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slurry - メーカー・企業25社の業務用製品ランキング | イプロスものづくり

更新日： 集計期間:Feb 18, 2026～Mar 17, 2026
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slurryのメーカー・企業ランキング

更新日： 集計期間:Feb 18, 2026～Mar 17, 2026
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  1. ピュアオンジャパン Kanagawa//Chemical
  2. アイエムティー Wakayama//Testing, Analysis and Measurement
  3. アンカーテクノ Nara//Trading company/Wholesale
  4. 4 NITTA DuPont Incorporated Kyoto//Other manufacturing
  5. 5 北川グレステック 本社 Chiba//Trading company/Wholesale
企業ランキングへ

slurryの製品ランキング

更新日： 集計期間:Feb 18, 2026～Mar 17, 2026
※当サイトの各ページの閲覧回数を元に算出したランキングです。

  1. Diamond slurry for sample grinding アイエムティー
  2. Precision Grinding Slurry "Nanopure(TM)" NITTA DuPont Incorporated
  3. CMP slurry for oxidation film engineering "ILD(TM) Series" アンカーテクノ
  4. Optical material series "ULTRA-SOL OPTIQPRO" ピュアオンジャパン
  5. 4 Pre-CMP slurry: Reducing CMP process time ピュアオンジャパン

slurryの製品一覧

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Sapphire polishing RCD diamond slurry

Sapphire polishing RCD diamond slurry

Sapphire polishing RCD diamond slurry

Grish Corporation's diamond slurry comes in two types: single crystal diamond and RCD diamond, depending on the type of diamond. By harmonizing carefully selected diamond particles and dispersants, we can manufacture original diamond slurries tailored to your applications and requests. It is particularly suitable for lapping and polishing processes that require high precision, mainly for metal materials, sapphire substrates, and ceramics.

  • Other abrasives
  • Other consumables
  • slurry

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Water-based and oil-based wrapping liquid "Diamond Slurry"

Water-based and oil-based wrapping liquid "Diamond Slurry"

We offer a variety of single crystals, polycrystals, and various particle sizes, making it possible to provide the products you desire!

"Diamond slurry" is used for polishing various materials such as magnetic heads, ceramics, and metals. It has good dispersion of diamonds and is resistant to scratches and other damage. We offer a lineup of water-based diamond slurry series PRA (polycrystalline) and PRB (single crystal), as well as oil-based diamond slurry series PBP (polycrystalline) and PBQ (single crystal). 【Features of Water-Based Diamond Slurry Series PRA (Polycrystalline) and PRB (Single Crystal)】 - Excellent lubricity and resistant to liquid drainage - Superior rust and corrosion resistance, suitable for general metal polishing - Good washability with water - High polishing rate allows for cost reduction - Various types of liquids are available *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives
  • slurry

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Diamond slurry (abrasive)

Diamond slurry (abrasive)

Diamond slurry classified by Kemet's advanced classification technology.

【Product PR】 This is diamond slurry classified using advanced classification technology by Kemet. We offer both polycrystalline and single crystal diamonds, and you can choose from aqueous or oil-based solvents. 【Features】 ◆ Custom-made options are available upon request. The basic diamond size ranges from approximately 1/10 to 15 micrometers, but other sizes can also be custom-made according to your requirements. ◆ When used in conjunction with Kemet plates, it is possible to achieve high-precision finishes at high polishing rates. Samples are available upon request. *Please note that it may take some time for the samples to arrive. Thank you for your understanding in advance. For more details, please refer to the PDF or feel free to contact us.

  • Other abrasives
  • slurry

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CMP slurry

CMP slurry

Widely customizable CMP slurry

CMP (Chemical Mechanical Polishing) slurry is used in the semiconductor manufacturing process to polish the surface of substrates. Chemical etching softens the material, and mechanical abrasion removes the material, resulting in the flattening of the original three-dimensional shape. This is the mechanism of CMP. Our CMP slurry has a proven track record for various applications, including copper wiring for semiconductor circuit miniaturization and speed enhancement, low-temperature sputtering for cost-effective aluminum wiring, and compounds that excel in high-speed signal processing. It is composed of a chemical reaction solution and nano-sized polishing particles, characterized by minimal generation of coarse particles and sedimentation, ensuring stable quality. *Please feel free to contact us.*

  • Wafer processing/polishing equipment
  • slurry

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Kemet Diamond Slurry

Kemet Diamond Slurry

Classifying diamonds in-house! Introducing the characteristics of "water-based (W2)" and "oil-based (O3)" as well as the polishing targets!

