ティー・ケイ・エス List of Products and Services

By using a helicon plasma source as the ion source, this groundbreaking method accelerates high-density ions obtained from it by applying a bias voltage to the target, achieving high-rate and highly directional film deposition. Independent current control for the ion source, target, and substrate allows for precise control of not only the sputtering rate but also various reactive sputtering processes such as oxide and nitride films. It enables high-rate film deposition of materials that are difficult to deposit with conventional equipment, such as ferromagnetic materials and dielectric/insulating films from metal targets. <Features> ■ High-speed, high-efficiency ion beam sputtering Optimal solution for dielectric and ferromagnetic targets ■ Helicon plasma ion source and target application Achieves both high-speed sputtering and low contamination Reduces running costs by improving target utilization efficiency Low maintenance due to gridless structure Sputtering while keeping the substrate at low temperatures through remote plasma configuration ■ Single wafer processing Improved step coverage Composite film deposition using cluster tools ■ Excellent directionality High-directionality ion beams enable uniform film thickness deposition, resulting in excellent step coverage in film formation.

• Sputtering Equipment

-Properties and Performance of Metal Belts- PureSteel metal belts are made from stainless steel, allowing for long-term use even in harsh conditions, providing durability. Depending on the usage environment and purpose, it is also possible to supply alloy materials tailored to resist chemicals, temperature, and corrosion. -Durability- PureSteel metal belts are resistant to extreme temperatures, vacuum conditions, and harmful or corrosive environments. They are also unaffected by wear and surface peeling due to elongation or warping from long-term use. -Cleanliness- PureSteel metal belts do not require lubrication. There are no fine particles or gas emissions generated from other materials (such as resin or fiber). They can be sterilized using autoclaves, various fumigation methods, or gas spraying, making them ideal for use in environments where cleanliness is of utmost importance. -Accuracy- PureSteel metal belts do not exhibit pulsation, which is common with other typical belt materials. This allows for precise transmission of the control system's operational profile. They are processed to have smooth edges and accurate dimensions due to very tight tolerances, achieving greater accuracy and reliability compared to other belt materials.

• Conveyor Components
• Pharmaceutical Packaging Machine
• Pharmaceutical related factory equipment

-TKS's Equipment Lifespan Extension Service- Many devices used in domestic semiconductor and electronic device manufacturing have been in operation for over 20 years since their introduction, and many essential devices are still in operation. However, it is not uncommon for modules and parts used in these devices to have already been discontinued. By using current products for the repair and regeneration of worn, degraded, or broken modules, we contribute to the stable operation of the equipment. Additionally, please consult us about domestic production of parts aimed at stable supply and cost reduction. -Extension of Lifespan through Servo Motor and Driver Replacement- Many servo motors are used in operating equipment, but the motor drivers and motors are updated and discontinued every few years even while the equipment is in operation. If a motor driver or motor used in long-operating equipment fails, the only options until now have been to search for used parts or repair them. In such cases, if "no used parts are available!" or "repair is not possible!", the options may be limited to using the equipment within a feasible range or ceasing operation and purchasing new equipment. Our company has sought solutions to such problems and has achieved results.

• Sputtering Equipment
• Solenoid Actuators
• Transport and handling robots

HiTUS Technology Independent current control is performed for the ion source, target, and substrate. With independent control, it becomes possible to freely control not only the sputter rate but also various reactive sputtering processes such as oxide films and nitride films. We strongly support advanced materials research and process development for applications that have been considered difficult with conventional sputtering equipment, such as ferromagnetic film deposition, co-sputtering of metal and ceramic targets, and dielectric/insulating film deposition from metal targets.

• Other metal materials
• alloy
• Surface treatment contract service

- Sublimation - This term refers to the phenomenon where a substance transitions directly from the solid phase to the gas phase without passing through the liquid phase. Conversely, it also refers to the phenomenon of transitioning from the gas phase to the solid phase, but these are generally referred to as deposition, solidification, or recrystallization. - Conditions for the Occurrence of Sublimation - Common substances exhibit three states: solid, liquid, and gas, which are determined by temperature changes. The boundary temperatures are defined by the "vapor pressure" of each substance. Since the phase change temperature is dictated by vapor pressure, by altering the environmental conditions (reducing pressure), sublimation can occur in many substances without passing through the liquid phase. - Applications of Sublimation and Sublimation Purification Devices - Many compounds have their own specific sublimation and solidification temperatures. By utilizing this temperature difference, it is possible to significantly separate mixed compounds. This phenomenon is applied in sublimation purification devices. Taking advantage of the property that allows direct phase transition from solid to gas, it is widely used for the high purification of "insoluble" substances that are difficult to dissolve in solvents.

