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Cleaning unit Product List and Ranking from 20 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated: Aggregation Period:Feb 18, 2026~Mar 17, 2026
This ranking is based on the number of page views on our site.

Cleaning unit Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Feb 18, 2026~Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. プレテック 静岡製作所 Shizuoka//Industrial Electrical Equipment
  2. 洲本整備機製作所 本社工場 Hyogo//Industrial Machinery
  3. 長浜産業 本社 広域営業部 Hiroshima//Industrial Machinery
  4. 4 HUGパワー Kanagawa//Electronic Components and Semiconductors
  5. 5 日本アレックス Chiba//Industrial Machinery

Cleaning unit Product ranking

Last Updated: Aggregation Period:Feb 18, 2026~Mar 17, 2026
This ranking is based on the number of page views on our site.

  1. ラジカル洗浄ユニット<デモ機あり> プレテック 静岡製作所
  2. Underbody cleaning unit for vehicles from standard cars to large vehicles. 洲本整備機製作所 本社工場
  3. Assembly pool-type tire cleaning unit "Bashatto" 長浜産業 本社 広域営業部
  4. 4 Cleaning unit "Proximity Type Megasonic PA10-Q60AE-S" プレテック 静岡製作所
  5. 5 Cost reduction for environmental consideration at construction sites - Assembly pool-type tire cleaning unit. 長浜産業 本社 広域営業部

Cleaning unit Product List

31~57 item / All 57 items

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Case Study (Beer Hall Cleaning) Steam Two-Fluid Cleaning Unit SSC Series

Comparison materials for beer hall cleaning are now available. Clean with supersonic jets of steam and liquid from a supersonic injection nozzle!

The steam two-fluid cleaning unit "SSC series" injects steam and liquid fluids at supersonic speeds from a supersonic injection nozzle, generating micro-cavitation on the surface of the target object for cleaning. By mixing liquid with steam, a two-fluid system is created, significantly enhancing cleaning power. To suppress metal contamination and the generation of fine foreign substances, a special coating is applied to the surface using specific materials, producing high-purity steam. This page includes comparative materials before and after the cleaning treatment of beer halls. 【Features】 ■ No consumables like brushes, significantly reducing running costs ■ Only "pure water" is used ■ Substantially reduces the amount of chemicals used ■ Greatly enhances cleaning power ■ Also used for semiconductor cleaning *For details, please request materials or view the PDF data from the download section.

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Automotive parts sensor cleaning unit and camera lens cleaning unit.

Small DC pump (micro pump mechanism and structural design) - casing molding and assembly!

We proposed a cleaning unit for automotive sensors and camera lenses. With a design that features high flow rate, high pressure, and optimal unit configuration, we achieved powerful cleaning capabilities through high flow and pressure. By designing the mechanism and structure within the unit, we further reduced noise and vibration. This unit can be used to prevent the degradation of detection performance caused by surface dirt such as rain, snow, mud, and insects, as well as for cleaning sensors to maintain detection performance. 【Specifications】 ■ Material: Rubber, super engineering plastics, assembled products ■ Lot: 1,000 to 100,000 units ■ Industry: Automotive (mass production), railway, robotics *For more details, please refer to the PDF document or feel free to contact us.

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  • Cleaning unit

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Head Cleaning Unit_Mini Type

By directly connecting a tube to the print head of an existing inkjet printer, direct cleaning of the head is possible.

Pantheon Systems is a dedicated manufacturer of cleaning and nozzle recovery units for inkjet heads. Units certified for functionality by Xaar in the UK are also used as certified tools in the company's internal RMA process and are currently being developed as dedicated units compatible with various print heads. The head cleaning units from Pantheon Systems do not use any ultrasonic waves that could cause damage to internal head components; instead, they utilize a uniquely designed liquid and air pulse pressure wave cycle. This technology allows for the ideal cleaning and recovery of stubborn impurities that cause nozzle clogging without damaging the head. Pantheon Systems also supplies both portable and stationary standard units. For more details, please download the English version of the materials or contact us.

