List of Etching Equipment products
- classification：Etching Equipment
271～315 item / All 333 items
Heat resistant up to 1200℃. We will custom-make high-performance insulation covers that ensure safety in the working environment!
- Glass
The technology of braille etching is a patented product of Toho! The integration of patterns and braille enhances design quality!
- Etching Equipment
The fine nozzle arrangement and oscillation system enable uniform surface accuracy.
- Etching Equipment
- Other semiconductor manufacturing equipment
Responding to the demand for finer printed circuit boards as high density increases.
- Etching Equipment
It is possible to stably transport workpieces with a thickness of 50 μm, and it is also compatible with FPC transport.
- Other surface treatment equipment
- Etching Equipment
It is a high-precision processing type that enables high-precision alkaline etching.
- Etching Equipment
- Other semiconductor manufacturing equipment
Achieving surface accuracy of the group through an ideal nozzle arrangement, ensuring reliable cleaning of small-diameter holes.
- Etching Equipment
- Other semiconductor manufacturing equipment
- Other cleaning machines
The above etching is independently pressure-controlled for even higher precision. It is compatible with FPC transport.
- Etching Equipment
Vibrant expressions are possible with inexpensive aluminum nameplates! The anodized coating (alumite treatment) makes it resistant to the effects of solvents and other substances!
- Etching Equipment
ICP etching equipment for compound semiconductor processes
- Etching Equipment
- Wafer processing/polishing equipment
Super large printing of 1200X1500 mm is possible! Weather-resistant and ideal for outdoor products! Integrated production of printing, embossing, and contour processing! Metallic printing available!
- Etching Equipment
- Nameplate
- Printing Machinery
A nameplate that combines decorative and durable features!! Sharp expressions are possible!!
- Etching Equipment
An aluminum nameplate that requires minimal manufacturing processes and can accommodate short delivery times!! Achieving ultra light resistance by expressing black color through a chemical reaction in...
- Etching Equipment
- Nameplate
- Printing Machinery
Large etching up to 1500mm x 3000mm is possible! Achieved ultra weather resistance with unique special plating!! Deep engraving enhances the sense of luxury!!
- Etching Equipment
A versatile nameplate that excels at displaying a bright atmosphere.
- Etching Equipment
- Nameplate
- Printing Machinery
Durable and substantial nameplate.
- Etching Equipment
- Nameplate
- Printing Machinery
Achieving three-dimensional shapes that are difficult to realize with conventional processing.
- Etching Equipment
- Nameplate
- Printing Machinery
Fine printing is possible. It can print small text, intricate designs, and halftones, making it ideal for producing nameplates and other items with a lot of printed content.
- Etching Equipment
- Nameplate
- Printing Machinery
A chiller that enables a wide temperature range management from -70℃ to +200℃!
- Temperature and Humidity Control
- Etching Equipment
- Heating device
[Temperature Management System (Chiller)] Long-selling DEX Series of ATS brand
This is an introduction to one of ATS Japan's flagship products, the "DEX Series." ● Wide temperature range (-30℃ to +90℃) ● Leakless magnetic pump ● Stackable (two-tier) compatible ● Central monitoring system compatible (optional) Our long-selling model has a proven track record of thousands of chiller installations, primarily in the semiconductor industry. We also offer optimal solutions tailored to the usage environment and applications for other industries such as food, medical, and scientific fields. Please feel free to contact us for more information.
Can be set up to 180℃! Leakless high-temperature compatible model.
- Temperature and Humidity Control
- Etching Equipment
- Heating device
[Temperature Management System (Chiller)] Long-selling DEX Series of ATS brand
This is an introduction to one of ATS Japan's flagship products, the "DEX Series." ● Wide temperature range (-30℃ to +90℃) ● Leakless magnetic pump ● Stackable (two-tier) compatible ● Central monitoring system compatible (optional) Our long-selling model has a proven track record of thousands of chiller installations, primarily in the semiconductor industry. We also offer optimal solutions tailored to the usage environment and applications for other industries such as food, medical, and scientific fields. Please feel free to contact us for more information.
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A new temperature management system that combines "efficiency" and "savings."
- Temperature and Humidity Control
- Heating device
- Etching Equipment
[Temperature Management System (Chiller)] Long-selling DEX Series of ATS brand
This is an introduction to one of ATS Japan's flagship products, the "DEX Series." ● Wide temperature range (-30℃ to +90℃) ● Leakless magnetic pump ● Stackable (two-tier) compatible ● Central monitoring system compatible (optional) Our long-selling model has a proven track record of thousands of chiller installations, primarily in the semiconductor industry. We also offer optimal solutions tailored to the usage environment and applications for other industries such as food, medical, and scientific fields. Please feel free to contact us for more information.
