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Thin film coating Product List and Ranking from 34 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

Thin film coating Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
  2. 東邦化研 Saitama//Electronic Components and Semiconductors
  3. ナノコート・ティーエス 石川事業所 Ishikawa//Manufacturing and processing contract
  4. 4 トーカロ Hyogo//Manufacturing and processing contract
  5. 4 吉田ＳＫＴ Aichi//Manufacturing and processing contract
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Thin film coating Product ranking

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. Durable against adhesion, wear-resistant, metal-free 'WIN KOTE (DLC)' トーカロ
  2. Celtes X coating for semiconductor mold dies ナノコート・ティーエス 石川事業所
  3. Introduction to the CBC Group CBCオプテックス
  4. Sputtering Equipment Multifunctional Sputter Device MiniLab-S060A テルモセラ・ジャパン 本社
  5. 4 Evaporation materials / target materials ティーディーワイ

Thin film coating Product List

46～60 item / All 70 items

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Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

Contract processing of high-performance thin films using R.F. ion plating and vacuum deposition.

From prototype thin film formation to mass production 【Features】 ○ Dense and with minimal changes over time ○ Strong adhesion to the substrate ○ Processing at low temperatures is possible ○ Reactive ion plating is achievable ○ High versatility of film-forming materials ・For more details, please contact us or download the catalog.

  • Surface treatment contract service

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Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Toho Kaken Co., Ltd. "Coating Contract Processing Achievements"

Over 30 years dedicated to contract thin film processing! Processing achievements cultivated through rich experience and reliable technology.

We would like to introduce the processing achievements of Toho Kaken Co., Ltd.'s surface treatment thin film coating contract processing services. We have a proven track record in various types of films, including single metal films, oxide films, carbide films, nitride films, alloy films, optical films, and multilayer films (laminated films). 【Applicable Fields】 ■ Electrical and electronic components: electrode films, insulating films, surface protection films, transparent conductive films, etc. ■ Vacuum equipment parts: contamination prevention, insulating films, bonding metals, etc. ■ Aerospace-related: weight reduction, corrosion resistance, solid lubrication, etc. ■ Mechanical parts and molds: wear resistance, release properties, corrosion resistance, surface hardening, etc. For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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Thin Film Contract Processing

Thin Film Contract Processing

From prototype development to small-lot production! Surface treatment that transforms parts and materials into multifunctional products.

Toho Kaken Co., Ltd. offers thin film coating services through contract processing, including electron gun vacuum deposition and radio frequency (RF) excited ion plating. In electron gun vacuum deposition, the material to be coated is evaporated using an electron beam gun (EB gun) in a vacuum and then coated onto the target object. Additionally, we also perform RF excited ion plating, which is an advanced version of electron gun vacuum deposition. This method retains the advantages of various evaporation materials while improving adhesion and providing a diversity of conditions. **Features of RF Ion Plating:** - Dense and stable over time - Strong adhesion to substrates - Capable of reactive ion plating - High versatility of coating materials - Diversity of coating conditions For more details, please refer to our catalog or feel free to contact us.

  • Surface treatment contract service

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A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

A free guidebook titled "Thin Film Q&A" with explanations of thin film processing technology is currently available!

We will give you a free copy of "Thin Film Q&A," which summarizes the differences and characteristics of various coating methods, coating examples, and frequently asked questions!

We are currently offering a free document that explains thin film processing technology, which imparts new functions to materials, in an easy-to-understand Q&A format! - What is vacuum deposition? - What is ion plating? - What kind of films can be created? - What types of coatings can be done? - Is it okay to only do prototypes? Can mass production be done? Toho Chemical Industry Co., Ltd. provides contract processing services for thin film coatings using ion plating (PVD), vacuum deposition, plasma CVD, sputtering, and other suitable surface treatment methods. Since the establishment of our ion plating division, we have accumulated approximately 40 years of achievements across a wide range of fields. We have compiled a list of frequently asked questions. We have summarized the differences and characteristics of each coating method, as well as specific examples of coatings, using illustrations and photos to make it as easy to understand as possible, so please feel free to download it. Based on our flexible response and over 35 years of experience, we will meet your needs! If you are considering functional thin films, please do not hesitate to contact us! If you have any questions, please feel free to reach out to us first!☆

  • Surface treatment contract service
  • Sputtering Equipment
  • Ceramics

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□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□

□■□【MiniLab-026】Flexible Thin Film Experimental Device□■□

Compact and space-saving! Ideal for research and development. Flexible configuration for purposes such as deposition, sputtering, and annealing.

