Last Updated： Aggregation Period:Aug 12, 2026～Sep 08, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Aug 12, 2026～Sep 08, 2026
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Aug 12, 2026～Sep 08, 2026
This ranking is based on the number of page views on our site.
31～47 item / All 47 items
You can create an optimal system configuration with a semi-custom setup.
In addition to the general-purpose mask aligner ES20 series, we offer a variety of products including a wafer double-sided exposure type and a back-side observation mask aligner. We also accept custom equipment development and manufacturing tailored to customer specifications for photolithography-related devices and MEMS research and development support equipment.
Supports transportation requiring wafer positioning in semiconductor manufacturing equipment, such as inspection devices.
The optical aligner SAL38C2/SAL3361 series is designed to support the positioning of wafers in semiconductor manufacturing equipment and inspection devices that require precise transport. It centers silicon wafers and positions the orientation flat and notch quickly and accurately. It is equipped with a 0.1μm filter on the spindle side, and the control method is RS232C and parallel photo I/O. It achieves approximately 50% reduction in footprint compared to the conventional models SAL46C6 and SAL4484. For more details, please contact us or refer to the catalog.
High-speed, high-precision positioning of silicon wafer centering and Orifla notch.
The SAL46C6 series optical aligner, compatible with 150mm to 300mm, is designed for positioning wafers in semiconductor manufacturing equipment and inspection devices. It achieves high-speed and high-precision centering of silicon wafers and positioning of the orientation flats and notches. The control method uses RS232C and parallel photo I/O. For more details, please contact us or refer to the catalog.
Support for transport requiring positioning of wafers (silicon, GaAs, glass).
The optical aligner SAL4381 series is designed for the positioning of wafers (silicon, GaAs, glass) in semiconductor manufacturing equipment and inspection devices that require precise alignment. It achieves high-speed and high-precision centering and alignment of silicon wafers. A 0.1μm filter is equipped on the spindle side. The control method is via RS232C and parallel photo I/O. Options are available for compatibility with GaAs wafers and glass as well. For more details, please contact us or refer to the catalog.
It is possible to minimize contact with the wafer by adopting an edge grip method.
The 300mm compatible edge grip aligner SAL20C1 series is designed for transport that requires positioning of wafers in semiconductor manufacturing equipment and inspection devices. By adopting the edge grip method, it minimizes contact with the wafer. After notch searching, a repositioning operation is included to move the notch to the specified position. For more details, please contact us or refer to the catalog.
Alignment possible with minimized wafer damage using the Bernoulli method.
The SAL30C1 series optical aligner compatible with 300mm is designed for transporting wafers that require positioning within semiconductor manufacturing equipment and inspection devices. It achieves high-speed and high-precision centering and notching of silicon wafers, enabling alignment of thin wafers. It supports thin, warped, and film-coated wafers, but please inquire about work detection capabilities and positioning accuracy. Alignment is possible while minimizing wafer damage through the Bernoulli method. The control methods are RS232C and parallel photo I/O. For more details, please contact us or refer to the catalog.
A new type of aligner that is not affected by wafer material.
A new type of aligner compatible with various wafer sizes from 100 to 200 mm. It can perform alignment without being affected by wafer materials such as silicon wafers, silicon wafer BG tape (milky white), transparent, and translucent wafers. Utilizing a uniquely developed image sensor, it incorporates a motor driver and controller within the main unit. It is also possible to change the spindle diameter, shape, and material according to wafer size and material. Bernoulli spindles can also be equipped. Control method: RS232C and parallel photo I/O. It is possible to accommodate notches and orifices that are not specified in SEMI standards. Models with a Z-axis capable of wafer re-gripping operations can also be produced.
Wafer aligner
Supports transportation requiring wafer positioning in semiconductor manufacturing equipment and inspection devices. Achieves a compact footprint for small-diameter wafers. Centers small-diameter wafers and positions the orientation flat and notch quickly and accurately.
[For 50-300mm wafers] A suction holding type aligner that achieves the industry's shortest alignment time.
■ Multiple sizes of wafer alignment are possible with the upper command. ■ The orifice and notch can be stopped at specified positions (using wafer ID reading). ■ Compatible with quartz wafers as well. * For more details, please refer to the PDF document or feel free to contact us.
Compatible with substrates up to 8 inches and supports semi-auto alignment exposure equipment.
The Zeiss Microtech MA/BA GEN4 is a semi-auto alignment exposure machine capable of handling substrates up to 8 inches square. It is equipped with optimal features for R&D and small-scale production applications in MEMS, optical components manufacturing, and compound semiconductors. The optimized alignment mark observation optical system and image processing capabilities enable precise alignment with minimal variation.
Significantly reduce the optical axis adjustment time of the optical system! The optical axis center of the lighting components can be aligned with high precision.
We handle "Laser Aligners for Microscopes." The microscope's optical axis is visualized so that researchers can easily assemble total internal reflection (evanescent wave fluorescence) illumination on the side port of inverted microscopes and similar devices, allowing for high-precision alignment of the optical axis center of the illumination components. It can also be used for aligning general laser optical systems by utilizing the microscope objective screw mount. 【Features】 ■ Significantly reduces the time required for optical axis adjustment ■ Visualizes the microscope's optical axis so that researchers can easily assemble total internal reflection (evanescent wave fluorescence) illumination on the side port of inverted microscopes and similar devices ■ Allows for high-precision alignment of the optical axis center of the illumination components ■ Can also be used for aligning general laser optical systems by utilizing the microscope objective screw mount *For more details, please refer to the PDF document or feel free to contact us.
MEMSデバイスの研究開発から少ロット・多品種、量産まで対応可能な露光装置/マスクアライナーをラインアップ！
株式会社三明では、コンパクトな微細露光機や両面プロセスのローコストアシストモデル、 両面・多面プロセスのスタンダード量産機である手動型の露光機をはじめ、 少ロット多品種から量産まで対応した半自動・全自動タイプなど優れたローコストな露光装置を多数ラインアップしております。 【各種ラインアップの特長】 （マニュアル マスクアライナー） ■高倍率ズーム顕微鏡を備えた、手動式露光装置！ ■片面露光タイプ、両面露光タイプ、両面同時露光タイプと多彩なシリーズをラインナップ！ （セミオート マスクアライナー) ■自動ギャップ調整から手動アライメント、自動コンタクト露光、自動搬出の流れで量産が可能！ （フルオート マスクアライナー) ■C to C 自動搬送 ■丸形、角形試料など、各種デバイスへ露光可能！ ※詳しくはお問い合わせ、もしくはカタログをご覧ください。
Complete with all the necessary functions for photolithography at a low cost! Mask aligner.
The experimental and research mask aligner "ES410" is a low-cost mask aligner that possesses sufficient functionality for photolithography. It features a wide range of customization unique to the ES series, allowing you to select various units and options to set up a device that fits your specific needs. Additionally, most units can be added or changed later, accommodating future upgrades. As a fully manual machine, it can be used for various experiments, research, and learning about photolithography. 【Features】 ■ Wide range of customization unique to the ES series ■ Options to select various units and options ■ Can be set up to fit specific purposes ■ Most units can be added or changed later ■ Accommodates future upgrades, among others *For more details, please refer to the catalog or feel free to contact us.