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High-pressure cleaning unit (water jet)

Compact design, low noise, and easy pressure adjustment. Removal of foreign objects and dirt can be solved with high-pressure cleaning.

Using a high-pressure pump and a nozzle specifically designed for high-pressure cleaning, high-impact fine particles are sprayed to effectively remove particles and organic contaminants from the surface of the cleaning target (substrate). - The unit size is more compact than previous compressed air pumps. - Solves the noise issues characteristic of compressed air pumps. - Pressure adjustment is easy (pressure can be adjusted easily by changing the Hz with an inverter). - Easy connection from factory utilities (DIW). - Customizable according to customer needs. - Interlock function (if the water jet flow/pressure exceeds the set value, an alarm is triggered in the cleaning device).

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Cleaning Unit "Fine Jet"

Stable oscillation from low to high output to meet a wide range of needs for single-sheet cleaning!

The "Fine Jet" is a cleaning unit that allows for the selection of various frequencies. It meets a wide range of needs for single wafer cleaning with stable oscillation from low to high output. It is suitable for various applications such as cleaning wafer substrates, magnetic disks, and post-CMP cleaning of wafers. Additionally, there are various nozzle options available, including chemical resistance and metal contamination-free types. 【Features】 ■ Fine output adjustment: Stable output adjustment in 1W increments (PT-010J50) ■ Selection of various frequencies available (400kHz/1500kHz/3000kHz) ■ Variety of nozzle options: Chemical resistance, metal contamination-free ■ Enhanced detection function: Capable of detecting transducer degradation (PT-010J50) ■ Enhanced communication function: Monitoring of oscillator status and external settings (PT-010J50) *For more details, please download the PDF or feel free to contact us.

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Cleaning Unit "Fine Scroll"

Introduction of sheet and flat feeding cleaning tools for small substrates to large LCD panels!

"Fine Score" is a cleaning unit suitable for FPD substrate cleaning and various wafer substrate cleaning. The cleaning width ranges from 160mm to 2210mm, offering a detailed size variation. Additionally, the maximum output increase contributes to the expansion of the cleaning area and cost reduction. Please feel free to contact us if you have any inquiries. 【Features】 ■ Detailed size variation ■ Cleaning width ranges from 160mm to 2210mm ■ Fine output adjustment: stable output adjustment in 1W increments (PT-150MV) ■ Maximum output increase: expansion of the cleaning area and cost reduction ■ Communication functions: monitoring of oscillator status, external settings ■ Compliance with various standards (FCC, CE, RoHS) *For more details, please download the PDF or feel free to contact us.

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Fine Series Cleaning Unit

Damage-free cleaning of submicron particles with high frequency from 750 kHz to 3.0 MHz.

We offer the "Fine Series Cleaning Units," including a batch cleaning unit that uses 750kHz. The "Fine Sonic (Batch Cleaning Unit)" efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece. Additionally, we provide the "Fine Jet (Spray Cleaning Tool)," suitable for cleaning silicon wafers and photomasks, as well as the "Fine Scall (Shower Cleaning Tool)," which sprays ultra-pure water infused with 1.5MHz sound waves for cleaning. 【Features】 < Fine Sonic > ■ Batch cleaning unit using 750kHz ■ Efficiently transmits sound waves through a specially designed vibrating element, removing sub-micron particles without damaging the workpiece ■ Suitable for cleaning silicon wafers, photomasks, and magnetic disks *For more details, please refer to the related links or feel free to contact us.

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  • Ultrasonic Cleaner
  • Batch type cleaning machine
  • Spray Cleaner
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Cleaning unit "Proximity Type Megasonic PA10-Q60AE-S"

Suitable for cleaning silicon wafers, photomasks, liquid crystal glass, magnetic disks, etc., cleaning after CMP, and batch-type cleaning.