• Organic EL

PlasmaQuest is a reputable company with a 25-year history in the development and sales of helicon-type high-density ion sources and related application products. The gridless helicon plasma source generates high-density plasma and continues to provide OEM supply to many equipment manufacturers. Utilizing this high-quality plasma source as an ion source, the groundbreaking "HiTUS" system applies bias to the target, enabling sputtering under various conditions and with different targets. It allows for sputtering of high magnetic targets and high dielectric targets, which are considered difficult with conventional magnetron sputtering devices, as well as co-sputtering using heterogeneous targets such as metals and ceramics, making it suitable for a wide range of applications. The company is equipped to flexibly respond to both research applications and production-scale equipment.

• Sputtering Equipment

Independent current control is performed for the ion source, target, and substrate. With independent control, not only the sputter rate but also various reactive sputtering processes such as oxide and nitride films can be freely controlled. This device strongly supports advanced material research and process development, enabling the deposition of difficult-to-deposit materials such as ferromagnetic films, Co-sputtering of metal and ceramic targets, and dielectric/insulating films from metal targets. Independent control of ion supply and sputter rate → Control of sputter rate, film quality, and crystal structure → Control of ionization rate of target materials High-directionality film deposition → High-directionality film deposition characteristic of ion beam sputtering Multi-target mechanism → Wide-ranging multilayer film deposition Independent control of multiple targets → Co-sputtering alloy deposition by controlling the sputter rate of each target → Multilayer deposition by switching targets Conformal film deposition through bias application control to the substrate → Conformal film deposition even under adverse conditions such as deep trenches and overhangs.

• Sputtering Equipment
• Plasma Generator
• Other surface treatment equipment

The ion beam etching equipment manufactured by AVP Technology is a production device equipped with an ICP ion source, offering high uniformity, high etching rates, and excellent operational reproducibility and stability. Compared to other companies' IBE devices, it achieves stable operation, which is essential for manufacturing facilities, through its superior control system. The latest drive mechanism minimizes latency time, thereby improving productivity.

• Sputtering Equipment

This is a high-speed ion beam sputtering (IBD) device that excels in the deposition of dielectrics such as Al2O3 and SiO2, which typically have low deposition rates in conventional magnetron sputtering, as well as ferromagnetic materials like Fe. By using a helicon plasma source as the ion source and a groundbreaking method that accelerates the high-density ions obtained from it through the application of bias voltage to the target, it achieves high-rate and highly directional film deposition. It also contributes to cost reduction in deposition processes using valuable and rare targets by efficiently utilizing the entire target surface. <Features> ■ High-speed, high-efficiency ion beam sputtering Optimal solution for dielectric and ferromagnetic targets ■ Helicon plasma ion source and target application Achieving both high-speed sputtering and low contamination Reduction of running costs through improved target utilization efficiency Maintenance reduction due to gridless structure Sputtering while keeping the substrate at low temperature through remote plasma configuration ■ Wafer processing Improved step coverage Composite film deposition using cluster tools ■ Excellent directionality Uniform film thickness can be achieved with a highly directional ion beam, resulting in excellent step coverage in film deposition.

• Sputtering Equipment

Achieving both stable film formation and cost reduction. This is a high-performance, high-quality "Magnetron Sputter Cathode" manufactured by American Angstrom Science. By adopting the patented Shaped Magnet technology, it utilizes a wide area of the target, making it less likely for changes in the sputtering state due to erosion to occur, thus achieving stable film formation and cost reduction for target replacement. 【Features】 ■ Shaped Magnet high-efficiency technology cathode: Achieves high film formation efficiency and stability ■ Reusable targets: Allows for the reuse of your existing targets, reducing costs ■ Balancing stable film formation and cost reduction: Minimal changes in sputtering state due to erosion, reducing target replacement costs ■ Compatible with existing sputtering equipment from various manufacturers: Can be adapted to other companies' equipment ■ High vacuum compatible: Usable in high vacuum environments suitable for a wide range of applications ■ Compatible with target sizes from φ1 inch to φ12 inches: Flexible selection of target sizes ■ Abundant optional features: Various options available, including shutters and tilt angles *For more details, please refer to the PDF document or feel free to contact us.

