Last Updated： Aggregation Period:Dec 17, 2025～Jan 13, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Dec 17, 2025～Jan 13, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Dec 17, 2025～Jan 13, 2026
This ranking is based on the number of page views on our site.
16～19 item / All 19 items
You can create an optimal system configuration with a semi-custom setup.
In addition to the general-purpose mask aligner ES20 series, we offer a variety of products including a wafer double-sided exposure type and a back-side observation mask aligner. We also accept custom equipment development and manufacturing tailored to customer specifications for photolithography-related devices and MEMS research and development support equipment.
Compatible with substrates up to 8 inches and supports semi-auto alignment exposure equipment.
The Zeiss Microtech MA/BA GEN4 is a semi-auto alignment exposure machine capable of handling substrates up to 8 inches square. It is equipped with optimal features for R&D and small-scale production applications in MEMS, optical components manufacturing, and compound semiconductors. The optimized alignment mark observation optical system and image processing capabilities enable precise alignment with minimal variation.
![[Research Material] Global Market for Lithography Equipment](https://image.mono.ipros.com/public/product/image/b79/2000829281/IPROS14807587796084264134.jpeg?w=280&h=280)
World Market for Lithography Equipment: Mask Aligners, Laser Direct Imaging, Projection, Laser Ablation, ...
This research report (Global Lithography Equipment Market) investigates and analyzes the current status and outlook for the global lithography equipment market over the next five years. It includes information on the global lithography equipment market overview, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the lithography equipment market include mask aligners, laser direct imaging, projection, and laser ablation, while the segments by application focus on MEMS devices, advanced packaging, and LED devices. The regional segments are categorized into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa to calculate the market size of lithography equipment. The report also includes the market share of major companies in lithography equipment, product and business overviews, and sales performance.
Complete with all the necessary functions for photolithography at a low cost! Mask aligner.
The experimental and research mask aligner "ES410" is a low-cost mask aligner that possesses sufficient functionality for photolithography. It features a wide range of customization unique to the ES series, allowing you to select various units and options to set up a device that fits your specific needs. Additionally, most units can be added or changed later, accommodating future upgrades. As a fully manual machine, it can be used for various experiments, research, and learning about photolithography. 【Features】 ■ Wide range of customization unique to the ES series ■ Options to select various units and options ■ Can be set up to fit specific purposes ■ Most units can be added or changed later ■ Accommodates future upgrades, among others *For more details, please refer to the catalog or feel free to contact us.
