Infrared microscope
You can perform inspections in IR bright field and dark field using adjustments to infrared light illumination.
Non-destructive monitoring and inspection of internal defects in infrared-transmitting materials such as semiconductor wafers can be performed simultaneously with visible and infrared images, allowing for the detection of pattern misalignment and internal defects. The surfaces of TSV through-silicon vias and stacked wafers can be monitored simultaneously with visible imaging and IR focus adjustment to observe the interior of the wafers. For more details, please download and view the catalog.
- Company:アイティ・テック
- Price:Other