The "Proximity Type Megasonic PA10-Q60AE-S" is a cleaning unit that emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. It enables high linearity oscillation from a low output range. Since it cleans very close to the substrate, it can remove sub-micron particles. It allows for liquid supply with a cavitation prevention function and enables a sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate. 【Features】 ■ The nozzle material is quartz, which has low particle generation and is durable against chemical solutions. ■ Emits sound waves at 1.0MHz or 3.0MHz from the nozzle tip. ■ Enables high linearity oscillation from a low output range. ■ Cleans very close to the substrate, allowing for the removal of sub-micron particles. *For more details, please download the PDF or feel free to contact us.

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  • Ultrasonic Cleaner
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ラジカル洗浄ユニット<デモ機あり>

高効率でOHラジカルを生成。コンパクト設計で省スペースに設置可能。水銀レスで深紫外LEDを搭載

当社が提供する「ラジカル洗浄ユニット」は、独自の深紫外LED発光体を採用し、 オゾン水などの洗浄液からOHラジカルを効率良く生成できるコンパクトな製品です。 UV-C照射によるオゾン水分解技術により、高純度洗浄を求める微細加工工程において、 有機汚染物やフォトレジスト残渣の除去、金属汚染の抑制などに貢献します。 接液部は合成石英で構成されており、クロスコンタミを防止。 水銀を使用しないLED仕様で、長期間にわたり安定運用が可能です。 デモ機も用意しておりますので、ご希望の方はお気軽にご連絡ください。 【特長】 ■コンパクトサイズで省スペースに設置 ■リニアな発光制御が可能 ■環境負荷を抑えつつ高効率な洗浄が可能 ■半導体製造、医療機器、食品加工など応用分野が広い ■ユニット内部の分割制御により、劣化時のフィードバック設定が可能 ※詳しくは資料をご覧ください。お問い合わせもお気軽にどうぞ。

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Spin cleaning unit for corner substrates and photomasks

Compatible with square substrates such as photomask substrates. Achieves integrated processing within the same unit, from cleaning solution supply from both the top and bottom sides to drying through high-speed rotation.

This product is a spin cleaning unit designed to efficiently clean and dry square-shaped substrates (square substrates), including photomask substrates. ■ Cleaning process specialized for square substrates It provides stable spin cleaning for square substrates, which are generally considered difficult to process with rotation. It is primarily designed for photomask substrates of size 152×152mm, but it can accommodate various sizes of square substrates. ■ Complete process from cleaning to drying in one unit The drying process, using high-speed rotation, is performed within the same unit following the cleaning process. This allows for the completion of the entire series of processes without moving the substrate, contributing not only to a reduction in takt time but also to a decrease in the risk of recontamination during movement, thereby maintaining high cleaning quality. *For more details, please download the catalog or feel free to contact us.

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High-frequency cleaning unit: Example of use - Stripping cleaning

We propose detergents and cleaning processes tailored to your needs! We will solve it with our detergent technology and ultrasonic cleaning.

We propose the "High-Frequency Cleaning Unit" for stripping and cleaning. We believe many customers with painting processes are considering the removal of paint or vapor-deposited layers from jigs and the reuse of these jigs. There are likely many customers who wish to stop using difficult-to-handle chemicals such as caustic soda and hydrocarbons. We offer detergents and cleaning processes tailored to your needs. By maximizing the use of existing equipment, we can improve the workplace environment with minimal investment. 【Features】 ■ By optimizing the cleaning process, it is possible to reduce cleaning time to one-fifth. ■ Since it can be verified based on experimental results, you can implement it with confidence. *For more details, please refer to the PDF document or feel free to contact us.

  • Ultrasonic Cleaner
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Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'

Efficient removal of fine particles through direct substrate irradiation. Precision wafer cleaning unit using high-frequency megasonic. *Demo unit available.