• Sputtering Equipment
• Vacuum Equipment
• Other metal materials

The "FHR.STAR-400x300SALD" is a high-speed deposition ALD (Spatial ALD) system designed for film deposition on substrates and textiles ranging from 200mm wafers to 400x300mm. It enables uniform film deposition on three-dimensional shapes up to 10mm thick for 400x300 substrates. Due to its faster deposition compared to conventional thermal ALD methods, it can be used for mass production of devices and is designed to accommodate in-situ ellipsometers and transmission spectrometers, allowing for more precise process control. With a cluster-compatible design, it can integrate transport chambers, load locks, and other process chambers as needed. We also offer equipment compatible with small-diameter wafers, so please inquire for more information. 【Features】 ■ Uniform film deposition on three-dimensional shapes up to 10mm thick (for 400x300 substrates) ■ Faster deposition compared to conventional thermal ALD methods ■ Usable for mass production of devices *You can download the English version of the catalog. *For more details, please refer to the PDF materials or feel free to contact us.

• Other semiconductor manufacturing equipment

Organic Material Deposition Source Creaphys DE Series This is a deposition source evaporator designed for R&D and small-scale production. - Stable operation is possible over a wide temperature range from 50°C to 800°C. - Usable in ultra-high vacuum conditions. - Compatible with existing equipment through available options (shutter, water cooling, various flanges, temperature control, etc.). Please contact us for more details. Also, feel free to inquire about composite deposition sources.

• Other surface treatment equipment

This system is equipped with three sputtering sources and a pre-cleaning etcher, all arranged in a confocal shape, and it is also possible to add a load lock and a transport chamber to enhance productivity. The sputtering sources are equipped with a 100mm diameter shutter, which allows for film deposition control by managing this shutter. Additionally, the distance between the source and the substrate can also be controlled. These controls are optimized for film deposition through auto-control via programming. Main applications: Manufacturing of MEMS products and high-performance optical products Dimensions (L×W×H): 2.3 m × 1.3 m × 2.1 m Weight (with load lock): 1,700 - 2,000 kg Maximum substrate size: Diameter 150 mm Maximum substrate carrier: Diameter 220 mm Compatible process gases: Argon, oxygen, and others For more details, please contact us.

• Sputtering Equipment

This is a roll-to-roll sputtering device for the manufacturing of FCCL (Flexible Copper Clad Laminate). Features: 1. High degree of freedom in equipment configuration 2. High temperature stability 3. Proper seed layer formation 4. Chrome-free adhesive layer available as an option 5. Achieves high peel strength For more details, please contact us.

• Sputtering Equipment

The "DSU Series" is a sublimation purification device for high-purity organic materials developed based on "QUANTIpure Technology," which was created from accumulated process data in organic electronics research. It achieves both high yield and ultra-high purity through a unique purification system born from the redefinition of the sublimation purification process. Once the raw materials are loaded, the entire operation is controlled automatically, and no operator intervention is required until the purification is complete. We offer models that can handle not only small-scale purification of 5g but also large-scale purification of 10kg. All background tasks, such as preparation for operation and product recovery, can be completed by a single operator. 【Features】 ■ Wide range of needs from development to mass production ■ Temperature and pressure control through auto process control ■ Purification from 5g suitable for experiments and development to 10kg/run for mass production ■ Purity of 99.99% and yield of 98% (after the second purification) ■ Space-saving vertical design for installation ■ All tasks can be completed by one operator * You can view the product documentation (in English) via "PDF Download." Please feel free to contact us with any inquiries. * Related product videos can also be viewed at the bottom of this screen.

• Other semiconductor manufacturing equipment
• Refining and Extraction Equipment
• Organic EL

HR-PVD Sputtering Module by AVP Technology - Achieves higher ionization efficiency compared to ICP sources using a remote plasma source with a helicon plasma ion source. - Excellent straightness from the inclined angle direction results in outstanding film thickness uniformity and step coverage. - Enables film formation while keeping the substrate at a low temperature through remote plasma. - Also achieves excellent results in target utilization efficiency. *For more details, please contact us.

• Sputtering Equipment
• Plasma Generator

MBraun is a specialized manufacturer of scientific instruments based in Munich, Germany. Their main products are high-quality glove boxes, but they also offer a wide range of products including vacuum sublimation purification systems and vacuum deposition sources. The MBraun brand is well-regarded in research institutions and development companies around the world as a synonym for high-quality and high-performance products. In addition to providing equipment for sublimation purification of organic materials, MBraun also offers contract purification services through the equipment they have developed. They can flexibly accommodate everything from small-scale test sublimation purification to mass production. Their advanced sublimation purification systems, developed in-house, achieve purification with ultra-high purity and ultra-high yield. By achieving a yield that sets it apart from conventional methods, they minimize the loss of raw materials and realize high purity, contributing to cost reduction. An NDA will be signed when providing services. You can use their sublimation purification for advanced materials with confidence. 【Examples of Applications】 ■Purification of organic electronics materials ■Purification of high-purity advanced semiconductor materials *For more details, please refer to the PDF document or feel free to contact us.

