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This is a peach sauce filled with chunks of white peach measuring 10mm!
【Features】 - This is a sauce-like confectionery ingredient that uses a generous amount of domestic white peach pulp. - It can be used to create textures in jellies and drinks, or mixed into creams. - With chunks of fruit cut into 10mm pieces, it can also be used directly as a topping sauce.
Robust and scalable design! High-energy, strongly focused beam.
"LION" is a component suitable for pre-treatment and surface modification. It removes hydrocarbons through argon processing and can add oxygen if necessary. The ion beam is strongly focused and has high energy. It is an ideal device for inline film deposition systems that require physical etching, and due to its simple and robust design, the ion source can be easily scaled up. The main applications are large-area glass film deposition and metal foil deposition. 【Features】 ■ Removes hydrocarbons through argon processing and can add oxygen if necessary ■ Available in an external version with adjustable angle and a flange-mounted version ■ Robust and scalable design ■ High-energy, strongly focused beam ■ Pre-treatment of various types of substrate materials *For more details, please refer to the PDF materials or feel free to contact us.
Electrode spacing can be freely adjusted for process compatibility! Achieving gentle processing with low discharge voltage.
The "HCS" is a surface treatment component characterized by the integration of a hollow cathode and an anode. Electrons are confined between the potential drops of the deep groove walls of the cathode. This promotes gas ionization and increases plasma density. When plasma is pushed into the grooves, a very powerful and bright plasma is generated beneath the electrode plate. With a simple and scalable design, it achieves robust behavior and easy customization. In terms of high-density plasma processing, it is comparable to CCP and ICP, but at a lower cost than ICP. 【Features】 ■ Hollow cathode design, substrate-independent ■ High electron density and ionization efficiency promote high-density radicals ■ Scalable ion source for surface cleaning, activation, and etching purposes ■ Applicable to thin film coating due to specific component design ■ Usable for dynamic and static substrate transport *For more details, please refer to the PDF document or feel free to contact us.
It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.
This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film formation with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.
