We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Alaina.
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Alaina Product List and Ranking from 13 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Alaina Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. ハイデルベルグ・インストルメンツ Kanagawa//Optical Instruments
  2. 兼松ＰＷＳ Kanagawa//Industrial Machinery
  3. ジェーイーエル Hiroshima//Industrial Machinery
  4. 4 三明 Shizuoka//Industrial Electrical Equipment
  5. 5 エイ・エス・エイ・ピイ Saitama//Electronic Components and Semiconductors
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Alaina Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Maskless Aligner "MLA150" ハイデルベルグ・インストルメンツ
  2. SUSS MicroTec Manual Mask Aligner MJB4 兼松ＰＷＳ
  3. 三明MEMS【露光装置/マスクアライナー/ローコスト（低価格）】 三明
  4. 4 UV-LED light source! Automatic exposure device for semiconductor manufacturing | Mask aligner エイ・エス・エイ・ピイ
  5. 4 SUSS MicroTec Manual Mask Aligner MA/BAGen4 兼松ＰＷＳ

Alaina Product List

1～15 item / All 38 items

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No rear alignment! Single-sided automatic mask aligner AMA6000

No rear alignment! Single-sided automatic mask aligner AMA6000

By eliminating back alignment, we achieved a low price and compact design, making it an ideal device for small-batch production of various types.

The "AMA6000" is an automatic batch equal exposure mask alignment device. The ASAP mask aligner manages the gap between the mask and the wafer in a completely non-contact manner. While it can operate in non-contact mode, it also supports soft and hard contact. It achieves low cost, compact size, and easy operation. 【Features】 ■ Parallel exposure in complete non-contact ■ Space-saving & easy maintenance ■ Auto alignment ■ Achieves low cost and compact design, suitable for small-batch production of various types *For more details, please refer to the PDF document or feel free to contact us.

  • others

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三明MEMS【露光装置/マスクアライナー/ローコスト（低価格）】

三明MEMS【露光装置/マスクアライナー/ローコスト（低価格）】

研究開発から、少LOT多品種、量産まで対応する「手動・半自動・全自動」のローコストな露光装置/マスクアライナーをご提案！

　株式会社三明では、コンパクトな微細露光のスタンダード機「LAシリーズ片面マスクアライナー」や、 両面プロセスのローコストアシストモデル「BAシリーズ正面マスクアライナー」、両面・多面プロセスの スタンダード量産機である「BSシリーズ両面同時露光マスクアライナー」といった手動型の露光機をはじめ、 少ロット多品種から量産まで対応した半自動の「セミオートマスクアライナー」や全自動の「フルオートマスクアライナー」など、 優れたローコストな露光装置を多数取り揃えております。 ＊詳しくはお問い合わせ、もしくはカタログをご覧ください。

  • Wafer processing/polishing equipment

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Component-type mask aligner ES20

Component-type mask aligner ES20

Low-cost single-sided aligner of the ES series

We build up the optimal mask aligner tailored to your specifications and budget. By selecting only the necessary units and options from various choices, we can create an easy-to-use device that minimizes unnecessary costs. We will listen to your requests and propose the best specifications. Additionally, most units can be added or replaced later, allowing for future upgrades and reductions in initial installation costs. You can choose from two types of UV light source devices (various exposure sizes) that accommodate samples from φ1 to 4 inches (including custom shapes like square samples) and masks from 2 to 5 inches. You can also select from various observation microscopes, including CCD cameras, stereo, and eyepiece types. It is compact and low-cost. For more details, please contact us or refer to the catalog.

  • Other inspection equipment and devices

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Experimental/Research Mask Aligner ES410

Experimental/Research Mask Aligner ES410

A mask aligner with sufficient functionality for photolithography at a low cost.

The ES410 mask aligner for experiments and research is a low-cost device that possesses sufficient functions necessary for photolithography. It is a fully manual machine suitable for various experiments, research, and learning about photolithography. With the wide customization options unique to the ES series, it can be set up to better fit specific purposes by selecting various units and options. Most units can be added or changed later, allowing for future upgrades. For more details, please contact us or refer to the catalog.

  • Other inspection equipment and devices

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High-Performance Mask Aligner LA Series

High-Performance Mask Aligner LA Series

Compact fine exposure standard machine. 4/6/8 inch standard mask aligner.

The high-performance mask aligner LA series is a standard device for compact fine exposure with 4/6/8 inch standard mask aligners. It is an exposure device capable of high-resolution pattern exposure in research fields requiring photolithography, such as semiconductor device fabrication. It is equipped with a specially designed dual-objective two-field CCD microscope, allowing alignment of small samples with a minimum objective lens spacing of 18mm. It features a wipe device for simultaneous two-field monitoring display, and the Z-axis is driven by air pressure with a gap fine adjustment lever. It supports hard contact, soft contact, and proximity exposure. The parallel mechanism employs reliable spherical bearings for compactness and high versatility. For more details, please contact us or refer to the catalog.

  • Other inspection equipment and devices

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Dual-Sided Simultaneous Exposure Mask Aligner BS320

Dual-Sided Simultaneous Exposure Mask Aligner BS320

Simultaneous exposure of both sides of the wafer. Supports medium lot production with semi-automatic operation!

The BS320 dual-sided simultaneous exposure mask aligner has a proven track record in research and development as well as small to medium lot production. It adopts a method where the primary exposure is done simultaneously on both sides, and subsequent exposures are done one side at a time, making it a simple and versatile model. Customization to meet various needs is also available. Since the subsequent exposures are done on one side, a separate "sample stage" is required. The BS320u, which allows for simultaneous dual-sided exposure even after the primary exposure, is also part of the lineup. It supports semi-automatic operation for medium lot production. For more details, please contact us or refer to the catalog.

