We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Plasma Equipment.
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Plasma Equipment Product List and Ranking from 45 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Plasma Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. イー・スクエア Kyoto//Electronic Components and Semiconductors
  2. 魁半導体 Kyoto//Educational and Research Institutions
  3. JFEプラントエンジ Tokyo//others
  4. 4 ジャパンクリエイト Saitama//Testing, Analysis and Measurement
  5. 5 null/null
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Plasma Equipment Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Digital Oil Checker "Wendy" JFEプラントエンジ
  2. Handheld Atmospheric Pressure Plasma Treatment Device "Piezo Brush PZ3"
  3. How to Choose an Atmospheric Pressure Plasma Device That You Can't Ask About Now *Explanatory Materials Provided イー・スクエア
  4. 4 Small Vacuum Plasma Device NMR-Gts 魁半導体
  5. 4 Single Leaf Spin Spray Cleaning Device SRC-15001 ジャパンクリエイト

Plasma Equipment Product List

106～120 item / All 199 items

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Plasma Ion Injection Film Deposition Device PBII-R1000

Plasma Ion Injection Film Deposition Device PBII-R1000

It can also be used as a production machine and is adopted by many users.

The Plasma Based Ion Implantation & Deposition (PBII&D) is a completely new plasma ion implantation technology developed in collaboration with Kurita Manufacturing Co., Ltd. and the Kansai Center of the National Institute of Advanced Industrial Science and Technology, and it has been patented (Patent No. 3555928). DLC coating is also possible. Due to its ease of handling, it can be used as a production machine and has been adopted by many users. For more details, please contact us or refer to the catalog.

  • Plasma surface treatment equipment
  • Ion implantation equipment

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Spin Cleaning Device Spray Development Device SD-8004 Type

Spin Cleaning Device Spray Development Device SD-8004 Type

Automatic and manual operation will perform developing, rinsing, washing, and spin drying!

The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.

  • Coater
  • Other semiconductor manufacturing equipment

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Single Leaf Spin Spray Cleaning Device SRC-15001

Single Leaf Spin Spray Cleaning Device SRC-15001

High-pressure pure water is sprayed from a 2-fluid nozzle, followed by finishing cleaning with megasonic!

SRC-15001 is a sheet-type spray cleaning device. Place the item to be cleaned on the sample table, and by turning ON the start switch, the sample table begins to rotate while the nozzle arm swings the radius of the cleaning item, spraying high-pressure pure water from a two-fluid nozzle. Next, finishing cleaning is performed using megasonic waves, followed by spin drying. For more details, please contact us or refer to the catalog.

  • Coater
  • Other semiconductor manufacturing equipment

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Custom-made production achievements: CVD equipment

Custom-made production achievements: CVD equipment

We have a track record of equipment such as 'plasma CVD systems for metal containers' and 'ICP-type MOCVD systems'!

We would like to introduce the custom manufacturing achievements of Japan Create Co., Ltd. regarding "CVD equipment." We have a track record that includes "Plasma CVD equipment for solar cells," "Plasma CVD equipment for three-dimensional objects," "Plasma CVD equipment for metal containers," and "ICP-type MOCVD equipment." Sample processing is being conducted using demo units. Please feel free to contact us if you have any inquiries. 【Manufacturing Achievements (Excerpt)】 ■ Plasma CVD equipment for solar cells ■ Plasma CVD equipment for three-dimensional objects ■ Research and development load-lock type plasma CVD equipment ■ Plasma CVD equipment for metal containers ■ Plasma CVD equipment for medical containers *For more details, please refer to the PDF materials or feel free to contact us.

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  • CVD Equipment

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Dry etching equipment

Dry etching equipment

Switching between RIE mode and DP mode is possible! Reduction of metal contamination through special surface treatment.

The "Dry Etching Equipment" is a mass production device capable of fully automatic continuous processing of substrates up to φ12 inches. It features a dual-frequency independent application method that reduces metal contamination through special surface treatment. We also offer multi-chamber specifications and various custom-made options. This versatile device enables etching, ashing, and ion cleaning by switching gas types and plasma modes. 【Features】 ■ Switchable between RIE mode and DP mode ■ Reduction of metal contamination through special surface treatment ■ Compact footprint ■ Dual-frequency independent application method ■ Ultra-low temperature cooling stage *For more details, please refer to the PDF materials or feel free to contact us.

  • Etching Equipment

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Organic EL evaporation device

Organic EL evaporation device

You can freely choose from the plasma cleaning chamber, organic deposition chamber, electrode deposition chamber, sealing chamber, and more!