The proximity megasonic cleaning unit "PA10-Q60AE-S" directly irradiates high-frequency sound waves of 1.0MHz or 3.0MHz onto the substrate, efficiently removing fine particles and residues in a non-contact manner. Equipped with a unique liquid supply system, it ensures a uniform cleaning area up to the outer edge of the substrate. It minimizes liquid splatter and energy loss, making it suitable for the precise cleaning of semiconductor wafers and photomask substrates with fine structures. The main body is made of high-purity quartz, which has low dust generation and excellent chemical resistance, allowing for combined cleaning with strong acids and strong alkalis. Its direct irradiation method above the substrate is compatible with single-wafer cleaning devices, enabling flexible design for each process. [Applications] - Removal of fine particles from semiconductor wafers - Cleaning of residues after photoresist stripping - Cleaning after TSV, MEMS structures, and film formation, etc. *Demo units are available for you to check the usability. *For more details, please download the PDF or feel free to contact us.

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  • Ultrasonic Cleaner
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Radical cleaning unit for semiconductors

High-efficiency OH radical generation, space-saving design, mercury-free UV-C LED equipped.

In the semiconductor industry’s precision cleaning processes, advancements in microfabrication technology have led to demands for higher cleaning accuracy and reduced environmental impact. In particular, the complete removal of organic contaminants and photoresist residues, as well as the suppression of metal contamination, are critical challenges that affect product quality and yield. Radical cleaning units achieve high-purity cleaning and contribute to solving these issues. 【Usage Scenarios】 - SPM-free photoresist removal process - Suppression of organic and metal contamination - Metal film oxidation prevention process 【Benefits of Implementation】 - Improved cleaning efficiency - Reduced environmental impact - Enhanced product quality

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Radical Cleaning Unit for Research Institutions

High-efficiency OH radical generation, compact design, mercury-free LED equipped.

In the cleaning of experimental equipment at research institutions, high cleaning performance is required to prevent contamination and obtain accurate experimental results. In particular, the removal of fine organic materials and metal contaminants is a crucial factor that affects the precision of experiments. Radical cleaning units efficiently generate OH radicals to address these challenges. 【Usage Scenarios】 - Cleaning of experimental equipment - Cleaning of fine parts - Metal contamination countermeasures 【Benefits of Implementation】 - Improved experimental accuracy due to high cleaning power - Reduced environmental impact - Lower running costs

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Radical Cleaning Unit for Pharmaceuticals

High-efficiency OH radical generation, compact design, mercury-free LED equipped.

In the pharmaceutical industry, advanced decontamination technologies are required to minimize the risk of contamination in the manufacturing process. In particular, in the pharmaceutical manufacturing environment, trace amounts of organic matter or metal contamination can have a serious impact on product quality. Our radical cleaning unit efficiently generates OH radicals to address these challenges. 【Application Scenarios】 * Decontamination of pharmaceutical manufacturing equipment * Removal of contaminants in clean rooms * Cleaning of laboratory instruments in research and development facilities 【Benefits of Implementation】 * Reduction of contamination risk * Improvement of product quality * Streamlining of the manufacturing process

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Radical Cleaning Unit for Food Processing

Sterilizing food with OH radicals. Compact design for space-saving.

In the food processing industry, maintaining product quality and ensuring safety are crucial. In particular, effective sterilization methods are required to suppress the growth of bacteria and mold that can cause foodborne illnesses. Traditional sterilization methods carry the risk of quality degradation due to the use of chemicals or high-temperature heating. Our radical cleaning unit generates OH radicals to efficiently sterilize bacteria and microorganisms attached to food. With an LED design that does not use mercury, it achieves safe sterilization without compromising food quality. 【Usage Scenarios】 - Sterilization on food processing lines - Sterilization of food packaging materials - Sterilization of food manufacturing equipment 【Benefits of Implementation】 - Preservation of food quality - Reduction of foodborne illness risks - Safe food provision

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Cleaning Unit "Fine Jet" for the Chemical Field

A cleaning unit that promotes chemical reactions from low power to high power.

