List of Cleaning machine products
- classification：Cleaning machine
1～15 item / All 3763 items
It won't break even after 1 million repetitions! A mat switch with reliable operation, high durability, and low price. Suitable for options in machine tools as well. Please consult us about delivery t...
- Sensors
We can accommodate high resistance over 10,000 ohms, with diameters ranging from approximately 30 mm to 8 inches, and we also offer thinning and chip processing arrangements!
- Other semiconductors
- Processing Contract
- Wafer
We introduce a reliable machine that can handle not only winter conditions but also stubborn dirt encountered every day, equipped with comprehensive safety features for year-round use.
- High pressure cleaner
- High pressure cleaner
- Hot water cleaner
A parts box used for transporting automotive parts. It can be thoroughly cleaned of dirt with Cleo's cleaning machine and dried properly!
- Other cleaning machines
![[Part 2] High cleaning power even a...](https://image.mono.ipros.com/public/product/image/bdb/2000321003/IPROS43511945133007001992.jpeg?w=280&h=280){kind=small}
Recommended for water-saving and energy-saving measures! Complies with hygiene and explosion-proof standards. Materials featuring installation examples available. For the food, beverage, and medical f...
- nozzle
- Food Cleaning Equipment
- Other cleaning machines
Notice of Participation in POWTEX 2026 (Powder Industry Exhibition) | Displaying Spray Drying, Tank Cleaning, and Duct Cleaning Solutions
Tick Corporation will be exhibiting at "POWTEX 2026 (Powder Technology Exhibition)" held at Tokyo Big Sight from November 25 (Wednesday) to 27 (Friday), 2026. Main products to be showcased at POWTEX 2026: ■ DryMaster | Improving the maintainability of the spray drying process ■ Tank Cleaning Nozzle | Enhancing efficiency and automation of CIP and container cleaning ■ Duct Cleaning Nozzle | Streamlining the cleaning of powder adhesion and deposits ■ TankClean Software | Simulating the arrangement and selection of tank cleaning nozzles Recommended for those who have the following challenges: - Want to reduce maintenance time for the spray drying process - Want to increase the operational efficiency of spray dryers - Want to automate tank cleaning and CIP processes - Want to reduce the water and chemicals used for tank cleaning - Want to review the selection and arrangement of tank cleaning nozzles - Want to efficiently clean powder adhesion inside ducts and pipes Exhibition Name: POWTEX 2026 (Powder Technology Exhibition) Venue: Tokyo Big Sight Dates: November 25 (Wednesday) to 27 (Friday), 2026 Time: 9:30 AM to 5:00 PM Booth Number: 1-D19
Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
Announcement of the release of the latest leaflet for the SONOSYS Corporation's megasonic cleaning device.
We have updated the product leaflet for the SONOSYS megasonic cleaning device from Germany to the latest version. SONOSYS's megasonic cleaning technology is a non-contact precision cleaning technique that efficiently removes fine particles by transmitting high-frequency ultrasonic energy through liquids such as pure water (DI Water) to the surface of the target object. It is particularly suitable for the precision cleaning of products with fine structures, such as semiconductor wafers, photomasks, MEMS, various substrates, and optical components, and is utilized in various fields that require high cleanliness, starting with semiconductor manufacturing processes. SONOSYS offers a range of frequencies depending on the application and the particles to be removed, as well as a megasonic nozzle system that accommodates various cleaning conditions, including Single Nozzle, Dual Nozzle, and Triple Nozzle. Customers who have challenges such as "wanting to remove fine particles from wafers," "wanting to clean photomasks and MEMS while minimizing damage," or "wanting to review existing cleaning processes" are encouraged to take a look at the latest leaflet.
For precise cleaning of prisms. Sonosys ultrasonic cleaning device.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
Announcement of the release of the latest leaflet for the SONOSYS Corporation's megasonic cleaning device.
We have updated the product leaflet for the SONOSYS megasonic cleaning device from Germany to the latest version. SONOSYS's megasonic cleaning technology is a non-contact precision cleaning technique that efficiently removes fine particles by transmitting high-frequency ultrasonic energy through liquids such as pure water (DI Water) to the surface of the target object. It is particularly suitable for the precision cleaning of products with fine structures, such as semiconductor wafers, photomasks, MEMS, various substrates, and optical components, and is utilized in various fields that require high cleanliness, starting with semiconductor manufacturing processes. SONOSYS offers a range of frequencies depending on the application and the particles to be removed, as well as a megasonic nozzle system that accommodates various cleaning conditions, including Single Nozzle, Dual Nozzle, and Triple Nozzle. Customers who have challenges such as "wanting to remove fine particles from wafers," "wanting to clean photomasks and MEMS while minimizing damage," or "wanting to review existing cleaning processes" are encouraged to take a look at the latest leaflet.
Powerful cleaning with a special shape nozzle from Lechler! This shape is unique to Lechler!