"Kemet Diamond Slurry" offers a wide range of particle sizes, concentrations, and solutions to meet the needs of the lapping and polishing process. We provide two types of slurries: "Water-based (W2)," which has excellent cleaning properties and achieves a fast processing rate, and "Oil-based (O3)," which excels in lubrication and achieves a high surface roughness. Additionally, we can also provide slurries with other particle sizes. 【Features】 <Water-based (W2)> ■ Characteristics: Excellent cleaning properties and fast processing rate ■ Polishing targets: Sapphire, SiC, SUS304, SUS316, carbon, cemented carbide, ceramics, etc. <Oil-based (O3)> ■ Characteristics: Excellent lubrication and high surface roughness ■ Polishing targets: General iron-based materials, workpieces prone to rust *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives
  • slurry

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Diamond slurry for sample grinding

Diamond slurry for sample grinding

Uniform particle size distribution achieved through an advanced grading system.

This is a product from one of the few diamond manufacturers in the world. It maintains a uniform particle size distribution thanks to an advanced grading system. The abrasive particles do not settle and maintain a stable colloidal state. Affordable pricing. An all-in-one type that does not require lubricants is also available.*1 Using the dedicated spray bottle (S90KS-0337) allows for efficient spraying without waste. Diamond suspension Poly & Mono. *Please purchase it together with the cloth for sample polishing.

  • Other abrasives
  • slurry

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"Water-based polycrystalline diamond slurry" Diamond Push

"Water-based polycrystalline diamond slurry" Diamond Push

High dispersion leads to high efficiency and a clean finish!

【Product Description】 *High-quality industrial diamond powder, finely granulated with advanced technology, maintains a highly dispersed state without aggregation or sedimentation for a long time, making it very easy to use. It allows for continuous polishing at a consistent concentration, resulting in high efficiency and a clean finish. 【Features】 1. Highly dispersed type that does not aggregate or settle for a long time. It provides a uniform and excellent polishing surface. 2. With a large particle size and very high concentration, it offers strong polishing power and improves work efficiency. 3. The polycrystalline diamond features a hybrid structure that combines a high number of cutting edges with "flexibility." It results in a good finish and long lifespan. 4. Water-based type that is less likely to cause scratches on the polishing surface. After use, simply rinse with water or wipe off to complete the task. 5. One-push spray method that effectively reaches the areas to be polished without waste.

  • Other abrasives
  • Other Auto Parts
  • Other molds
  • slurry

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Cartridge-type mechanical seal for stationary slurry, PB-C series

Cartridge-type mechanical seal for stationary slurry, PB-C series

Slurry cartridge-type stationary mechanical seal

This is a cartridge seal that incorporates a sleeve and mechanical seal compactly into the flange. It features a stationary design with a high-quality O-ring for the secondary seal, ensuring that components like springs and drive pins are non-contact, providing stable sealing performance against slurries. For more details, please contact us or download the catalog. Slurry pumps (horizontal slurry pumps) (vertical slurry pumps) Chemical pumps (various chemical pumps) Mixers (mixers) (kneaders) (homogenizers) (ribbon mixers)

  • Other machine elements
  • slurry

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Diamond slurry

Diamond slurry

Diamond slurry, suspension

Features: Diamond slurry is a mixture of carefully selected high-quality diamond abrasives with liquids such as water or oil. It is widely used for polishing hard materials such as silicon wafers, gemstones, optical lenses, ceramics, hard disks, and hard alloys. Depending on the type of diamond, there are three varieties: single crystal, polycrystalline, and nano. We also provide original polishing slurry tailored to the products you handle.

  • Grindstone
  • Other abrasives
  • Diamond cutter
  • slurry

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Diamond slurry

Diamond slurry

This is an introduction to diamond slurry for smoothing the surface of semiconductor package substrates.

The product smooths the surface of semiconductor package substrates. The type is POLYCRYSTALLINE DIAMOND, with a particle size of 2-4/D10 (2.3≦), D50 (3.2±0.5μm), D99 (7.5≧). Additionally, the color is transparent, and after material dispersion, it appears dark gray or black, with a viscosity of 3.6 (±0.2). 【Specifications】 ■ Viscosity (40℃): 3.6 (±0.2) ■ Powder: 0.25% or more ■ Specific gravity (23℃): 1.05–12g/cm3 ■ Flash point: 210℃ *For more details, please refer to the PDF document or feel free to contact us.

