 900°C. *For more details, please refer to the PDF materials or feel free to contact us.

Company：ジャパンクリエイト
Price：Other

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HELIOS Sputtering Device for Optical Thin Films

Optical sputtering device from Bühler Leybold Optics

HELIOS is a sputtering device developed for the production of high-quality optical films. It is particularly suitable for the manufacture of multilayer filters that require low absorption and low dispersion. The HELIOS series is available in two types: 400 and 800 (substrate sizes).

Company：Bühler K.K.
Price：Other

Evaporation Equipment

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Ion Beam Sputtering Device for Precision Optics IBS1400/1600

Beuler-Lieboldt Optics Vacuum IBS Equipment

Rivolt Optics, with nearly 160 years of history as the world's largest vacuum equipment and device manufacturer, has long-standing experience as an industry leader and provides vacuum thin film manufacturing equipment and processes to achieve high-precision optical coatings. We offer a variety of vacuum chamber sizes, from research and development applications to large-scale production equipment, to meet our customers' diverse needs.

Company：Bühler K.K.
Price：Other

Other surface treatment equipment

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Road lock type sputtering device RAS-1100BII

This is a medium-sized production model that can reproducibly achieve high-quality optical thin films without wavelength shifts at low temperatures using the independently developed RAS (Radical Assisted Sputtering) method, and can also produce functional thin films such as decorative films and nitride films.

Company：シンクロン
Price：Other

Other processing machines

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Semi-automatic grinding device for steel samples SAB-2-200

Semi-automatic belt grinding device for steel sample optical emission spectroscopy (OES) pre-treatment SAB-2-200

This is a semi-automatic belt grinding machine designed for various steel samples. By simply placing the sample in the designated position and pressing the start button, it performs a complete cycle of automatic operation. It is a safe device that does not require the operator to touch the machine while it is in operation. The sample moves back and forth in a direction perpendicular to the belt rotation for grinding, and by utilizing not only the center of the belt but also both ends, it contributes to reducing running costs. Since the sample holding pressure and the number of sample reciprocations can be set arbitrarily, it is possible to change the conditions based on the material of the sample and the state of the belt.

Company：ハルツォク・ジャパン
Price：Other

Other machine tools
Spectroscopic Analysis Equipment
X-ray fluorescence analyzer

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ホロカソードエッジング式スパッタ装置

-ホロカソードガンとスッパッタガンをワンチャンバーに搭載

ホロカソードで強力にプレエッジング

Company：マツボー
Price：Other

Other cutting tools
Press Dies
Other Auto Parts

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Supports multiple metals! It is an ultra-compact coater in the smallest class in the industry.

High-spec compact coater compatible with various metals such as Ni, Cr, W, Ti, and Al!

The "SC-701Mk II ADVANCE" is a high-spec compact coater compatible with various metals such as Ni, Cr, W, Ti, and Al. It is the smallest ultra-compact model in the DC sputtering category. Thin film production of various metals can be easily performed with this compact and user-friendly device. 【Features】 ○ Equipped with a vacuum gauge to ensure reproducibility of film formation conditions ○ Small, compact & high-spec ○ Standard manual shutter included ○ Easy adjustment of the T-S distance with a dedicated sample stage ○ Capable of tungsten coating, making it suitable for sample preparation for high-resolution SEM For more details, please contact us or download the catalog.

Company：サンユー電子
Price：1 million yen-5 million yen

Other physicochemical equipment

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Desktop RF Sputtering Device 'SVC-700RFIII'

Equipped with three sources of cathodes in a compact tabletop size. It is also possible to produce insulating thin films, oxide, and nitride thin films.

The "SVC-700RFIII" is a compact RF magnetron sputtering device that can be placed on a desk, equipped with three φ2-inch cathodes. It is capable of forming stacked films using three types of targets. It can be expanded with a gas introduction mechanism, allowing for the introduction of up to three types of gases, including argon gas. In addition to metal thin films, it can accommodate the production of various thin films such as insulating films, oxides, and nitrides. 【Features】 ■ Desktop size for research and development ■ Sample size: up to φ2 inches ■ Additional film thickness sensor available *For more details, please refer to the documentation. Feel free to contact us with any inquiries.

Company：サンユー電子
Price：5 million yen-10 million yen

Sputtering Equipment

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Single-sided sputtering device

This is a sheet-type sputtering device that achieves high-quality radio wave transmission films.

Features ■ Low attenuation radio wave transmission film (discontinuous film) ■ Easy automation due to sheet-type design ■ Proven track record with the top market share in Japan

Company：芝浦メカトロニクス
Price：Other

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Post-oxidation sputtering device

It is an optimal post-oxidation sputtering device for multilayer optical thin films.

Features ■ Achieves high productivity by adopting a post-oxidation method ■ Realizes excellent film thickness uniformity of ±1% or less ■ Allows for full-area sputtering through horizontal substrate transport

Company：芝浦メカトロニクス
Price：Other

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Magnetron Sputtering Device 'scia Magna 200'

Maximum 200mm diameter substrate! Double ring magnetron (Fraunhofer FEP)

The "scia Magna 200" is a magnetron sputtering device with a rotating single magnetron. Applications include temperature compensation films (SiO2) for TC-SAW, piezoelectric films such as AlN, high and low refractive index films for optics, and insulating films (Si3N4, SiO2, Al2O3). Additionally, the process is magnetron sputtering. Please feel free to consult us when needed. 【Features】 ■ Maximum substrate diameter of 200mm ■ Rotating single magnetron (maximum diameter of 300mm) ■ Confocal 4 magnetron ■ Double ring magnetron (Fraunhofer FEP) *For more details, please refer to the PDF document or feel free to contact us.

Company：ハイテック・システムズ
Price：Other

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Ion Beam Sputtering Device 'scia Coat 200/500'

Introducing the ion beam sputtering device equipped with a maximum of 5 targets (220mm diameter) or 4 targets (300mm diameter)!

The "scia Coat 200/500" is a product compatible with a maximum of 200mm wafer substrates or 300mm x 500mm substrates. The processes include Ion Beam Sputtering (IBS), Ion Beam Etching (IBE), and Dual Ion Beam Sputtering (DIBS). Please feel free to consult us when needed. 【Features】 ■ Compatible with a maximum of 200mm wafer substrates or 300mm x 500mm substrates ■ Can accommodate up to 5 (220mm diameter) or 4 (300mm diameter) targets ■ RF source (120mm to 350mm) ■ Linear Microwave ECR source (2 x 380mm long) *For more details, please refer to the PDF materials or feel free to contact us.