We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for slurry.
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slurry Product List and Ranking from 27 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

slurry Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. ピュアオンジャパン Kanagawa//Chemical
  2. アイエムティー Wakayama//Testing, Analysis and Measurement
  3. null/null
  4. 4 アンカーテクノ Nara//Trading company/Wholesale
  5. 5 北川グレステック 本社 Chiba//Trading company/Wholesale
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slurry Product ranking

Last Updated： Aggregation Period:Dec 24, 2025～Jan 20, 2026
This ranking is based on the number of page views on our site.

  1. Diamond slurry for sample grinding アイエムティー
  2. 2025-2026 Edition: Current Status and Future Outlook of CMP Slurries for Semiconductors
  3. CMP slurry for oxidation film engineering "ILD(TM) Series" アンカーテクノ
  4. 4 Optical material series "ULTRA-SOL OPTIQPRO" ピュアオンジャパン
  5. 5 Diamond slurry for wire saw "WSG": Glycol-based ピュアオンジャパン

slurry Product List

46～51 item / All 51 items

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CMP slurry

CMP slurry

Stable quality is a characteristic! Introducing the properties of "alumina" and "silica" as well as the polishing targets!

Our company conducts slurry development and manufacturing based on the experience we have cultivated since our founding. "CMP slurry" is composed of chemical solutions and nano-sized abrasive particles, characterized by minimal generation of coarse particles and good particle dispersion, ensuring stable quality. We offer "alumina," which provides excellent cleaning properties and a fast polishing rate, and "silica," which achieves damage-free results with high surface roughness. 【Features】 <Alumina> ■ Properties: Excellent cleaning properties and fast polishing rate ■ Polishing targets: Resins, compound ceramics <Silica> ■ Properties: Damage-free with high surface roughness ■ Polishing targets: Oxide films, metal film resins, glass *For more details, please refer to the PDF document or feel free to contact us.

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SS process sludge slurry

SS process sludge slurry

Contributing to the recycling of nickel and copper resources from waste liquid.

Slurry sludge, organic sludge, sludge containing specific hazardous substances (mercury, cadmium, lead, arsenic, selenium), cyanide-containing sludge (specific hazardous), chromium-containing sludge (specific hazardous)

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Optical material series "ULTRA-SOL OPTIQPRO"

Optical material series "ULTRA-SOL OPTIQPRO"

Slurry for precision polishing of optical materials using high-purity cerium oxide. Recommended for those who require high cleanliness and surface quality.

This is a high-purity cerium oxide slurry recommended for precision polishing of optical materials such as borosilicate glass, quartz glass, and glass ceramics. This slurry, which combines cerium oxide with a sharp particle size distribution in a unique coolant, is characterized by its resistance to settling and ease of cleaning. Additionally, due to its high concentration of abrasive particles, it can be used flexibly by diluting it on-site. 【Recommended for the following situations】 ■ Those looking for a cerium oxide slurry with high cleaning properties ■ Those requiring high consistency between batches ■ Those seeking high processing rates and surface quality ■ Those who find it cumbersome to create slurry from powder *Please feel free to contact us for more details.

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HAM/HSM high-pressure high-temperature single crystal diamond slurry

HAM/HSM high-pressure high-temperature single crystal diamond slurry

High-pressure high-temperature single crystal diamond slurry is an aqueous formulation. It is a slurry in which high-pressure high-temperature single crystal diamond particles are dispersed in an aqueous liquid.

Water-soluble slurry does not dry out when exposed to air and is ideal as an alternative to oil-based polishing liquids. Our unique surface modification technology prevents the agglomeration of diamond particles. It is perfect for polishing superhard materials such as tungsten carbide, sapphire, and ruby. The sizes range from 0.2μm to 60μm.

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[Research Material] Global Market for CMP Polishing Materials

[Research Material] Global Market for CMP Polishing Materials

Global Market for CMP Polishing Materials: CMP Slurries, CMP Pads, CMP Pad Conditioners, CMP Slurry Filters, PVA ...

This research report (Global CMP Polishing Materials Market) investigates and analyzes the current state of the global market for CMP polishing materials and its outlook for the next five years. It includes information on the overview of the global CMP polishing materials market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the CMP polishing materials market include CMP slurries, CMP pads, CMP pad conditioners, CMP slurry filters, PVA brushes, retaining rings, and CMP post-cleaning, while the segments by application focus on 300mm wafers, 200mm wafers, and others. The regional segments are divided into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa, to calculate the market size for CMP polishing materials. It also includes the market share of major companies in CMP polishing materials, product and business overviews, and sales performance.

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