  • Other office supplies
  • slurry

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High-performance natural material (additive): cellulose nanofiber slurry

High-performance natural material (additive): cellulose nanofiber slurry

It is a natural-derived high-performance additive that has functions such as high viscosity and high transparency, which are superior to conventional additives that do not exist in traditional products.

"AUROVISCO" is a water dispersion of ultra-fine wood fiber cellulose nanofiber (CNF) with a fiber width of 3nm. By adding a small amount to water-based liquid agents, the following outstanding functions are expected to be imparted. <Functions> - High transparency - High viscosity - dispersion stability - Water retention - Coating stability function - Thixotropy <Applications> - Thickening and dispersing agents for paints and inks: dispersion stability of pigments and additives / coating film stability - Cleaning and disinfectant solutions: dispersion of abrasives, etc., and coating film stability after application of liquid agents - Ceramic products such as concrete: reinforcing effect for ceramic products *The Oji Group has adopted the "phosphate esterification method" as an effective technique to reduce the energy required for fine processing during manufacturing. This method has enabled the production of high-quality (high transparency, high viscosity, thixotropic) cellulose nanofibers with higher production efficiency compared to conventional methods. In 2017, the cellulose nanofiber production facility began operation at the Oji Paper Tomioka Plant.

  • Su_01.png
  • Su04.png
  • Organic Natural Materials
  • slurry

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Single crystal diamond slurry & RCD diamond slurry

Single crystal diamond slurry & RCD diamond slurry

Single crystal diamond slurry & RCD diamond slurry

Features ◆Single Crystal Diamond Slurry Single crystal diamond slurry has high grinding power and enables low-cost processing, making it widely used for grinding and polishing hard materials. ◆RCD Diamond Slurry RCD diamond slurry is harmonized with our proprietary RCD diamond powder and advanced dispersion technology, providing a diamond slurry that is resistant to scratching and has high dispersion stability. It is primarily ideal for polishing processes of sapphire, ceramics, and hard alloys.

  • Other abrasives
  • Other consumables
  • slurry

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CMP slurry

CMP slurry

CMP slurry

Features ◆ Uniform particle size (sharp particle size distribution, spherical particles). ◆ High efficiency (unique formulation, stable pH). ◆ High flatness (surface quality: Ra < 0.2 nm, TTV < 3 μm). ◆ High number of circulation uses. ◆ Capable of low-temperature polishing (below 35°C). ◆ We offer a specially formulated slurry for processing SIC wafers. ◆ Neutral and weakly acidic slurries are available for aluminum nitride processing.

  • Other abrasives
  • Other consumables
  • slurry

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CO・AO・SC polishing slurry

CO・AO・SC polishing slurry

CO・AO・SC polishing slurry

Features ◆ Excellent polishing rate. ◆ Non-agglomerating, high dispersibility. ◆ Uniform and good finish surface can be obtained.

  • Other abrasives
  • Other consumables
  • slurry

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Precision Grinding Slurry "Nanopure(TM)"

Precision Grinding Slurry "Nanopure(TM)"

Polishing slurry that achieves nano-level surface quality.

The Nanopure(TM) series is a polishing slurry primarily used for primary polishing, secondary polishing, finishing polishing, and edge polishing of silicon wafers. The abrasive particles are made of high-purity colloidal silica, achieving excellent polishing performance through an optimal blend of additives. We will propose the most suitable product lineup based on your objectives and applications.

  • Other abrasives
  • slurry

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Precision Grinding Slurry "Machplaner(TM)"

Precision Grinding Slurry "Machplaner(TM)"

Polishing slurry that achieves a high polishing rate and good surface quality.

Through abrasive formulation technology and additive formulation technology based on colloidal silica, we achieve high polishing rates and high surface quality. We offer a lineup of products tailored to various polishing purposes and applications, including sapphire, glass, quartz, oxides, and resins. We will propose the optimal product lineup based on your objectives and applications.

  • Other abrasives
  • slurry

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Diamond Slurry "SPW": Standard Water-Based Slurry

Diamond Slurry "SPW": Standard Water-Based Slurry

Water-based slurry formulated according to customer requirements such as diamond type, particle size, and concentration. Please use it to build the optimal polishing process!