  • Other inspection equipment and devices

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Dual-Sided Simultaneous Exposure Mask Aligner 'BS425' 'BS620'

Dual-Sided Simultaneous Exposure Mask Aligner 'BS425' 'BS620'

Simultaneous exposure of both sides of the wafer! Supports medium lot production with semi-automatic operation.

The dual-sided simultaneous exposure mask aligners 'BS425' and 'BS620' have a proven track record in both research and development and small to medium lot production. They adopt a method where the primary exposure is simultaneous on both sides, and subsequent exposures are done one side at a time, making them simple and versatile, with customization available to meet specific needs. Since the secondary exposure and beyond are done on one side, a separate "sample stage" is required. Please feel free to contact us. 【Features】 ■ Supports maximum φ4 inch wafers 'BS425' ■ Supports maximum φ6 inch wafers 'BS620' ■ Compact design ■ Semi-automatic operation possible during primary exposure with a footswitch ■ Easy to accommodate non-standard shape samples due to the hand placement style ■ Equipped with wafer positioning guide (optional) and more *For more details, please refer to the catalog or feel free to contact us.

  • Other semiconductor manufacturing equipment

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Double-sided mask aligner

Double-sided mask aligner

Both-side alignment and the ability for proximity and soft contact exposure are possible.

It is a mask aligner that aligns a glass mask and a workpiece in the photolithography process for wafers and glass substrates, transferring a fine mask pattern onto the photoresist coated on the plate.

  • Stepper

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Optical Aligners SAL4484 Series

Optical Aligners SAL4484 Series

The control method is RS232C and parallel photo I/O.

The SAL4484 series optical aligner, compatible with 100mm to 200mm, is designed for positioning wafers in semiconductor manufacturing equipment and inspection devices that require precise alignment during transport. It centers silicon wafers and positions the orientation flat and notch quickly and accurately. The control method uses RS232C and parallel photo I/O. For more details, please contact us or refer to the catalog.

  • Transport and handling robots
  • Other industrial robots

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50-100mm compatible aligner SAL2241 series

50-100mm compatible aligner SAL2241 series

We have achieved a reduced footprint with small-diameter wafer compatibility.

The SAL2241 series aligner, compatible with 50mm to 100mm wafers, is designed for transporting wafers that require positioning within semiconductor manufacturing equipment and inspection devices. It achieves a compact footprint while accommodating small-diameter wafers. It centers small-diameter wafers and positions orifices and notches with high speed and precision. A 0.1μm filter is equipped on the spindle side. The control method is via RS232C and parallel photo I/O. For more details, please contact us or refer to the catalog.

  • Transport and handling robots
  • Other industrial robots

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Optical Aligners SAL3261GR Series

Optical Aligners SAL3261GR Series

Alignment of 2-inch, 3-inch, and 100-150mm wafers is possible.

The optical aligner SAL3261GR series is designed to support the positioning of wafers in semiconductor manufacturing equipment and inspection devices. It is capable of aligning 2-inch, 3-inch, and 100-150mm wafers. Equipped with sensors that detect the wafer edge, it can align silicon, transparent, translucent glass, gallium arsenide, sapphire wafers, and more. For more details, please contact us or refer to the catalog.

  • Transport and handling robots
  • Other industrial robots

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342mm Susceptor Compatible Vacuum Aligner SVAL30D1 Series

342mm Susceptor Compatible Vacuum Aligner SVAL30D1 Series

It is possible to position the susceptor at high speed and high precision using a gripping method in a vacuum environment.

The 342mm Susceptor-Compatible Vacuum Aligner SVAL30D1 series enables high-speed and high-precision positioning of susceptors (such as compound semiconductors and silicon wafers) in a vacuum environment using a gripping method. By placing the positioning sensor in the vacuum environment, installation can be completed with just the main unit, increasing the design flexibility of the equipment. For more details, please contact us or refer to the catalog.

  • Transport and handling robots
  • Other industrial robots

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Atmospheric Environment Aligner "EG-303 Series"

Atmospheric Environment Aligner "EG-303 Series"

Edge grip type aligner that does not contact the back surface of the wafer for 300mm wafers.

■High-precision centering with edge grip method using three movable claws ■Minimization of robot waiting time during alignment with optional buffer port *For more details, please refer to the PDF document or feel free to contact us.

  • Transport and handling robots

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Maskless Aligner "MLA150"

Maskless Aligner "MLA150"

High-speed maskless aligner capable of fine drawing at 0.6μm.

The Maskless Aligner MLA150 is a non-contact laser exposure device that does not require a mask. With its exceptional ease of use and high speed, it is an ideal laser direct writing system for rapid prototyping, small to medium production, and research and development environments. Since the Maskless Aligner series was first introduced in 2015, innovative and cutting-edge maskless technology has been established. The MLA150 is positioned as an alternative to traditional mask aligners, with over 130 units shipped.

  • Photomask
  • Stepper

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Maskless aligner "uMLA" (Micro M L A)

Maskless aligner "uMLA" (Micro M L A)

Tabletop-sized autofocus maskless aligner

The tabletop system's maskless aligner µMLA features cutting-edge maskless technology and is an entry-level drawing device suitable for all research and development areas requiring fine structures. Typical applications include microfluidics, microoptics, sensors, MEMS, and materials science. The µMLA (Micro M L A) is a state-of-the-art maskless exposure device that is more economical and offers superior customizable flexibility compared to previous tabletop direct writing devices.

  • Photomask
  • Stepper

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