• Organic EL

MBraun is a specialized manufacturer of processes for organic materials based in Dresden, Germany. For depositing organic electronics materials, vacuum evaporation without compositional decomposition is preferable. Based on its expertise in organic materials, MBraun provides experimental small-scale evaporation sources, large-scale linear sources for production, and experimental evaporation equipment. 【Overview】 ■ Evaporation sources for organic materials (point and linear types) ■ Evaporation sources for metal materials ■ Manufacturing of organic material deposition systems and associated components ■ Equipment modification ■ Contract development and engineering services *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment

In 2023, CreaPhys became a business division through a merger with MBraun. MBraun is a global company that manufactures and sells research and experimental equipment worldwide. The integrated CreaPhys is a group company established by MBraun, which invested in researchers under Professor Karl Leo at Dresden University. With over 20 years of history in the field of organic electronics, we provide sublimation purification systems for organic materials, deposition sources, and evaluation equipment. 【Products and Contract Services】 ■ Vacuum deposition systems for organic materials ■ Measurement and analysis systems ■ Purification of organic materials *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment

This document explains the basics of the design and applications of metal belts manufactured by Belt Technologies. It includes reasons for considering the introduction of metal belts into your design, as well as information on metal belts, drive tapes, various applications, and design considerations. We hope this will help you understand the many advantages of metal belts and serve as a useful resource for the essential information you need. Please take a moment to read it. [Contents (excerpt)] ■ Reasons for considering the introduction of metal belts into your design ■ Metal belts, drive tapes, and various applications ■ Pulleys ■ Surface treatment ■ Design considerations *For more details, please refer to the PDF document or feel free to contact us.

• Technical and Reference Books
• Belts and pulleys

FHR Anlagenbau GmbH is an innovative company in the field of vacuum processes and thin film technology. It was established in 1991 in Dresden, Germany, by a group of engineers with excellent technical skills aimed at developing and selling new concepts and solutions for multiple applications of thin films. FHR provides thin film technology and offers customized equipment for a wide range of applications to customers worldwide. [Included in the FHR Technology Portfolio] ■ Advanced metallization technology through magnetron sputtering and CVD ■ Reactive sputtering technology for the deposition of oxides and nitrides ■ Advanced etching technology supported by high-density plasma sources ■ Flash lamp annealing (FLA) for processing and modifying semiconductors, metals, ceramics, nanostructures, and photonic materials ■ Atomic layer deposition (ALD) technology for single-layer bonding with excellent uniformity through advanced film deposition control on complex 3D shapes *For more details, please refer to the PDF document or feel free to contact us.

• others

Atomic Layer Deposition (ALD) is a special coating method within CVD. The complementary and self-limiting surface reactions in the ALD process provide uniform films with controlled thickness down to the nanometer scale and excellent step coverage on complex 3D surface geometries. For ALD processing, FHR Anlagenbau GmbH offers custom-made reactor tools designed for R&D activities and mass production on an industrial scale. [Coating Method] ■ Performed by alternating substrate exposure to at least two chemical reactants (precursors) ■ The first precursor is flashed onto the substrate ■ The precursor reacts with reactive surface sites until there are no unreacted surface sites left (saturation) ■ The gaseous reaction byproducts of the first precursor are purged with inert gas ■ The second precursor is flashed, and surface reactions occur again until saturation is reached ■ After purging the reaction, in the case of residuals from the second precursor, the cycle is resumed by flashing the first precursor *For more details, please refer to the PDF document or feel free to contact us.

• Other processing machines

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

• Sputtering Equipment

We handle the 'Star.500-EOSS(R)' from the German company FHR. The 'Star.500-EOSS(R)' is a magnetron sputtering system designed for optical filter film deposition. To minimize particles during film deposition, a sputter-up method is employed. It accommodates flat and curved substrates up to 200mm in diameter, and a substrate heating mechanism can also be integrated. 【Features and Benefits】 ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement in film quality and defect-free deposition achieved through the combination of a cylindrical sputter cathode and sputter-up ■ Long target life and minimized variations in deposition rate due to cylindrical targets ■ Fully automated process control *For more details, please download the PDF or contact us.

• Sputtering Equipment