ハイデルベルグ・インストルメンツ List of Products and Services

- High precision and high-speed rendering - Maximum drawing area 300x300mm²

• Other semiconductor manufacturing equipment

The "MPO 100" is a 3D printer capable of handling large print volumes from ultra-fine 3D lithography to micro-printing. It is primarily intended for fields such as micro-optics, microfluidics, and biomedicine. It combines high productivity for 3D micro-printing with the high-precision processing required for 3D lithography, enabling the rapid fabrication of complex functional microstructures in a single process.

• Resin processing machine
• Other processing machines

"ULTRA" is a high-speed, high-resolution laser drawing device suitable for semiconductor mask creation. The "ULTRA" is a cost-effective mask drawing device equipped with high productivity, high precision, high uniformity, and ultra-high precision alignment accuracy.

• Electron beam lithography equipment
• Photomask
• Stepper

The "DWL 66+" is a high-resolution laser direct writing system suitable for research and development applications, small lot production, mask creation, and maskless exposure. It is equipped with the necessary functions for the fabrication and analysis of microstructures as a standard system. With high processing capability and a wide range of applications, it contributes to research and development in applications requiring microstructure fabrication, such as MEMS and micro-optics. 【Features】 ■ For maskless exposure and mask creation ■ 2.5D grayscale exposure mode (standard 128 levels, optional 255 levels or 1000 levels) ■ Versatile with rich features and expandability for multiple applications ■ Switchable up to six drawing modes (0.3um-4.0um) (pixel size) ■ High-precision alignment with backside alignment capability ■ Maximum substrate size supported is 9 inches x 9 inches ■ Compatible with various data formats *For more details, please refer to the catalog or feel free to contact us.

• Electron beam lithography equipment
• Other semiconductor manufacturing equipment
• Stepper

The "VPG+ Series" is a high-speed exposure system that can accommodate large mask manufacturing, resist master creation, and direct drawing on various flat substrates due to its fast exposure speed. It can be utilized in fields that require semiconductors, displays, sensors, MEMS, advanced packaging, LED production, life sciences, and microfabrication. 【Features】 ■ High resolution ■ High image quality ■ High throughput ■ Ideal for high-speed photomask production ■ Capable of direct drawing on any flat substrate *For more details, please refer to the catalog or feel free to contact us.

• Electron beam lithography equipment
• Other semiconductor manufacturing equipment
• Stepper

The "DWL 2000 GS" is a flexible, high-speed, high-resolution laser drawing device suitable for grayscale lithography. Grayscale lithography is a technique that reproduces slope patterns, such as microlenses and blazed diffraction gratings, on a resist, differing from traditional binary lithography. The "DWL 2000 GS" series has a maximum drawing area of 200x200 mm² or 400x400 mm², enabling high-speed, high-precision patterning on masks and wafers for applications requiring MEMS, BioMEMS, Micro-Optics, ASIC, Micro Fluidics, sensors, holograms, and other fine structures. To enhance surface roughness accuracy in grayscale lithography applications, it supports 1000 levels of grayscale. 【Features】 ■ High stability and high-speed, high-resolution exposure ■ Up to five selectable drawing modes ■ High-precision alignment camera system ■ Grayscale drawing mode *For more details, please refer to the catalog or feel free to contact us.

• Electron beam lithography equipment
• Other semiconductor manufacturing equipment
• Stepper

NanoFrazor Explore is a standalone nano-patterning system equipped with many unique features. It allows for the easy creation of high-quality nano-patterns and devices, and by incorporating a laser, it enables hybrid high-speed drawing of micro-patterns.

• Other semiconductor manufacturing equipment

NanoFrazor Scholar is an entry-level nano-patterning system equipped with many unique features. As a simple tool for easily creating high-quality nano-patterns and devices, it is particularly suitable for academic research groups.

• Other semiconductor manufacturing equipment

The tabletop system's maskless aligner µMLA features cutting-edge maskless technology and is an entry-level drawing device suitable for all research and development areas requiring fine structures. Typical applications include microfluidics, microoptics, sensors, MEMS, and materials science. The µMLA (Micro M L A) is a state-of-the-art maskless exposure device that is more economical and offers superior customizable flexibility compared to previous tabletop direct writing devices.

• Photomask
• Stepper

The Maskless Aligner MLA150 is a non-contact laser exposure device that does not require a mask. With its exceptional ease of use and high speed, it is an ideal laser direct writing system for rapid prototyping, small to medium production, and research and development environments. Since the Maskless Aligner series was first introduced in 2015, innovative and cutting-edge maskless technology has been established. The MLA150 is positioned as an alternative to traditional mask aligners, with over 130 units shipped.

• Photomask
• Stepper

The MLA300 is an industrial production version of a maskless aligner that has already become the standard in the fields of research and development applications, rapid prototyping, and low to medium volume production. The MLA300 achieves high resolution with a line and space of 2 µm while maintaining the high throughput and availability expected in production facilities. It is equipped with a wafer robot and load port, as well as software specially designed for production environments, to accommodate automation for streamlining workflows.

• Stepper
• Photomask
• Other semiconductor manufacturing equipment