Semiconductor Manufacturing Equipmentの製品一覧
- 分類：Semiconductor Manufacturing Equipment
46～90 件を表示 ／ 全 5119 件
Achieves high collection efficiency through electrostatic methods. Offers a wide range of products from large to small sizes. Also compatible with water-soluble oil mist.
- air conditioning
[Patent Obtained] Instant complete water removal of workpieces with air blow = complete drying!
- Other semiconductor manufacturing equipment
Revolutionary! No need for water washing! Particles are removed with just air blow.
- Other semiconductor manufacturing equipment
Are you making this mistake when draining water from your work?
- Other semiconductor manufacturing equipment
Are you making this mistake with the work's drainage?
- Other semiconductor manufacturing equipment
Are you making this mistake while draining water from the work?
[To those in charge who are struggling with workpiece water drainage] Are you making these mistakes with workpiece water drainage? ✓ Do you know the real reason why, even if you increase the air blow pressure, not all water droplets are blown away? ✓ Do you know the real reason why, even if you increase the number of air nozzles, water is not sufficiently drained? ✓ Do you know the real reason why, even if you change the shape of the air nozzle, it still does not drain water effectively? These mistakes are typical errors made by companies that use air blow for workpiece water drainage and droplet removal. However, these mistakes are not significant compared to a certain "fatal mistake." What is that "fatal mistake"? It is… We provide this information in a PDF file. Download it now to find out.
No more revolution! No need for washing; particles are removed with just air blowing.
- Other semiconductor manufacturing equipment
Just by looking at this, you'll understand everything! We created a PR flyer (dust removal version).
Thoroughly remove dust from workpieces with air blow! We have summarized everything about the patented complete dust removal air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Why can it remove dust so effectively?" "How can it remove dust even from complex-shaped workpieces?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download and take a look.
[Patent Obtained] Complete water removal in an instant with air blow = complete drying!
- Other semiconductor manufacturing equipment
If you see this, you'll understand everything! I created a PR flyer.
100% water removal with air blow! No water droplets left on the workpiece! We have summarized everything about the patented complete drying air nozzle, "Air Screw Nozzle," on a single A4 flyer. "What kind of nozzle is it?" "Can it really remove 100% of the water?" "Why is it so effective at removing water?" Just by looking at this, you can quickly understand everything about the Air Screw Nozzle. Please download it and take a look!
Integrate the functions of the flow sensor and valve to automatically control the water flow, such as coolant, using a microcontroller.
- Other semiconductor manufacturing equipment
- Flow Control
- Piping Materials
Advanced horizontal etching for PCB/PCM. VACU-Etch technology ensures 1-mil line uniformity by eliminating the puddle effect.
- Etching Equipment
A super high-resolution camera capable of wide-angle and ultra-high-definition imaging, suitable for various MV applications.
- Monochrome camera
- Color camera
- Semiconductor inspection/test equipment
Leave the latest ultrasonic cleaning to Sonosys.
- Photomask
- CMP Equipment
- CVD Equipment
The website of the ultrasonic spray nozzle manufacturer "Sonaer" has been renewed.
The website of the ultrasonic spray nozzle manufacturer "Sonaer" has been renewed. Compared to the previous website, product browsing has improved, and we have also started offering a new system. If you are interested, please feel free to contact us.
Next-generation megasonic technology can instantly clear wafers up to 300mm.
- Photomask
- Other semiconductor manufacturing equipment
- Ultrasonic Cleaner
Our company's handled products, including air nozzles and tank cleaning nozzles from Rehlar, ultrasonic spray nozzles from Sonia, and blowers and air knives (drying devices) from Sonic, have been featured on the industrial product and manufacturer comparison site "Metory."
We are pleased to announce that our company's handled products, including air nozzles from Rehlar, tank cleaning nozzles, ultrasonic spray nozzles from Sonia, and blowers and air knives (drying devices) from Sonic, have been featured on the industrial product and manufacturer comparison site "Metoree." About "Metoree" Metoree is a comparison site for industrial product manufacturers aimed at engineers, researchers, and purchasing professionals. It provides useful information to help engineers easily compare and select products and manufacturers.