The "Type SPW" is a water-based diamond slurry suitable for use with metal lap discs and polishing pads. It is a water-based type that simplifies handling and cleaning, achieving a high polishing rate without compromising surface finishing. The high-dispersion formulation prevents the agglomeration of diamond particles, enhancing process stability. (Non-dispersed types are also available.) 【Features】 ■ Water-based type that simplifies handling and cleaning ■ Achieves a high polishing rate without compromising surface finishing ■ High-dispersion formulation that prevents the agglomeration of diamond particles (Non-dispersed options are available) ■ High reproducibility of processes *For more details, please refer to the PDF document or feel free to contact us.

  • Other abrasives
  • slurry

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Water-based diamond suspension "OPW": Slurry for optical materials

Water-based diamond suspension "OPW": Slurry for optical materials

Slurry formulated with a formula that achieves excellent polishing results for various optical materials such as fluorite!

OPW is a water-soluble diamond suspension designed for final polishing of optical components, ceramics, metals, and more. It can be used immediately upon arrival. The OPW suspension delivers optimal performance in finishing processes from 3 microns to 0.1 microns. We offer products suitable for polishing on pads and pitch plates/PU foils. 【Features】 ■ Tailor-made specifications You can freely choose the type of diamond, grain size, and concentration. ■ Aggregate-free processing Excellent usability due to reliable dispersion. ■ Maintains a high polishing rate through cooling and lubrication. ■ Environmentally friendly and easy to maintain. *For more details, please feel free to contact us.

  • Other abrasives
  • slurry

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Pre-CMP slurry: Reducing CMP process time

Pre-CMP slurry: Reducing CMP process time

Softly controlling the hard! A slurry for polishing hard substrates blended with silica and diamond. By using it before CMP, it shortens the process time.

This is a recommended pre-CPM slurry for polishing hard materials such as sapphire, SiC, and silicon nitride. By using it before CMP, you can shorten the CMP process time. 【Recommended for the following situations】 ■ Those who want to shorten the CMP process time ■ Those who want to efficiently remove fine scratches, etc. ■ Those who want to reduce the load of potassium permanganate slurry *For more details, please feel free to contact us.

  • ULTRA-SOL_5gal.jpg
  • ULTRA-SOL_55gal.jpg
  • ULTRA-SOL_range_003.jpg
  • Other abrasives
  • slurry

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Ceria Slurry

Ceria Slurry

Excellent dispersion stability! Possesses high polishing rate and control capabilities for defects, dishing, and more.

The "Ceria Slurry" used in semiconductor CMP processes is a suspension made by mixing particles of 80 to 300 nm with ultra-pure water and chemicals. It serves the role of polishing the film quality of the target material both scientifically and mechanically. Additionally, the "Additive" used together with the Ceria Slurry during polishing enables selective polishing required in semiconductor processes, depending on the film quality. 【Features】 ■ Excellent stability of the slurry at low and high temperatures ■ Minimal particle agglomeration ■ Superior usability when mixed with additives ■ High polishing rate ■ Excellent control capabilities for defects, scratches, and dishing *For more details, please refer to the PDF document or feel free to contact us.

  • 企業：KKJ
  • 価格：Other
  • Composite Materials
  • slurry

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Lime slurry

Lime slurry

We offer grades tailored to your needs! We have established a shipping system using our own dedicated tank trucks.

Our flagship product, "Lime Slurry," is a water treatment chemical developed primarily for industrial wastewater treatment. In addressing environmental issues, particularly in preventing water pollution and promoting cleanliness, we have utilized our unique technology to control both concentration and viscosity. Additionally, it is not a toxic or hazardous substance, making it highly safe and easy to handle, while also offering excellent cost performance. 【Features】 ■ Easy to work with and manage ■ Quick reaction ■ Reduces chemical costs ■ Excellent cost performance ■ Established a shipping system using our own dedicated tank trucks *For more details, please refer to the PDF materials or feel free to contact us.

  • Contract manufacturing
  • slurry

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Antibacterial, antiviral, and deodorizing function: silver-based inorganic particle slurry.

Antibacterial, antiviral, and deodorizing function: silver-based inorganic particle slurry.

