Powder Low-Temperature (Room Temperature) ALD Film Deposition Device CMP-400
CMP-400
It is said to be difficult in ALD, but it is possible to form a powder film at low temperature (room temperature) and atmospheric pressure!
**Features** - Powder film formation using swirling flow under atmospheric pressure - Control of film thickness according to application - Film formation possible at room temperature **Application Examples** - SiO and Al2O3 film formation for all-solid-state battery powders **Consultation for Film Formation and Test Coating Available** At Creative Coatings, we accept test coatings and sample creation. We can listen to your requests and suggest suitable equipment, types of films, and film thicknesses. Please feel free to consult with us. ++++++++++++++++++++++++++++++ We provide next-generation vapor phase technology demanded by the times and the environment. We contribute to technological innovation with our dual technology of low-temperature (room temperature) ALD equipment for semiconductors and powder low-temperature (room temperature) ALD film formation equipment.
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basic information
【Chamber Size】 φ400mm 【Film Deposition Specifications】 - For film deposition on magnetic powders, all-solid-state batteries, metal fine particles, etc. Work Types: Magnetic powders, all-solid-state batteries (sulfide-based, oxide-based), metal fine particles, and others Work Size: Any shape is acceptable as long as it is ф100mm or larger 【Applicable Films】 SiO, Al2O3, etc. *Since we design and manufacture our own equipment, we can discuss chamber sizes and film deposition specifications. Please feel free to contact us.
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Applications/Examples of results
- SiO and Al2O3 film formation for all-solid-state battery powders - Battery raw material powders, magnetic powders - Powders (QD powders, phosphorescent powders, etc.)
Line up（2）
| Model number | overview |
|---|---|
| Powder Low-Temperature (Room Temperature) ALD Film Deposition Device CMP-200 | Chamber size: φ200mm, continuous film deposition for powders under atmospheric pressure, suitable for experimental/research and development purposes |
| Low-Temperature (Room Temperature) ALD Device CMVA-500P | Chamber size: □500mm, low-temperature (room temperature) ALD device in a vacuum, powder specifications for experimental/research and development purposes |
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One of the key technologies for achieving carbon neutrality is next-generation batteries, along with nanoscale functional particles with various capabilities, the proliferation of 5G and 6G communication systems and environmentally friendly vehicles, and the advancements in advanced driver-assistance systems (ADAS). There is a growing expectation for our coating technology in various fields of society, including passive components such as MLCCs, which require miniaturization and high reliability, high-quality healthcare through digital transformation (DX), and medical devices advancing with AI and digitalization.