This is a flexible R&D thin film experimental device that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and it can also be equipped with a substrate heating stage for annealing and plasma etching. A glove box storage type is also available (*specifications to be discussed). We offer a wide range of optional components that can be flexibly customized. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holder, substrate rotation/lifting, substrate heating, and many other options available. *Please first contact us with your required specifications, and we will configure the system to meet your needs.

  • Evaporation Equipment
  • Sputtering Equipment
  • Annealing furnace

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◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment

◆nanoPVD-T15A◆ High-performance Organic and Metal Film Deposition Equipment

We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.

High-performance organic source LTE (up to 4 sources) with excellent temperature responsiveness/stability for organic materials such as OLED, OPV, and OTFT, and a metal deposition source TE (up to 2 sources) that allows for easy exchange and maintenance. It can operate in manual mode, as well as in automatic mode for continuous multilayer film deposition and simultaneous film formation. Despite its compact size, it achieves performance comparable to that of large standalone machines without sacrificing basic performance, film quality, uniformity, or operability. Additionally, it features fully automatic control via a simple touch panel with PLC. The user-friendly HMI allows anyone to operate it intuitively without requiring complicated operating procedures. It comes with remote software "IntelliLink," which connects to a Windows PC via USB cable, enabling monitoring of the device's operating status, log saving, online/offline recipe creation and storage, and fault analysis. This compact vacuum deposition system is designed to maximize the effective use of limited development and lab space while also excelling in maintenance.

  • Evaporation Equipment

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Sputtering and deposition source composite thin film deposition device [nanoPVD-ST15A]

Sputtering and deposition source composite thin film deposition device [nanoPVD-ST15A]

Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device: Metal deposition, organic deposition, and sputter cathode installed in a compact frame.

Three types of film formation components are installed in the chamber: resistance heating evaporation source (metal evaporation), organic evaporation source (organic materials), and magnetron sputtering (metal and insulating materials), allowing for various thin film experimental setups to be accommodated within a single chamber. ◉ Three combinations are available: 1. Sputter cathode + resistance heating evaporation source x2 2. Sputter cathode + organic evaporation source x2 3. Sputter cathode + resistance heating source x1 + organic evaporation source x1 (*DC sputtering only) - Evaporation range: Φ4 inch / Φ100 mm - Vacuum exhaust system: Turbo molecular pump + auxiliary pump (rotary or dry scroll pump) - Substrate rotation and vertical lifting stage - Max 500℃ substrate heating heater - Quartz oscillator film thickness sensor - 7” touch panel HMI operation (includes 'IntelliLink' Windows PC remote monitoring software)

  • Sputtering Equipment
  • Evaporation Equipment
  • Annealing furnace

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MiniLab-026/090 Glove Box Thin Film Experiment Device

MiniLab-026/090 Glove Box Thin Film Experiment Device

Compact and space-saving! Ideal for organic thin film development, all processes such as deposition, sputtering, and annealing can be seamlessly performed within the glove box.

In the film formation process of 2D materials such as OLED (Organic EL), OPV (Organic Photovoltaic), OTFT (Organic Thin Film Transistor), graphene, and TMD (Transition Metal Dichalcogenides), it is necessary to handle samples in an inert gas atmosphere isolated from oxygen and moisture. The MiniLab-026/090-GB achieves a "oxygen and moisture-free" experimental environment for organic film applications by housing the PVD chamber within the GB, creating a compact and space-saving environment. 【Features】 ◉ A series of processes such as PVD film formation, spin coating, and hot plate baking can be performed seamlessly within the GB without exposing them to the outside air. ◉ Space-saving: The chamber does not protrude from the back, so it does not take up space. 【MiniLab Models】 ◉ MiniLab-026 (26ℓ volume): Metal/insulator/organic material deposition, sputtering, plasma etching, annealing ◉ MiniLab-090 (90ℓ volume): Metal/insulator/organic material deposition, EB deposition, sputtering, plasma etching, annealing * Please first contact us with your required specifications, and we will configure the system according to your needs.

  • Evaporation Equipment

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□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.

The ML-080, composed of a D-type box chamber with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, features a higher chamber compared to the 060 model, resulting in a longer TS distance adjustment range and improved film uniformity during deposition on large-diameter substrates. It is an optimal model for vacuum deposition and is a higher-end version of the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/Pulse DC compatible magnetron sputtering, RIE plasma etching, and annealing. - Maximum substrate size: Φ10 inch - Resistance heating deposition sources: up to 4 sources - Organic deposition sources: up to 4 sources - Magnetron sputtering cathodes: 4 sources - Electron beam deposition - Substrate heating stage (standard 500℃, max 1000℃) - *Plasma etching / <30W soft etching *Plasma etching can be installed in both the main chamber and the load lock chamber.