Line up SS-756 and MHI filler #C773! They excel in antibacterial, antiviral, and deodorizing properties.

We would like to introduce our "Silver-based Inorganic Particle Slurry." We offer a lineup that includes "SS-756" with a viscosity of 700 mPa·s, a particle size of 1.2 μm, and a dispersion medium of water, as well as "MHI Filler #C773" with a viscosity of 1.6 mPa·s, a particle size of 0.3 μm, and a dispersion medium of MEK. You can view the experimental data for each performance by downloading the materials. 【Features】 ■ High heat resistance ■ Safety ■ Sustainability ■ Handleability *For more details, please refer to the PDF materials or feel free to contact us.

  • Other polymer materials
  • slurry

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Rare earth oxide microparticle slurry

Rare earth oxide microparticle slurry

Suitable for multilayer ceramic capacitor additives.

The "Rare Earth Oxide Fine Particle Slurry" developed by our company can accommodate the thinning of the dielectric layer due to the miniaturization of multilayer ceramic capacitors when used. Additionally, we can accommodate various rare earth elements and solvents, so please feel free to consult with us. 【Applications】 ■ Additive for multilayer ceramic capacitors, etc. *For more details, please download the PDF or feel free to contact us.

  • Ceramics
  • slurry

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Polycrystalline diamond slurry

Polycrystalline diamond slurry

Polycrystalline diamond slurry

Polycrystalline diamond slurry can be manufactured as an original diamond slurry tailored to your applications and requirements, harmonizing high-precision, classified polycrystalline diamond particles and dispersants made by Grish Company. It is particularly suitable for lapping and polishing processes that require high precision, such as sapphire, SIC wafers, and ceramics.

  • Other abrasives
  • Other consumables
  • Other cutting tools
  • slurry

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CMP slurry

CMP slurry

CMP slurry

CMP slurry is a silica slurry optimized specifically for polishing processes of materials such as sapphire, SiC wafers, aluminum nitride, ceramics, and metals. It has excellent particle size uniformity, high dispersion stability, and produces a uniform and good finishing surface.

  • others
  • slurry

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SUPERIOR Diamond Slurry

SUPERIOR Diamond Slurry

It prevents deep scratches and pitching, resulting in a scratch-free mirror finish.

Superior diamond slurry liquefies carefully selected diamond abrasives and uniformly intersperses them into the processing interface under excellent dispersion. Therefore, it prevents deep scratches and pitching that occur during processing, resulting in a scratch-free mirror finish. The single crystal diamonds consist of micro-diamonds ranging from 10 to 200 Å, fitting within the specified particle size, and have over 30% more surface area compared to single crystal diamonds. The continuous cutting edges of these micro-diamonds excel in polishing, sometimes achieving about three times the polishing volume of single crystal diamonds. For more details, please contact us or refer to the catalog.

  • Other abrasives
  • slurry

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CMP slurry (chemical mechanical polishing liquid abrasive)

CMP slurry (chemical mechanical polishing liquid abrasive)

We can provide CMP slurries that meet customer needs for the flattening of semiconductor substrates with mixed materials.

Our company develops and manufactures CMP slurries. CMP stands for Chemical Mechanical Polishing, which involves mechanical removal and polishing while chemically dissolving materials. The chemical actions applied depend on the chemical properties of the material to be removed. The CMP slurry for semiconductor copper wiring is mass-produced for advanced devices and has gained high trust as it has been certified as a partner by major electronics manufacturers. We are also advancing the development of CMP slurries for cutting-edge devices. [Our company offers contract manufacturing of various slurries and coatings] If you have any issues with manufacturing, please feel free to contact us.

  • Other semiconductors
  • slurry

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Recycled CMP slurry

Recycled CMP slurry

Did you know that CMP slurry can be regenerated as CMP slurry?

Did you know that CMP slurry can be regenerated as CMP slurry? The water that is separated during regeneration is ultra-pure water originally used in the factory, and it can be recovered and reused as raw water for ultra-pure water production. If you are having trouble with CMP slurry recycling or the treatment of wastewater containing CMP slurry, please feel free to consult us.

  • Ceramics
  • Other semiconductors
  • slurry

ブックマークに追加いたしました

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ブックマークを削除いたしました

ブックマーク一覧

これ以上ブックマークできません

会員登録すると、ブックマークできる件数が増えて、ラベルをつけて整理することもできます

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