Wafer cleaning device (batch type) *Testable models available
We propose specifications that consider cost reduction through wet etching.
We achieve low cost and high productivity unique to wet etching. We can accommodate various transport positions and methods according to your needs, and customization with additional mechanisms is also possible. 【Features】 ■ Fully automatic acid and alkaline etching (cleaning) equipment ■ Manual acid and alkaline etching (cleaning) equipment ■ RCA cleaning equipment ■ In addition to front transport type and rear upper transport type, we can also accommodate upper transport type and rear transport type according to customer needs. ■ You can choose from carrierless transport, carrier transport, carrier hanger transport, etc., according to your budget. ■ Additional handover mechanisms with front and rear devices and external communication functions are possible. ■ Automatic doors, automatic lids, automatic chemical supply, weighing, and recovery devices can be equipped. ■ It is possible to equip a concentration management mechanism for etching solutions. Please consult us regarding the target chemicals (e.g., TMAH, KOH, HF, HCL, etc.). ■ Temperature distribution measurement in the etching processing tank can be performed as a pre-shipment inspection. ■ In addition to the up-and-down oscillation mechanism, a wafer rotation mechanism can also be added. * Testing can be conducted at our Tokyo Test Center (Sumida Ward). (Online support available) * For more details, please download the catalog or feel free to contact us.
- Company：ダルトン
- Price：Other