  • Evaporation Equipment

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□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□

□■□【MiniLab-090】Flexible Thin Film Experimental Device□■□

Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.

MiniLab-080 is a glove box model designed to accommodate an 80ℓ large volume chamber within a glove box bench. It features a slide-open and close chamber that maximizes the use of the workbench, and a rear-opening door designed with maintenance in mind. Samples processed can be consistently handled in a controlled environment inside the glove box without exposure to the atmosphere or moisture. For specifications of the GB model, please refer to the gas purification unit. - Maximum substrate size: Φ10 inch - Resistance heating evaporation source x up to 4 sources - Organic evaporation source x up to 4 sources - Magnetron sputtering cathode x 4 sources - Electron beam evaporation - Substrate heating stage (standard 500℃, Max 1000℃) - Plasma etching / <30W soft etching

  • Evaporation Equipment
  • Sputtering Equipment
  • Etching Equipment

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KBM processing thin film coating

KBM processing thin film coating

Matte black fluoropolymer coating primarily composed of PTFE.

KBM processing thin film coating is a matte black fluoropolymer coating primarily composed of PTFE. It not only has water-repellent properties but also achieves a high contact angle against solvents such as thinners. It is suitable for applications where you want to improve the lubrication of parts, enhance the water-repellent properties of components, prevent defects due to reflection, apply a coating that does not peel off when bending parts, and increase the chemical resistance of components. For more details, please contact us or download the catalog.

  • Processing Contract
  • Surface treatment contract service
  • Other semiconductor manufacturing equipment

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Metal mirror

Metal mirror

The specification angle ranges from 0 degrees to 90 degrees! It is relatively low-cost, highly versatile, and compatible with various wavelength ranges.

"Metal mirrors" are products that have aluminum or gold applied to glass. They are relatively low-cost, highly versatile, and can accommodate various wavelength ranges. The main wavelength ranges are from the ultraviolet range (200nm) to the visible range to the infrared range, with specification angles from 0 degrees to 90 degrees. Our company can provide highly durable products through coating (vacuum deposition). [Main glass materials] ■ General optical glass ■ Synthetic quartz ■ Optical crystals (Si・Ge) ■ Colored glass ■ Resin *For more details, please refer to the PDF document or feel free to contact us.

  • mirror

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Technical Data: Possibilities of Thin Film Production Using Excimer Lamps

Technical Data: Possibilities of Thin Film Production Using Excimer Lamps

Utilizing high-output xenon excimer lamps! Introduction to the film deposition rate of the light CVD method.

By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the film formation of thin films used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new film formation methods will continue in the future. In this document, we present the results of our examination of the potential of a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film formation speed of the photochemical CVD method using a "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

  • Ultraviolet irradiation equipment

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Super Hard Thin Film Coating "CERTESS NITRO"

Super Hard Thin Film Coating "CERTESS NITRO"

Ultra-hard thin film coating that improves wear resistance! No polishing process is required after film formation.

"CERTESS NITRO" is a super-hard thin film coating for mechanical parts formed by physical vapor deposition. Thanks to its unique technology, the coating surface is extremely smooth, eliminating the need for any polishing process after film formation. Additionally, the coefficient of friction is significantly reduced, and resistance to corrosive wear, abrasive wear, and adhesive wear is greatly improved. It is utilized in a wide range of fields, including the aerospace industry, automotive parts, and medical device components. 【Features】 ■ Formed by PVD (Physical Vapor Deposition) ■ No polishing process required after film formation ■ Significant reduction in coefficient of friction ■ Improved resistance to corrosive wear, abrasive wear, and adhesive wear *For more details, please refer to the catalog. Feel free to contact us with any inquiries.

  • Processing Contract

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AR mirror, metal film, optical thin film, decoration, embellishment, water-repellent, dirt-resistant, anti-fog.

AR mirror, metal film, optical thin film, decoration, embellishment, water-repellent, dirt-resistant, anti-fog.

We will respond to your requests for high precision, short delivery times, and small quantities of various products!

Wako Kogyo Co., Ltd. is a company primarily engaged in thin film processing of glass products. We contribute to the development of cutting-edge information devices with our thin film coating technology. Additionally, we respond meticulously to various customer requests, such as high precision, short delivery times, and small quantities of diverse products. We meet your trust with advanced equipment such as vacuum deposition devices, measuring instruments, and environmental testing machines. 【Main Business Activities】 ■ Thin film processing of glass products *For more details, please refer to our catalog or feel free to contact us.*

  • Processing Contract
  • Contract manufacturing
  • filter

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