Flow spray of 2 mmlit/min or less is possible!
- nozzle
- valve
- Etching Equipment
Our product catalog is now available on Apelza.
The catalog for the air nozzles manufactured by Lehira (commonly known as multi-channel jets), ultrasonic spray nozzles by Sonia, blowers, and air knife systems by Sonic has been released.
Atomization of liquid without pressurization by piezo vibration. Enables uniform application while reducing power consumption and liquid waste.
- spray
- Coating Machine
- CMP Equipment
Our product catalog is now available on Apelza.
The catalog for the air nozzles manufactured by Lehira (commonly known as multi-channel jets), ultrasonic spray nozzles by Sonia, blowers, and air knife systems by Sonic has been released.
Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
For precise cleaning of prisms. Sonosys ultrasonic cleaning device.
- Ultrasonic Cleaner
- Ultrasonic Oscillator
- Photomask
High-durability PTFE hoses achieve both high flexibility and durability due to their fine wave PTFE structure. They are suitable for chemical supply lines and movable piping sections in semiconductor ...
- hose
- Other semiconductor manufacturing equipment
- Etching Equipment
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High-pressure resistant PTFE hoses adopt a fine wave PTFE corrugation structure. They achieve both high pressure resistance and low reaction force, making them suitable for high-purity chemical lines ...
- hose
- Other semiconductor manufacturing equipment
- Etching Equipment
"We want to confirm the effectiveness of the coating in advance." To meet such needs, Yoshida SKT also offers measurements of the coated surface.
- Resist Device
I will explain in detail the differences between Teflon and fluoropolymer, which are often confused.
- Other semiconductor manufacturing equipment
I will explain the differences between fluororesin and Teflon.
- Other semiconductor manufacturing equipment
[Presentation of Materials] We will introduce the differences in features between Teflon fluoropolymer "PTFE" and "PFA" resins and coatings.
- Other semiconductor manufacturing equipment
Easily removes contaminants with low surface energy. A coating that significantly improves maintainability.
- Other semiconductor manufacturing equipment
Combining excellent electrical insulation and static prevention functions. A coating that prevents static electricity troubles in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Suppresses metal ion leaching to an extremely low level. Suitable for semiconductor manufacturing processes that require high purity.
- Other semiconductor manufacturing equipment
From transportation, cleaning, etching, CMP, plating, to inspection. Coating that supports a wide range of processes in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Control metal ion contamination at the ppb level. Protect high-purity processes with fluororesin.
- Other semiconductor manufacturing equipment
Eliminate particle and ESD defects caused by static electricity. Unique coating that achieves both static prevention and non-stick properties.
- others
- Other semiconductor manufacturing equipment
From preventing scratches and chips on the transport handle to measures against corrosion of the structure. Coatings that enhance the reliability of wafer transport.
- Other semiconductor manufacturing equipment
Corrosion prevention, prevention of metal ion leaching, and prevention of wafer scratches. Summarizing and solving the challenges of cleaning equipment.
- Other semiconductor manufacturing equipment
Resistant to strong acids, strong alkalis, and organic solvents. A chemical-resistant coating compatible with all processes in semiconductor manufacturing.
- Other semiconductor manufacturing equipment
Prevent damage, adhesion, and metal powder generation on wafers, and maintain a clean environment in the inspection process.
- Other semiconductor manufacturing equipment
Chemical stability that withstands various chemical environments. An optimal fluororesin coating for corrosion prevention in semiconductor manufacturing equipment.
- Other semiconductor manufacturing equipment
Filter cartridge replacement without removing piping.
- Other semiconductor manufacturing equipment
- Other process controls
- Piping Materials
Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace
- Heating device
- Annealing furnace
- Electric furnace
4-Yen Multi-Sputtering Device 【MiniLab-S060】
4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.