In the field of chemistry, there is always a demand for improving the efficiency and accuracy of reactions. In particular, the cleaning of reaction vessels and substrates is crucial for the removal of impurities that can hinder reactions. If proper cleaning is not performed, it can lead to delays in reactions or incomplete combustion, ultimately negatively affecting the quality of the final product. Our cleaning unit, "Fine Jet," provides stable oscillation from low to high output, contributing to the efficiency of chemical reaction processes. [Usage Scenarios] - Cleaning of reaction vessels - Cleaning of substrates - Pre-cleaning before reagent preparation [Effects of Implementation] - Improved reaction efficiency - Stabilization of product quality - Reduction of cleaning time

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Cleaning Unit "Fine Jet" for Metal Processing

From low power to high power, we meet the needs for deburring and cleaning in metal processing!

In the metal processing industry, the removal of burrs after machining is crucial for ensuring quality and safety. Especially in the case of precision parts and complex-shaped metal products, complete removal of burrs is required. If burrs remain, they can lead to product malfunctions and safety issues. The cleaning unit "Fine Jet" meets a wide range of needs for burr removal cleaning in metal processing through stable oscillation from low to high output. 【Usage Scenarios】 * Cleaning after burr removal of metal parts * Cleaning of precision machine parts * Cleaning of parts after cutting processing 【Benefits of Implementation】 * Improvement in product quality through reliable burr removal * Reduction and efficiency of cleaning time * Compatibility with various metal materials

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Robot sensor cleaning unit / camera lens cleaning unit

Quick response possible! We propose from the mechanism and structural design of small DC pumps.

At Tada Plastic Industry, we propose cleaning units for robot sensors and camera lenses, and we carry out the molding and assembly of small DC pumps (micro pump mechanisms and structural design) and housings. For example, components for the back monitor used in ADAS driving support and security driving assistance systems are part of resin molded products, including the molding of the housing, produced at our factory. The small DC pump (micro pump) is proposed from the mechanism and structural design and is produced at our factory. 【Features】 ■ High flow rate, high pressure, and suitable unit design ■ Achieves cleaning power through high flow rate and high pressure ■ Further reduces noise and vibration by designing the mechanism and structure within the unit *For more details, please refer to the PDF materials or feel free to contact us.

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Proposal for cleaning units for AD/ADAS automotive parts.

Proposal for a unit that designs mechanisms and structures, further reducing noise and vibration! AD/ADAS automotive parts cleaning unit.

At Tada Plastic Industry, we propose cleaning units for AD/ADAS automotive parts. We perform the molding and assembly of small DC pumps (micro pump mechanisms and structural design) and housings. The small DC pumps (micro pumps) for ADAS driving support and security driving assistance systems are proposed from the mechanism and structural design and produced at our factory. We achieve cleaning power through high flow rates and high pressure. 【Features】 ■ High flow rate, high pressure, and suitable unit design ■ Achieves cleaning power through high flow rates and high pressure ■ Further reduces noise and vibration by designing the mechanism and structure within the unit *For more details, please refer to the PDF materials or feel free to contact us.

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Radical Cleaning Unit for Medical Devices

Increased sterilization efficiency with OH radicals! Compact design for space-saving.

In the medical device industry, advanced sterilization processes are required. Particularly for medical instruments that come into direct contact with the patient's body, such as surgical tools and endoscopes, reliable sterilization is essential to reduce the risk of infections. Inadequate sterilization can lead to health hazards for patients. Our radical cleaning unit generates OH radicals, achieving efficient sterilization processes. 【Usage Scenarios】 - Sterilization of surgical instruments - Sterilization of endoscopes - Sterilization of medical tubes 【Benefits of Implementation】 - Reduction of infection risks due to high sterilization effectiveness - Space-saving design due to compact structure - Reduced environmental impact by using mercury-free LEDs

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Radical Cleaning Unit for Electronic Components

High-efficiency OH radical generation! Space-saving design optimizes the surface treatment of electronic components.

In the surface treatment process of the electronic components industry, the removal of fine organic and metal contaminants significantly affects product quality and reliability. Particularly in electronic components where high density is advancing, it is crucial to thoroughly eliminate contamination and perform high-quality surface treatment. The radical cleaning unit addresses these challenges through highly efficient OH radical generation. 【Application Scenarios】 - Photoresist removal - Prevention of metal film oxidation - Removal of organic and metal contamination 【Benefits of Implementation】 - Improved cleaning efficiency - Reduced environmental impact - Enhanced product quality

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Proximity Megasonic for Photomasks PA10-Q60AE-S

A cleaning unit that achieves submicron level particle removal.