The "Organic EL Deposition Device" is a multi-chamber system suitable for device and material development. It is capable of processing from pre-treatment to film formation and sealing without exposure to the atmosphere. Depending on the purpose, you can freely choose from a plasma cleaning chamber, organic deposition chamber, electrode deposition chamber, sealing chamber, etc. 【Features】 ■ Supports substrate sizes up to 300mm ■ Deposition cells can be selected from various materials and sizes ■ Can be combined with CVD chambers, sputtering chambers, etc. ■ Custom orders can also be manufactured ■ Sample processing is conducted using a demo machine *For more details, please refer to the PDF document or feel free to contact us.

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  • Evaporation Equipment

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Pressurized RTA device

Pressurized RTA device

Maximum substrate heating temperature of 1000℃! Reduces element loss specific to the substrate surface heating process!

The "Pressure RTA Device" is a product that can handle processes from vacuum to pressurization (0.9 MPaG). The heating source is a halogen lamp, and the heating rate can reach up to 150°C/sec, achieving excellent substrate temperature distribution and gas flow methods. This device can be used for applications such as semiconductors, MEMS, and electronic components, enabling high-speed thermal oxidation, crystallization, and annealing treatments on the substrate surface. 【Features】 ■ Reduces element loss specific to the heating process ■ Capable of handling processes from vacuum to pressurization (0.9 MPaG) ■ Enables high-speed thermal oxidation, crystallization, and annealing treatments on the substrate surface ■ Achieves excellent substrate temperature distribution and gas flow methods ■ Compatible with tray transport ■ Multi-chamber specifications can also be manufactured *For more details, please refer to the PDF document or feel free to contact us.

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  • Heating device
  • Annealing furnace

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Damage-free adhesion and wettability enhancement! Atmospheric pressure wide-width low-temperature plasma treatment machine.

Damage-free adhesion and wettability enhancement! Atmospheric pressure wide-width low-temperature plasma treatment machine.

Demo units available! We will create samples free of charge for the first time. Inline atmospheric pressure plasma treatment with low-temperature, damage-free using inexpensive gas!

If you are having trouble with surface treatment machines, please feel free to contact us. We have a variety of treatment devices including plasma treatment machines, corona treatment machines, and frame treatment machines. Axis Corporation's atmospheric pressure plasma is effective for improving adhesion, bonding, hydrophilicity, printability, coating, painting, and pre-treatment for adhesion on materials such as resins, glass, and metals, as well as for cleaning applications like the removal of organic substances. If you are interested in surface activation of metals, glass, or resins, please give it a try. We can quickly conduct wettability confirmation tests at our company. We always have various gases such as N2, O2, and H2 on hand, and if you bring samples, we can process them immediately. Small electrodes are easy to install on existing lines. Since it is potential-free, it can treat objects without causing damage, making it effective for processing delicate surfaces like optical films and metal foils. You can achieve uniform surface treatment without worrying about breakthrough. We also have various demo machines besides plasma. For more details, please visit our company website!

  • Plasma Generator
  • Plasma surface treatment equipment
  • Other surface treatment equipment

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Improved adhesion and wettability! Atmospheric pressure plasma treatment device ULS

Improved adhesion and wettability! Atmospheric pressure plasma treatment device ULS

The small nozzle allows for flexible installation locations. It can handle narrow spaces! Demo units are available! Sample creation is possible!

It is easy to install and handle with a market minimum class plasma nozzle. It weighs only 280g! Despite its small size, it can achieve high-speed plasma processing with a maximum output of 1000W. It operates using only compressed air, without the need for special gases. The touch panel allows for easy operation, and the output can be freely adjusted. A maximum of three nozzles can be mounted on a single transmitter. It is also possible to create samples with a demo unit or conduct on-site tests with a rental.

  • Other processing machines
  • Resin processing machine

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Surface modification with a plasma treatment machine! Achieving improved adhesion and wettability.

Surface modification with a plasma treatment machine! Achieving improved adhesion and wettability.

Nozzle widths from 10mm to 70mm can be easily replaced with simple work. One machine can accommodate a wide range of applications.