- High pressure cleaner
- nozzle
- nozzle
Notice of Participation in POWTEX 2026 (Powder Industry Exhibition) | Displaying Spray Drying, Tank Cleaning, and Duct Cleaning Solutions
Tick Corporation will be exhibiting at "POWTEX 2026 (Powder Technology Exhibition)" held at Tokyo Big Sight from November 25 (Wednesday) to 27 (Friday), 2026. Main products to be showcased at POWTEX 2026: ■ DryMaster | Improving the maintainability of the spray drying process ■ Tank Cleaning Nozzle | Enhancing efficiency and automation of CIP and container cleaning ■ Duct Cleaning Nozzle | Streamlining the cleaning of powder adhesion and deposits ■ TankClean Software | Simulating the arrangement and selection of tank cleaning nozzles Recommended for those who have the following challenges: - Want to reduce maintenance time for the spray drying process - Want to increase the operational efficiency of spray dryers - Want to automate tank cleaning and CIP processes - Want to reduce the water and chemicals used for tank cleaning - Want to review the selection and arrangement of tank cleaning nozzles - Want to efficiently clean powder adhesion inside ducts and pipes Exhibition Name: POWTEX 2026 (Powder Technology Exhibition) Venue: Tokyo Big Sight Dates: November 25 (Wednesday) to 27 (Friday), 2026 Time: 9:30 AM to 5:00 PM Booth Number: 1-D19
Lechler's tank cleaning spray nozzle PopUp Whirly now available in ATEX version (explosion-proof type).
- Other cleaning machines
- Food Cleaning Equipment
- nozzle
Notice of Participation in POWTEX 2026 (Powder Industry Exhibition) | Displaying Spray Drying, Tank Cleaning, and Duct Cleaning Solutions
Tick Corporation will be exhibiting at "POWTEX 2026 (Powder Technology Exhibition)" held at Tokyo Big Sight from November 25 (Wednesday) to 27 (Friday), 2026. Main products to be showcased at POWTEX 2026: ■ DryMaster | Improving the maintainability of the spray drying process ■ Tank Cleaning Nozzle | Enhancing efficiency and automation of CIP and container cleaning ■ Duct Cleaning Nozzle | Streamlining the cleaning of powder adhesion and deposits ■ TankClean Software | Simulating the arrangement and selection of tank cleaning nozzles Recommended for those who have the following challenges: - Want to reduce maintenance time for the spray drying process - Want to increase the operational efficiency of spray dryers - Want to automate tank cleaning and CIP processes - Want to reduce the water and chemicals used for tank cleaning - Want to review the selection and arrangement of tank cleaning nozzles - Want to efficiently clean powder adhesion inside ducts and pipes Exhibition Name: POWTEX 2026 (Powder Technology Exhibition) Venue: Tokyo Big Sight Dates: November 25 (Wednesday) to 27 (Friday), 2026 Time: 9:30 AM to 5:00 PM Booth Number: 1-D19
Next-generation megasonic technology can instantly clear wafers up to 300mm.
- Photomask
- Other semiconductor manufacturing equipment
- Ultrasonic Cleaner
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.
Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
Announcement of the release of the latest leaflet for the SONOSYS Corporation's megasonic cleaning device.
We have updated the product leaflet for the SONOSYS megasonic cleaning device from Germany to the latest version. SONOSYS's megasonic cleaning technology is a non-contact precision cleaning technique that efficiently removes fine particles by transmitting high-frequency ultrasonic energy through liquids such as pure water (DI Water) to the surface of the target object. It is particularly suitable for the precision cleaning of products with fine structures, such as semiconductor wafers, photomasks, MEMS, various substrates, and optical components, and is utilized in various fields that require high cleanliness, starting with semiconductor manufacturing processes. SONOSYS offers a range of frequencies depending on the application and the particles to be removed, as well as a megasonic nozzle system that accommodates various cleaning conditions, including Single Nozzle, Dual Nozzle, and Triple Nozzle. Customers who have challenges such as "wanting to remove fine particles from wafers," "wanting to clean photomasks and MEMS while minimizing damage," or "wanting to review existing cleaning processes" are encouraged to take a look at the latest leaflet.
Sonosys's ultrasonic cleaning solves the challenges of wafer cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.
Surface cleaning for MEMS device manufacturing with Sonosys ultrasonic cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.
Precision cleaning of optical lenses with Sonosys ultrasonic cleaning.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Ultrasonic cleaner
The NHK program "The Wall of Truth" will feature a video of semiconductor wafer cleaning provided by our company.
We are pleased to announce that a video provided by Tick Corporation showcasing semiconductor wafer cleaning will be featured in the NHK program "The Wall of Truth." The theme for this episode is "The Truth of Water (tentative)." The program is scheduled to briefly introduce the process of cleaning wafers with pure water during semiconductor manufacturing. Our company offers cleaning and spraying technologies, including megasonic cleaning, for the semiconductor and electronic components sectors. We are truly honored that our footage will be utilized in the production of this NHK program. Broadcast schedule: September 12, 2026 (Saturday) from 8:30 PM to 8:59 PM (tentative). For more details about the program, please visit the official NHK "The Wall of Truth" page. https://www.nhk.jp/g/ts/N8JX1V6V69/ *Please note that the broadcast date and content may be subject to change.