Oblique Incidence Interference Method Flatness Tester 'FT-900'
Laser light oblique incidence interferometer compatible with a maximum φ200mm; image analysis using phase shift method.
This is a digital measurement of various samples by analyzing interference fringes using a phase shift method with a laser light oblique incidence interferometer. It is used in research and development of semiconductor wafers (GaN, SiC, sapphire) to improve quality in mass production lines.
- Company:ニデック コート本部
- Price:Other