Plasma treatment is a surface modification technology that achieves adhesion effects by changing the chemical bonds through functional groups generated on the surface. By discharging in the air, the electrons, ions, and radicals generated by the plasma come into contact with the substrate surface. The molecules on the substrate surface react with the ions and electrons in the plasma, producing hydrophilic functional groups, activating the surface, and improving adhesion and wettability (i.e., the effects of intermolecular forces and van der Waals forces). By removing residual organic materials and oxides on the surface, surface activation and cleaning effects can also be obtained. RAantec's plasma treatment machines have two types of nozzles: Plasmajet (5 - 10mm) and Plasphere (20 - 70mm). The spot-type Plasmajet is suitable for processing narrow gaps and thin areas, as well as for pre-treatment before printing on cables and wires. The Plasphere is a nozzle for larger areas, allowing for easy replacement of the tip nozzle from 20mm to 70mm. It is suitable for surface modification and pre-treatment of larger resin and metal surfaces. For more detailed information, please visit our blog. https://www.kbrasch.co.jp/blog/2021/03/31/302

  • Other processing machines
  • Plasma surface treatment equipment

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Atmospheric Pressure Plasma Device MyPL-Auto Series

Atmospheric Pressure Plasma Device MyPL-Auto Series

High-density plasma is generated over a large area by a unique reactor head!

Facilitating the construction of mass production inline systems for large workpieces such as semiconductor IC pad cleaning, FPC substrates, and LCD glass substrates, achieving reductions in capital investment and running costs!

  • Plasma surface treatment equipment
  • Molding Equipment
  • Circuit board processing machine

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Atmospheric Pressure Plasma Device ILP-Inline Series

Atmospheric Pressure Plasma Device ILP-Inline Series

High-density plasma is generated over a large area by the unique reactor head!

Facilitates the construction of mass production inline systems for large workpieces such as semiconductor IC pad cleaning, FPC substrates, and LCD glass substrates, achieving a reduction in capital investment and running costs!

  • Molding Equipment
  • Circuit board processing machine
  • Plasma surface treatment equipment

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[Data] Atmospheric Pressure Plasma Generation Device

[Data] Atmospheric Pressure Plasma Generation Device

Publication of topics such as 'Mechanism of Atmospheric Pressure Plasma Generation' and 'Features of Atmospheric Pressure Plasma Devices'!

This document contains information about the "Atmospheric Pressure Plasma Generation Device." We have developed a new plasma head for the atmospheric pressure plasma device, which generates superior plasma compared to conventional methods. This surface treatment device is effective in dry processes such as improving adhesion for difficult-to-bond materials, enhancing wettability, and increasing cleaning effects. Please take a moment to read it. 【Contents (partial)】 ■ What is plasma? ■ Mechanism of atmospheric pressure plasma generation ■ Atmospheric pressure plasma treatment for improved printing ■ Features of atmospheric pressure plasma devices ■ Methods for confirming plasma treatment effects (contact angle measurement) *For more details, please refer to the PDF document or feel free to contact us.

  • Plasma Generator
  • Plasma surface treatment equipment

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Atmospheric Pressure Plasma Device Plasma Beam RT

Atmospheric Pressure Plasma Device Plasma Beam RT

We provide optimal solutions for high-speed, high-efficiency, and extensive inline plasma processing of two-dimensional surfaces.

Diener’s atmospheric pressure plasma device creates a high-voltage field at the electrode part of the plasma nozzle, which ionizes the gas passing through it. This plasma is then irradiated into the atmosphere using an air stream, allowing for the cleaning and hydrophilicity improvement of target products. By using compressed air instead of argon or helium gas as the gas source, it also enables a reduction in running costs. Diener’s innovative product, PlasmaBeam RT, is an atmospheric pressure plasma device ideal for high-speed, high-efficiency, and extensive inline plasma treatment of two-dimensional surfaces. PlasmaBeam RT can be easily integrated into existing production lines, enabling automatic cleaning and activation of various parts and materials. It features two complementary arranged nozzles that rotate at high speed during operation, allowing for a plasma treatment width of up to 120mm with the stable quality and effectiveness of Diener’s atmospheric pressure plasma system.

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  • Plasma surface treatment equipment
  • Other surface treatment equipment
  • Other cleaning machines

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Atmospheric pressure plasma treatment device for lead frames

Atmospheric pressure plasma treatment device for lead frames

We process at low temperatures and high speeds using an independent plasma source. It is possible to handle samples that were difficult to process conventionally, such as lead frames and films.

- Low-temperature treatment: Processing is possible even with substrates that have low heat resistance. - High-speed processing: High-speed processing is possible with a linear head up to 75mm wide. - Multi-head: Multiple heads can be selected, from large area heads to a 1.6mm mini-beam head and handheld types. Compatible with uneven shapes. - Mixed gas: Hydrogen gas can be mixed. - Resin and metal substrates: Nylon, polyimide, aluminum, titanium, etc. - Stable processing: Traceability can be achieved.

  • Printed Circuit Board

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