![[Chiller] Energy-saving model MX se...](https://image.mono.ipros.com/public/product/image/f7f/2000002891/IPROS320021963806305382.jpg?w=280&h=280){kind=small}
Power consumption reduced by 66%! An energy-saving temperature management system with a width of only 390mm.
- Temperature and Humidity Control
- Heating device
- Etching Equipment
[Temperature Management System (Chiller)] Long-selling DEX Series of ATS brand
This is an introduction to one of ATS Japan's flagship products, the "DEX Series." ● Wide temperature range (-30℃ to +90℃) ● Leakless magnetic pump ● Stackable (two-tier) compatible ● Central monitoring system compatible (optional) Our long-selling model has a proven track record of thousands of chiller installations, primarily in the semiconductor industry. We also offer optimal solutions tailored to the usage environment and applications for other industries such as food, medical, and scientific fields. Please feel free to contact us for more information.
A temperature control system that pursues high cooling capacity and fast heating and cooling.
- Etching Equipment
- Heating device
- Temperature and Humidity Control
[Temperature Management System (Chiller)] Long-selling DEX Series of ATS brand
This is an introduction to one of ATS Japan's flagship products, the "DEX Series." ● Wide temperature range (-30℃ to +90℃) ● Leakless magnetic pump ● Stackable (two-tier) compatible ● Central monitoring system compatible (optional) Our long-selling model has a proven track record of thousands of chiller installations, primarily in the semiconductor industry. We also offer optimal solutions tailored to the usage environment and applications for other industries such as food, medical, and scientific fields. Please feel free to contact us for more information.
Heat-resistant polyimide resin MELDIN has been adopted for the wafer carriers of semiconductor manufacturing equipment.
- Etching Equipment
Achieving high-quality etching in a short time through microcontroller control.
- Etching Equipment
Aluminum cutting processing
- Other processing machines
- Etching Equipment
- Processing Contract
High-precision processing type High-precision etching line
- Etching Equipment
High-precision processing type micro-etching device
- Etching Equipment
High-precision processing type soft etching and small-diameter hole cleaning line
- Etching Equipment
High-precision processing type: Stripping and alkaline etching line
- Etching Equipment
Ninomiya System manufactured H-down device
- Etching Equipment
Ninomiya System ITO Etching Equipment
- Etching Equipment
Compact Ultra-High Precision Etching Machine MPE40
- Etching Equipment
Ninomiya System's ultra-compact etching test device
- Etching Equipment
Easy and efficient etching with air jets.
- Etching Equipment
Removal of gases and vapors generated during etching.
- Etching Equipment
- Ventilation and Exhaust
Chemical resistance, heat resistance, insulation, non-magnetic, acid resistance, alkali resistance, oil resistance, solvent resistance, thermal insulation, recycling.
- Spring
- Other physicochemical equipment
- Etching Equipment
Chemical resistance, heat resistance, insulation, non-magnetic, acid resistance, alkali resistance, oil resistance, solvent resistance, thermal insulation, recycling.
- Spring
- Other physicochemical equipment
- Etching Equipment
Chemical resistance, heat resistance, insulation, non-magnetic, acid resistance, alkali resistance, oil resistance, solvent resistance, thermal insulation, recycling.
- Spring
- Other physicochemical equipment
- Etching Equipment
Small developing device for photolithography
- Etching Equipment
Ultra-compact microwave plasma source SMPS-201
- Etching Equipment
- Other semiconductor manufacturing equipment
Microwave Ion Source EMIS-221C
- Etching Equipment
- Other semiconductor manufacturing equipment
Night Ride H System Quartz Night Ride Reflux System ACCUBATH
- Etching Equipment
PSS (Patterned Sapphire Substrate) through wet etching is changing the LED industry!!
About Patterned Sapphire Substrates (PSS) Using Wet Etching Currently, LED manufacturers have two completely different processes as options for their manufacturing processes. The dry etching method allows for the production of high-brightness, high-efficiency LEDs, but it requires a long time for manufacturing and has limitations on throughput. The wet etching method has a shorter manufacturing time and is highly scalable, but it cannot produce LEDs that are efficient or effective. However, in the case of the wet etching method, even when polishing and improving the wafer to enhance light extraction efficiency, significant cost reductions can be achieved compared to the dry etching method. Additionally, because it can scale up very efficiently, the cost reduction rate dramatically increases multiple times as throughput is increased and wafer sizes are expanded.