In the photomask industry, the removal of fine particles during the manufacturing process is a critical challenge that affects product quality and yield. In particular, the cleaning of wafers and photomasks requires the removal of submicron-level contaminants. Inadequate cleaning can lead to decreased device performance and the occurrence of defective products. Our cleaning unit, the "Proximity Megasonic PA10-Q60AE-S," enables cleaning close to the substrate and addresses these challenges by removing submicron particles. [Usage Scenarios] - Cleaning of silicon wafers - Cleaning of photomasks - Cleaning after CMP - Batch cleaning [Benefits of Implementation] - Improved yield due to high cleaning performance - Enhanced product quality - Reduced cleaning time

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  • Ultrasonic Cleaner
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Display-oriented radical cleaning unit

High-efficiency OH radical generation, space-saving design. For foreign matter removal in display manufacturing.

In the display industry, the removal of foreign substances, which affects product quality, is crucial. In particular, the presence of fine foreign particles can lead to display malfunctions and a decrease in product lifespan. Our radical cleaning unit efficiently generates OH radicals and strongly supports the removal of foreign substances in the display manufacturing process. 【Application Scenarios】 - Removal of foreign substances in the display manufacturing process - Removal of photoresist residues - Suppression of metal contamination 【Benefits of Implementation】 - Quality improvement through high-purity cleaning - Cost reduction through space-saving design - Reduction of environmental impact

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Cleaning unit for semiconductors "Fine Jet"

From low power to high power, we meet the precision cleaning needs of semiconductor manufacturing!

Precision cleaning in the semiconductor industry is a crucial process that affects product quality and yield. Particularly as miniaturization advances, fine foreign substances and residues adhering to wafers and substrates can lead to decreased device performance and defects. Therefore, high cleaning capability and minimizing damage to substrates are required. Fine jets contribute to solving challenges in semiconductor manufacturing by providing stable oscillation from low to high output, addressing various cleaning needs. 【Usage Scenarios】 - Wafer substrate cleaning - Magnetic disk cleaning - Post-CMP wafer cleaning 【Benefits of Implementation】 - Response to a wide range of cleaning needs - Improved yield through high-quality cleaning - Optimal cleaning through diverse nozzle variations

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Cleaning Unit "Fine Jet" for Electronic Devices

From low power to high power, we meet a wide range of needs for electronic device circuit board cleaning!

In the electronics industry, substrate cleaning is an important process for ensuring product quality and reliability. Especially in the case of miniaturized electronic components, thorough removal of foreign substances and residues is required. Inadequate cleaning can lead to decreased product performance or failure. Our cleaning unit, "Fine Jet," responds to a wide range of needs for electronic device substrate cleaning with stable oscillation from low to high output. 【Usage Scenarios】 - Cleaning of various wafer substrates - Cleaning of magnetic disks - Wafer cleaning after CMP 【Benefits of Implementation】 - Compatibility with diverse substrates - Improvement in product quality - Yield enhancement

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Cleaning unit "Fine Jet" for glass surface treatment.

From low power to high power, we meet a wide range of needs for glass surface treatment!

In the glass surface treatment industry, thorough cleaning of the substrate is essential to achieve high-quality surface treatment. In particular, if foreign substances or oil residues remain, it can significantly impair the quality of subsequent coatings or processing. Inconsistent cleaning or insufficient cleaning power can lead to product defects and reduced yield. FineJet allows for the selection of various frequencies, enabling the setting of optimal cleaning conditions for the characteristics of glass substrates and the surface treatment process. 【Usage Scenarios】 - Post-CMP cleaning of glass substrates - Cleaning of various glass substrates - Pre-treatment before surface processing 【Benefits of Implementation】 - Improved cleaning quality - Enhanced yield - Increased efficiency of the surface treatment process

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