List of Sputtering Equipment products
- classification：Sputtering Equipment
151～180 item / All 216 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.
- Other safety and hygiene products
Inverted sputtering is also possible! Equipped with a 500W high-frequency power supply, it can deposit metals, oxides, insulators, and more.
- Sputtering Equipment
High-performance materials (tungsten and molybdenum) products from Plansee are available for purchase online. Sheets, rods, wires, vapor-deposited parts, heat sinks, and more.
- Non-ferrous metals
- Industrial Furnace
- Sputtering Equipment
CNC lathe processing, aluminum precision cutting, semiconductor manufacturing equipment parts [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- CVD Equipment
- Ion implantation equipment
A5056 / Lathe processing / Aluminum processing [Leave cost reduction to Firiru Co., Ltd.]
- CVD Equipment
- Sputtering Equipment
- Other semiconductor manufacturing equipment
Aluminum cutting / A5052 / Lathe processing / Osaka [Leave cost reduction to Firiru Co., Ltd.]
- CVD Equipment
- Sputtering Equipment
- Semiconductor inspection/test equipment
Polycrystalline silicon is used as a raw material for the semiconductor industry and the solar cell industry (PV). Material: Nickel alloy Process: Filter
- Sputtering Equipment
■Advantages ・Custom-made to meet your requirements ・Uniform gas diffusion ・Standard connector elements
- Sputtering Equipment
A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.
- Sputtering Equipment
Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.
- Sputtering Equipment
Aluminum processing, anodizing treatment, Osaka [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- CVD Equipment
- Evaporation Equipment
It is an introduction device that transmits linear motion from the atmospheric side to samples and equipment in a vacuum.
- Sputtering Equipment
- CVD Equipment
- Other semiconductor manufacturing equipment
Conductive carbon thin films are formed by sputtering. Stable film formation is achieved through a simple process with inert gas and carbon target at low temperatures (below 400°C).
- Sputtering Equipment
- Plasma surface treatment equipment
- Other processing machines
Aluminum precision parts for semiconductor manufacturing equipment, Osaka. [Leave cost reduction to Philir Co., Ltd.]
- Sputtering Equipment
- Ion implantation equipment
- Evaporation Equipment
Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.
- Sputtering Equipment
Multi-layer film deposition using a maximum of 5 yuan cathodes. Wear resistance, heat resistance, and smooth thin films. High throughput even for high-temperature deposition with a load lock type.
- Sputtering Equipment
- Plasma surface treatment equipment
From discrete components to advanced devices, from R&D to mass production. A compact, high-quality, multi-purpose CtoC type sputtering system.
- Sputtering Equipment
- Plasma surface treatment equipment
- Other mounting machines
Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.
- Other processing machines
- Sputtering Equipment
- Plasma surface treatment equipment
A lineup with over 20 years of proven history. Customized processes and hardware for high-end niche processes from R&D to mass production.
- Sputtering Equipment
- Plasma surface treatment equipment
AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.
- Sputtering Equipment
- Plasma surface treatment equipment
Developed for the purpose of achieving high uniformity and excellent reproducibility in the deposition of optical multilayer films!
- Sputtering Equipment
Ideal for research and development of advanced thin film devices. A customizable single-sheet ultra-high vacuum inline system. Responding to demands with a wealth of options and flexible support.
- Sputtering Equipment
- Plasma surface treatment equipment
Multi-functional, compact, flexible support, a standard lineup with proven results and trust.
- Sputtering Equipment
- Plasma surface treatment equipment
Support from research and development to mass production!
- Sputtering Equipment
- Printed Circuit Board
- Other semiconductors
A must-see for engineers considering new film formation methods! Fully automated film formation of metal films and protective films on resin substrates.
- Vacuum Equipment
- Sputtering Equipment
Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.
- Sputtering Equipment
Two models: manual batch type and simple load lock type. The simple load lock type enables the mass production process of compound semiconductors. Currently accommodating sample tests and equipment to...
- Sputtering Equipment
- Plasma surface treatment equipment
Compact-type sputtering device exclusively for small substrate, achieving low cost with fully manual operation. Standard type for research and experiments.
- Other physicochemical equipment
- Sputtering Equipment